Results 81 to 90 of about 770,517 (280)

Synergistic precision microfabrication enabling high‐performance multiplexed ceramic MEMS gas sensor arrays with pulse temperature modulation functionality

FlexMat
Gas sensing in complex environments requires advanced technologies that overcome the limitations of traditional semiconductor, electrochemical, and optical sensors.
Yuxin Zhao, Jianxiu Guo, Ming Lei, Heng Yang, Hongze Jiang, Juan Wang, Shunping Zhang   +6 more
doaj   +1 more source

Phase Engineering of Nanomaterials (PEN): Evolution, Current Challenges, and Future Opportunities

Advanced Materials, EarlyView.
This review summarizes the synthesis, phase transition, advanced characterization spanning ex situ to in situ and operando techniques, and diverse applications of phase engineering of nanomaterials (PEN). It further outlines key challenges and future opportunities, such as phase stability, architecture control, and artificial intelligence (AI)‐driven ...
Ye Chen, Zhanxi Fan, Jingjie Ge, Qiyuan He, Zhuangchai Lai, Jiawei Liu, Chaoliang Tan, Hua Zhang   +7 more
wiley   +1 more source

DNA-based doping and fabrication of PN diodes

Frontiers in Nanotechnology
This paper reports the fabrication of silicon PN diode by using DNA nanostructure as the etching template for SiO2 and also as the n-dopant of Si. DNA nanotubes were deposited onto p-type silicon wafer that has a thermal SiO2 layer.
Ruobing Bai, Yihan Liu, Bomin Zhang, Beishan Chen, Feng Xiong, Haitao Liu   +5 more
doaj   +1 more source

Bioelectrical Interfaces Beyond Excitable Cells: Cancer, Aging, and Gene Expression Modulation

Advanced Materials Interfaces, EarlyView.
ABSTRACT The investigation of biological conductivity has evolved from its classical foundation based on ionic fluxes underpinning cardiac and neuronal excitability to a multifaceted regulator of cellular physiology. Traditional approaches for probing electrical events in living matter focused largely on action potentials recording.
Paolo Cadinu, Matthew K. Burgess, Catarina Franco Jones, Marzia Iarossi, Manuel Schröter, Nako Nakatsuka, Mustafa B. A. Djamgoz, Gil Gonçalves, Sidahmed Abayzeed, Paola Sanjuán‐Alberte, Paula M. Mendes, Frankie J. Rawson, Malavika Nair, Michael Levin, Rosalia Moreddu   +14 more
wiley   +1 more source

Nanoimprint—Mo(o)re than Lithography

Encyclopedia
Nanoimprint lithography (NIL) is a high-resolution parallel patterning method based on molding. It has proven resolution down to the nanometer range and can be scaled up for large areas and high throughput.
Helmut Schift
doaj   +1 more source

High‐Performance, Paper‐Based Microelectronics via a Micromodular Fabrication Process

Advanced Materials Interfaces, EarlyView.
This study demonstrates high‐performance silicon micromodular transistors on cellulose nanomaterial‐coated paper, with interconnects formed via e‐jet printing. Transistors exhibit excellent electrical properties and maintain performance under applied strain.
Rebecca K. Banner, Hubert N. Elly, Kaifan Yue, Cyra Moobed, Siddharth Kurup, Daniel Aziz, Kira L. Barton, Victor Breedveld, Eric M. Vogel, Michael A. Filler   +9 more
wiley   +1 more source

Heterodyne polarimetry technology for inspection of critical dimensions

EPJ Web of Conferences, 2010
Heterodyne polarimetry is based on the analysis of phases and polarization states of two frequency shifted cross-polarized waves, generated by Zeeman lasers and their analogs [1]. In semiconductor industry, manufacturing of memory chips depends on the
Protopopov V.
doaj   +1 more source

Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiNx for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles

Advanced Materials Interfaces, EarlyView.
Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim, Sung Kyu Jang, Jihun Kim, Jong‐Hyun Choi, Ji‐Beom Yoo, Hyun‐Mi Kim, Seul‐Gi Kim, Hyeongkeun Kim   +7 more
wiley   +1 more source

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

ACS Nano
Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate patterning performance of a resist in lithography is limited because of the trade-off between resolution, line ...
M. Saifullah, A. Rajak, Kevin Hofhuis, Nikhil Tiwale, Zackaria Mahfoud, Andrea Testino, Prajith Karadan, M. Vockenhuber, D. Kazazis, Suresh Valiyaveettil, Y. Ekinci   +10 more
semanticscholar   +1 more source

Spin‐On SiOx‐Assisted Inkjet Printing for Interdigitated n+ and p+ Poly‐Si/SiOx Contacts in Silicon Solar Cells With Suppressed Unintended Doping

Advanced Materials Technologies, EarlyView.
This work presents an innovative spin‐on SiOx‐assisted inkjet‐printed approach to form localized n+ and p+ poly‐Si/SiOx passivating contacts for high‐efficiency silicon solar cells within a single‐annealing step. The developed process results in a well‐defined interdigitated doping pattern, with unintended doping and cross‐doping concentrations ...
Jiali Wang, Jinlei Ren, Laura Creon, Paula Peres, Rene Chemnitzer, Pierre‐Yves Corre, Sieu Pheng Phang, Daniel Macdonald, AnYao Liu   +8 more
wiley   +1 more source