Ferroelectric HfO2/ZrO2 Superlattice Capacitors With High Center to Edge Wafer‐Scale Uniformity
“Enhanced wafer‐scale device uniformity on 150 mm wafers is demonstrated using ferroelectric superlattice HfO2/ZrO2 (HZO) capacitors, as compared to conventional solid solution HZO capacitors. Superlattice HZO exhibits improved ferroelectric memory properties, including a broader polarization window, greater endurance, reduced leakage, and superior ...
Oscar Kaatranen +4 more
wiley +1 more source
Engineered Strain in 2D Materials by Direct Growth on Deterministically Patterned Grayscale Topographies. [PDF]
Erbas B +8 more
europepmc +1 more source
Analog Weight Update Rule in Ferroelectric Hafnia, Using picoJoule Programming Pulses
Resistive, ferroelectric synaptic weights based on BEOL‐compatible hafnia/zirconia nanolaminates are fabricated. Lateral downscaling the devices below 10 µm2 enables 20 ns programming with electrical pulses, dissipating ≤ 3 pJ. Experimental results show that final conductance state is set by pulse amplitude, and is largely independent of the initial ...
Alexandre Baigol +7 more
wiley +1 more source
Semiconductor manufacturing wastewater challenges and the potential solutions via printed electronics. [PDF]
Sandhu S +4 more
europepmc +1 more source
Capacitive Pixelated CMOS Electronic Nose
A 1024‐pixel CMOS capacitive E‐nose with inkjet‐printed MOFs and polymer layers yields gas‐specific capacitance fingerprints under humid conditions, discriminating toluene from 2‐butanone at low power. ABSTRACT Although some of the human senses can nowadays be replaced by low‐cost electronic sensors such as microphones and image sensors, a compact low ...
M. A. Basyooni‐M. Kabatas +7 more
wiley +1 more source
A universal all-dry microfabrication method for sensitive electronic materials via an inorganic molecular lithographic mediator. [PDF]
Zeng C +14 more
europepmc +1 more source
Silicon Nitride Resistive Memories
Amorphous SiNx is an attractive resistance switching material for ReRAM applications due to its physicochemical properties, such as humidity resistance, low oxygen diffusivity, and is used as a metal diffusion blocker. By modifying the ratio between N and Si atoms, the microstructure of the SiNx is affected, rendering it possible to change the ...
Alexandros‐Eleftherios Mavropoulis +7 more
wiley +1 more source
Wafer-Scale All-Dielectric Quasi-BIC Metasurfaces: Bridging High-Throughput Deep-UV Lithography with Nanophotonic Applications. [PDF]
Beisenova A +7 more
europepmc +1 more source
EUV lithography: technology for the semiconductor industry in 2010 [PDF]
H. Enkisch, J. Trenkler
openaire +1 more source
Research Progress and Applications of Non‐Carrier‐Injection Electroluminescence
Non‐carrier‐injection electroluminescence (NCI‐EL) uses AC fields and displacement currents to trigger light from internal charge reservoirs, enabling minimalist emitters with remotely coupled terminals. This review maps shared mechanisms across organics, GaN, quantum dots, and TMDCs, compares planar, interdigital, single‐terminal, and coaxial designs,
Wei Huang +6 more
wiley +1 more source

