Results 81 to 90 of about 14,706 (300)
, 2019 Optical lithography is a photon-based technique comprised of projecting an image into a photosensitive emulsion (photoresist) coated onto a substrate such as a silicon wafer. It is the most widely used lithography process in the high volume manufacturing
Naulleau, Patrick, +2 more
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Universal Conductance Fluctuations in Quantum Anomalous Hall Insulators
Advanced Materials, EarlyView.Universal conductance fluctuations are observed in mesoscopic quantum anomalous Hall insulators. Two distinct fluctuation patterns are identified, arising from different interference processes of bulk and chiral edge states, respectively. These findings unveil rich quantum interference phenomena in quantum anomalous Hall insulators and provide insights
Peng Deng +11 more
wiley +1 more source
, 2006 Nanoelectrode lithography is a pattern duplication method which combine template and electrochemical reaction. With the nanoelectrode lithography, electrochemical reaction occurs along with the conductive area of the template, and oxide pattern can be ...
Atsushi Yokoo +2 more
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Advanced Materials, EarlyView.We demonstrate a neuromorphic synapse in 2D Fe3GaTe2 flakes. The device operates via a current‐driven transformation from a skyrmion‐lattice to a stripe‐domain state, yielding a linear anomalous Hall resistance response with a tunable slope to enable multiply‐accumulate operations. Simulations confirm its viability in artificial neural networks.
Jixiang Huang +20 more
wiley +1 more source
n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz
Advanced Materials, EarlyView.Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis +19 more
wiley +1 more source
Increasing Complexity and Limits of Organization in the Microlithography Industry: Implications for Japanese Science-based Industries [PDF]
The purpose of this paper is to identify characteristics of the complexities and organizational limits that science-based industries in Japan are facing, to clarify the causes and effects of those characteristics and to show how they are related to the ...
Hiroyuki Chuma
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A micro-positioning motion system to enhance lithography in semiconductor manufacturing machines
, 2020 This study proposes a novel precision micro-motion system to enhance the lithography process in the semiconductor manufacturing machines. This proposed micro-motion system is a new smart-materials stage that integrates piezoelectric actuators in the ...
Al-Tamimi, Mahmoud
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Advanced Materials, EarlyView.The perspective presents an integrated view of neuromorphic technologies, from device physics to real‐time applicability, while highlighting the necessity of full‐stack co‐optimization. By outlining practical hardware‐level strategies to exploit device behavior and mitigate non‐idealities, it shows pathways for building efficient, scalable, and ...
Kapil Bhardwaj +8 more
wiley +1 more source
Sensors, 2012 This paper reports a versatile nano-sensor technology using “top-down” poly-silicon nanowire field-effect transistors (FETs) in the conventional Complementary Metal-Oxide Semiconductor (CMOS)-compatible semiconductor process.
Chia-Hua Ho +9 more
doaj +1 more source
Fast and accurate lithography simulation and optical proximity correction for nanometer design for manufacturing [PDF]
, 2009 textAs semiconductor manufacture feature sizes scale into the nanometer dimension, circuit layout printability is significantly reduced due to the fundamental limit of lithography systems.
Yu, Peng
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