Results 121 to 130 of about 14,706 (300)

Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance

open access: yesAdvanced Materials Interfaces
Electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) have been continuously improved and applied in semiconductor and biomedical device manufacturing. With the development of biomedical nanodevices, the demand for biodegradable, and
Yurui Wu   +14 more
doaj   +1 more source

X-ray lithography

open access: yes, 2022
S.107-121X-ray lithography with wavelengths between 0.2 and 5 nm provides both high-structural resolution as good as 0.1 My m and a wide scope of advantages for the application in circuit production.
Heuberger, A.
core  

Chip‐Integrated Metasurface‐GaAsSb Nanowire Array Photodetectors for Single‐Pixel Polarimetric Imaging

open access: yesAdvanced Optical Materials, EarlyView.
A 2×2 multiplexed GaAsSb nanowire photodetector array integrated with L‐shaped metasurfaces is developed for miniaturized infrared polarimetry. Leveraging non‐radiating anapole states that facilitate near‐field enhancement, the device demonstrates strong polarization selectivity at 835 nm.
Longsibo Huang   +14 more
wiley   +1 more source

Surface‐Plasmon‐Coupled Blue InGaN/GaN Micro‐LEDs with Oxide–Metal–Oxide Capping Layer Compatible to Chip Fabrication Process

open access: yesAdvanced Optical Materials, EarlyView.
A sidewall‐integrated oxide–metal–oxide architecture is demonstrated to overcome efficiency degradation in ultra‐small InGaN/GaN micro‐LEDs. Conformal Al2O3 passivation combined with plasmonic Ag nanoparticles enables localized surface plasmon–exciton coupling, converting surface‐related nonradiative losses into radiative emission.
Pil‐Kyu Jang   +17 more
wiley   +1 more source

Waveguide Geometry–Driven Trade‐Offs in Resonant Cavity Sensor Performance

open access: yesAdvanced Optical Materials, EarlyView.
Waveguide geometry governs the interplay between sensitivity, intrinsic Q‐factor, and wavelength noise in silicon nitride resonant sensors. Contrary to intuition, higher sensitivity does not ensure superior performance. Low‐noise, high‐Q ridge resonators achieve the lowest detection limits, revealing that detection is ultimately constrained by noise ...
Mohammad Talebi Khoshmehr   +6 more
wiley   +1 more source

Room-temperature and low-pressure nanoimprint lithography

open access: yes, 2002
We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achieved by using Hybrane HS2550, a semi-crystalline hyperbranched resist polymer with a glass transition temperature below and a melting point above room ...
Youinou, P   +17 more
core   +1 more source

Outlier detection in lithography: benchmarking and the creation of a new algorithm [PDF]

open access: yes, 2020
Internship Report presented as the partial requirement for obtaining a Master's degree in Data Science and Advanced AnalyticsOverlay is the measure of a lithography machine’s success at printing layers accurately atop one another.
Brown, Monika Rose
core  

Harnessing Ultrafast Optical Pulses for 3D Microfabrication by Selective Tweezing and Immobilization of Colloidal Particles in an Integrated System

open access: yesAdvanced Photonics Research, Volume 6, Issue 5, May 2025.
Microfabrication using nano‐ to micron‐sized blocks has transformative potential for next‐gen electronics, optoelectronics, and materials. Traditional methods are limited by scalability and precision. STIC, a single‐laser system for precise colloid manipulation and immobilization using femtosecond lasers, is introduced that enables efficient 3D ...
Krishangi Krishna   +4 more
wiley   +1 more source

Auto‐Routing Fluidic Printed Circuit Boards

open access: yesAdvanced Robotics Research, EarlyView.
This work introduces (STREAM) software tool for routing efficiently advanced macrofluidics, an open‐source software tool for automating the design of 3D‐printable fluidic circuit boards. STREAM streamlines tube routing and layout, enabling the rapid fabrication of fluidic networks for soft robotics, lab‐on‐a‐chip devices, microfluidics, and biohybrid ...
Savita V. Kendre   +3 more
wiley   +1 more source

Exposure tool control for advanced semiconductor lithography

open access: yesAdvanced Optical Technologies, 2015
AbstractThis is a review paper to show how we control exposure tool parameters in order to satisfy patterning performance and productivity requirements for advanced semiconductor lithography. In this paper, we will discuss how we control illumination source shape to satisfy required imaging performance, heat-induced lens aberration during exposure to ...
openaire   +1 more source

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