Results 91 to 100 of about 11,186 (164)

Lithography for Quarter Micron Semiconductor Era. SOR Lithography Technique.

Journal of The Society of Instrument and Control Engineers, 1993
openaire   +1 more source

Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source-Mask Optimization. [PDF]

Micromachines (Basel)
Wang Q, Wu Q, Li Y, Liu X, Li Y.
europepmc   +1 more source

Mechanism of Vapor-Phase Infiltration of Organometallic Hf in Poly(Methyl Methacrylate) for Hybrid Resist Applications. [PDF]

Chem Mater
Chowdhury MI, Wu X, Lee WI, Sun P, Ahmad M, Kisslinger K, Sadowski JT, Tenney SA, Boscoboinik JA, Tiwale N, Nam CY.   +10 more
europepmc   +1 more source

High-Resolution Photolithographic Patterning of Conjugated Polymers via Reversible Molecular Doping. [PDF]

Polymers (Basel)
Kim Y, Kim S, Han S, Sung Y, Ryu Y, Kim Y, Choi HH.   +6 more
europepmc   +1 more source

Mass-Produced and High-Performance Nanowell Biosensor Fabricated via Semiconductor Manufacturing for Rapid and Accurate COVID-19 Diagnosis in the Clinical Field. [PDF]

Adv Sci (Weinh)
Park YM, Rezaei Z, Bae NH, Rho D, Kim DS, Go E, Seo Y, Lee SJ, Seo WC, Lee LP, Lee H, Shin SR.   +11 more
europepmc   +1 more source

EAAUnet-ILT: A Lightweight and Iterative Mask Optimization Resolution with SRAF Constraint Scheme. [PDF]

Micromachines (Basel)
Wang K, Ren K.
europepmc   +1 more source

Wafer-scale uniform epitaxy of transferable 2D single crystals for gate-all-around nanosheet field effect transistors. [PDF]

Nat Commun
Xue C, Tan C, Gao X, Tang J, Sun W, Yin Y, Wang M, Gao X, An H, Fu B, Liu W, Wang Y, Li Y, Ding F, Peng H.   +14 more
europepmc   +1 more source

Virtualization as a New Scaling Law for Semiconductor Devices Beyond Geometric Scaling. [PDF]

Small
Wang Z, Chen X, Lin F, Li X, Wang F, Guo S, Yu S, Li L, Huang JK.   +8 more
europepmc   +1 more source

Lithography for Quarter Micron Semiconductor Era. Improved Resolution in Optical Projection Lithography.

Journal of The Society of Instrument and Control Engineers, 1993
ASAI, Satoru, HANYU, Isamu
openaire   +1 more source

Asymmetric Diffusion Metasurface-Based Lensless Monitoring and Uniform Illumination Systems for Optical Lithography. [PDF]

Research (Wash D C)
Wang G, Shen Y, Pi Y, Kong W, Lai Y, Ma X, Zhou Y, Li F, Cao Z, Wang L, Yu S.   +10 more
europepmc   +1 more source