Results 51 to 60 of about 11,186 (164)

Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network

Journal of Microelectronic Manufacturing, 2018
In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process.
Xingyu Zhou, Youling Yu
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Chemical Lift-Off Lithography of Metal and Semiconductor Surfaces [PDF]

ACS Materials Letters, 2019
Chemical lift-off lithography (CLL) is a subtractive soft-lithographic technique that uses polydimethylsiloxane (PDMS) stamps to pattern self-assembled monolayers of functional molecules for applications ranging from biomolecule patterning to transistor fabrication.
Kevin M. Cheung, Dominik M. Stemer, Chuanzhen Zhao, Thomas D. Young, Jason N. Belling, Anne M. Andrews, Paul S. Weiss   +6 more
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Cross-scale structures fabrication via hybrid lithography for nanolevel positioning

Microsystems & Nanoengineering
Planar cross-scale structures encode position and posture, enabling nanometer-level accuracy and multi-scale cascaded precision, emerging as a potential sensing device for semiconductor manufacturing and inspection systems.
Jingwen Li, Shengtong Wang, Xinghui Li
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Advanced lithography for compound semiconductor applications

III-Vs Review, 2002
AbstractThis paper focuses on state-of-the-art lithography technology for advanced applications in compound semiconductor material processing. The need for thinned substrate materials in high frequency as well as power devices creates new challenges in the handling of extremely fragile and costly substrates.
Weixlberger, J., Lindner, P.
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A CMOS-Compatible Poly-Si Nanowire Device with Hybrid Sensor/Memory Characteristics for System-on-Chip Applications

Sensors, 2012
This paper reports a versatile nano-sensor technology using “top-down” poly-silicon nanowire field-effect transistors (FETs) in the conventional Complementary Metal-Oxide Semiconductor (CMOS)-compatible semiconductor process.
Chia-Hua Ho, Fu-Liang Yang, Chien-Chao Huang, Jian-Tai Qiu, Jim-Tong Horng, Chao-Hsin Chien, Tsung-Fan Hsieh, Hao-Yu Chen, Chia-Yi Lin, Min-Cheng Chen   +9 more
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Experimental Demonstration of a Multicorrugation-Pitch-Modulated (MCPM) DFB Semiconductor Laser Based on Reconstruction-Equivalent-Chirp Technology

IEEE Photonics Journal, 2015
A multicorrugation-pitch-modulated (MCPM) distributed-feedback semiconductor laser is experimentally demonstrated for the first time to achieve stable single longitudinal mode (SLM) performance.
Jilin Zheng, Yunshan Zhang, Yuechun Shi, Weichun Li, Bocang Qiu, Jun Lu, Tingting Zhang, Xiangfei Chen   +7 more
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Can mems take advantage of advances in semiconductor lithography? [PDF]

2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), 2010
Progress of lithography has helped to spearhead the semiconductor industry to follow Moore's law to sustain improvement of performance and reduction of cost for decades. The MEMS industry, having started later and being less developed in economy of scale, can take advantage of the experience of semiconductor patterning to make MEMS patterning cheaper ...
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An inorganic-blended p-type semiconductor with robust electrical and mechanical properties

Nature Communications
Inorganic semiconductors typically have limited p-type behavior due to the scarcity of holes and the localized valence band maximum, hindering the progress of complementary devices and circuits.
You Meng, Weijun Wang, Rong Fan, Zhengxun Lai, Wei Wang, Dengji Li, Xiaocui Li, Quan Quan, Pengshan Xie, Dong Chen, He Shao, Bowen Li, Zenghui Wu, Zhe Yang, SenPo Yip, Chun-Yuen Wong, Yang Lu, Johnny C. Ho   +17 more
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Synergistic precision microfabrication enabling high‐performance multiplexed ceramic MEMS gas sensor arrays with pulse temperature modulation functionality

FlexMat
Gas sensing in complex environments requires advanced technologies that overcome the limitations of traditional semiconductor, electrochemical, and optical sensors.
Yuxin Zhao, Jianxiu Guo, Ming Lei, Heng Yang, Hongze Jiang, Juan Wang, Shunping Zhang   +6 more
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DNA-based doping and fabrication of PN diodes

Frontiers in Nanotechnology
This paper reports the fabrication of silicon PN diode by using DNA nanostructure as the etching template for SiO2 and also as the n-dopant of Si. DNA nanotubes were deposited onto p-type silicon wafer that has a thermal SiO2 layer.
Ruobing Bai, Yihan Liu, Bomin Zhang, Beishan Chen, Feng Xiong, Haitao Liu   +5 more
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