Results 61 to 70 of about 11,186 (164)

Nanoimprint—Mo(o)re than Lithography

Encyclopedia
Nanoimprint lithography (NIL) is a high-resolution parallel patterning method based on molding. It has proven resolution down to the nanometer range and can be scaled up for large areas and high throughput.
Helmut Schift
doaj   +1 more source

Heterodyne polarimetry technology for inspection of critical dimensions

EPJ Web of Conferences, 2010
Heterodyne polarimetry is based on the analysis of phases and polarization states of two frequency shifted cross-polarized waves, generated by Zeeman lasers and their analogs [1]. In semiconductor industry, manufacturing of memory chips depends on the
Protopopov V.
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Process development to realize all-semiconductor InGaP-GaAs based photonic-crystal surface emitting lasers

Micro and Nano Engineering
Semiconductor lasers are the most efficient devices for light generation. The Photonic Crystal Surface Emitting Laser (PCSEL) is a type of semiconductor laser that uses a 2D photonic crystal (PC) structure acting as the lateral cavity.
Sammeta Poojitha, Pietro Della Casa, Olaf Brox, Jörg Fricke, Ralph-Stephan Unger, Dirk Rentner, Ben King, Paul Crump, Markus Weyers, Andrea Knigge, Günther Tränkle   +10 more
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Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance

Advanced Materials Interfaces
Electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) have been continuously improved and applied in semiconductor and biomedical device manufacturing. With the development of biomedical nanodevices, the demand for biodegradable, and
Yurui Wu, Siliang Zhang, Xuewen Cui, Xue Cong, Shuang Liu, Lei Wang, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Jun Zhao, Shumin Yang, Yanqing Wu, Guoqiang Yang   +14 more
doaj   +1 more source

A Sub-Pixel Measurement Platform Using Twist-Angle Analysis in Two-Dimensional Planes

Sensors
Arrayed ultraviolet (UV) LED light sources have been widely applied in various semiconductor processes, ranging from photopolymerization to lithography.
Jiangbo Lyu, Wenchao Kong, Yan Zhou, Yazhi Pi, Zizheng Cao   +4 more
doaj   +1 more source

Solution-Processed Submicron-Channel Organic Ferroelectric Memristors with a Low Operation Voltage of 1 V. [PDF]

Small Methods
Xu K, Sheng C, Xia D, Qiu ZJ, Cong C, Liu R, Hu L.   +6 more
europepmc   +1 more source

The Evolution of Lithography: From Resolution Scaling to Manufacturing Constraints. [PDF]

Micromachines (Basel)
Chae H, Park H, Kang DJ.
europepmc   +1 more source

Nitrogen-Vacancy Centers in Fluorescent Nanodiamonds: Emerging Applications from Healthcare Diagnostics to Semiconductor Metrology. [PDF]

Acc Chem Res
Chang HC.
europepmc   +1 more source

Stitch-Less Lithography Empowered by Multi-Dimensional Holography. [PDF]

Nanomaterials (Basel)
Huang HH, Mu H, Puig Vilardell E, Anand V, Gailevičius D, Juodkazis S.   +5 more
europepmc   +1 more source

Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography. [PDF]

Chem Sci
Chu TTH, Le DN, Lee M, Narayan DM, Kim DS, Shirodkar S, Choe M, Yoo S, Tiwale N, Choi R, Ahn J, Sung MM, Nam CY, Kim J.   +13 more
europepmc   +1 more source