Results 131 to 140 of about 11,779 (261)

Exfoliated‐MoS2 Gradual Resistive Switching Devices as Artificial Synapses

open access: yesAdvanced Electronic Materials, EarlyView.
A vertical memristor based on untreated, exfoliated MoS2 is presented, revealing gradual resistive switching governed by Schottky barrier modulation at the MoS2/metal interface from the trapping/detrapping of charges. Furthermore, the device emulates synaptic‐like plasticity functions, including: potentiation, depression, and spike‐amplitude‐dependent ...
Deianira Fejzaj   +3 more
wiley   +1 more source

Monolithic Co‐Integration of Vertical FET and Memristor for 1T1R Cell

open access: yesAdvanced Electronic Materials, EarlyView.
This work demonstrates a vertically integrated one‐transistor–one‐memristor (1T1R) cell by stacking a MoS2 vertical field‐effect transistor (VFET) with a mortise–tenon‐shaped (MTS) memristor. This compact architecture not only exhibits highly uniform resistive switching characteristics but also provides a strategy for constructing densely packed ...
Fubo Jiao   +15 more
wiley   +1 more source

Reconfigurable Logic-in-Memory Oxide Transistors Enabled by Transferable Ferroelectric HZO. [PDF]

open access: yesACS Nano
Huang CC   +9 more
europepmc   +1 more source

Robust NbN‐on‐Si/SiGe Hybrid Microwave Quantum Circuits With Long‐Term Stability

open access: yesAdvanced Electronic Materials, EarlyView.
Superconducting NbN resonators integrated with Si/SiGe quantum wells based semiconducting chip are investigated as a CMOS–compatible platform for scalable quantum hardware. Temperature–dependent microwave spectroscopy reveals loss mechanisms from TLS, quasiparticles, and scattering.
Paniz Foshat   +5 more
wiley   +1 more source

Silicon Nitride Resistive Memories

open access: yesAdvanced Electronic Materials, EarlyView.
Amorphous SiNx is an attractive resistance switching material for ReRAM applications due to its physicochemical properties, such as humidity resistance, low oxygen diffusivity, and is used as a metal diffusion blocker. By modifying the ratio between N and Si atoms, the microstructure of the SiNx is affected, rendering it possible to change the ...
Alexandros‐Eleftherios Mavropoulis   +7 more
wiley   +1 more source

Progress in Semiconductor Devices and Lithography.

open access: yesThe Journal of The Institute of Electrical Engineers of Japan, 2000
openaire   +2 more sources

Home - About - Disclaimer - Privacy