Results 111 to 120 of about 11,186 (164)
On-Chip Direct Synthesis of 2D Semimetals for van der Waals Metal-Semiconductor Junction Transistor Arrays. [PDF]
ACS NanoYang J +11 more
europepmc +1 more source
Miniaturisation of Raman spectroscopy systems: from benchtop to backpocket.
Lab ChipHardy M +5 more
europepmc +1 more source
Some of the next articles are maybe not open access.
Related searches:
Related searches:
Semiconductor lithography for the next millennium
IEEE Spectrum, 1996Volume production of ICs sporting 0.1-micrometer structures is being predicted for 2007. Manufacturing tools now being developed will feature much shorter wavelengths and elaborate mirrors in place of traditional lenses. Also being honed is proximity X-ray lithography, which has produced a first level of a memory circuit with 0.25-micrometer dimensions.
L Geppert
exaly +2 more sources
Control of lithography in semiconductor manufacturing
IEEE Control Systems, 2006Lithography is important in semiconductor manufacturing because it affects both the performance and yield of the devices in each wafer. The formation of a layer in lithography equipment involves a series of steps, each of which requires process control, namely, surface preparation, spin coat, soft bake, alignment and exposure, post-exposure bake ...
exaly +2 more sources
Photomask Technology 2020, 2020
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the ...
Toshiya Asano +2 more
exaly +2 more sources
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the ...
Toshiya Asano +2 more
exaly +2 more sources
Lithography for semiconductor technology
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997Abstract We present a short overview of lithography applied to semiconductor technology. It covers optical, X-rays, electrons and ions beam lithographies. The properties of resists and of the associated processes, which are the heart of this technology, are presented.
Christian Ngô, Charles Rosilio
openaire +1 more source
Progress and outlook of lithography for semiconductor IC
2009 IEEE Custom Integrated Circuits Conference, 2009Progress of lithography from the lensless type to lens-based systems using different kinds of photon and electron beams is reported here. The stages of lithography development with their physical principles are linked to the corresponding impacts to IC designers to help them understand the reasons they are more and more restricted.
Burn J. Lin, R. G. Liu
openaire +1 more source
Sustainable semiconductor manufacturing with a focus on lithography
Novel Patterning Technologies 2024Emily Gallagher
exaly +2 more sources
Advanced semiconductor lithography
OSA Annual Meeting, 1993Optical microlithography has been the enabling technology behind the spectacular growth of the integrated circuit industry over the last two decades.
openaire +1 more source
The advantages of nanoimprint lithography for semiconductor device manufacturing
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 2019Imprint lithography is an effective and well known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate.
Keita Sakai +8 more
openaire +1 more source