Results 31 to 40 of about 770,517 (280)
Nanosphere Lithography for Nitride Semiconductors
, 2010 Ch ...
Choi, HW, Fu, WY
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Lithography reticle scheduling in semiconductor manufacturing
Engineering Optimization, 2023 The lithography process in semiconductor dynamic random-access memory (DRAM) fabrication plants (fabs) is usually a major bottleneck, and reticle scheduling is complicated by process-specific constraints such as diversity of the product mix and rapidly changing deadlines.
Lee, Chia-Yen +4 more
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Seedless-electroplating Process Development for Micro-features Realization
International Journal of Technology, 2015 This study aims to combine the seedless-electroplating process with maskless-lithography, as an alternative for Lithografie, Galvanoformung, Abformung (LIGA) or Lithography, Electroplating and Molding with a normal, simpler, and cheaper semiconductor ...
Yudan Whulanza +3 more
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Advanced Materials Interfaces, 2023 Continuing extreme downscaling of semiconductor devices, essential for high performance and energy efficiency of future microelectronics, hinges on extreme ultraviolet lithography (EUVL) and addressing associated challenges.
Ashwanth Subramanian +7 more
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Ion beam induced current analysis in GaN microwires [PDF]
EPJ Web of Conferences, 2020 GaN is a wide bandgap semiconductor which is expected to withstand high radiation doses. Consequently, it is considered a promising material for new generation particle detectors in radiation related applications.
Verheij Dirkjan +8 more
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The Development of Photolithographic Technology and Machines [PDF]
SHS Web of Conferences, 2023 Photolithography is the most complicated, accurate, expensive process in the manufacture of integrated circuits. The lithography machine is one of the most critical equipment in photolithographic process, which is used to duplicate the circuit ...
Zeng Ailin
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Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System
IEEE Access, 2017 This paper describes the use of ArF immersion lithography to verify the feasibility of a self-developed freeform illumination source that exposes features on masks and forms resist patterns.
Frederick Lie +4 more
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Macromolecular Materials and EngineeringPhoto‐crosslinkers, as materials with negative photoresist characteristics, are applied in the direct lithography process of organic semiconductor devices.
Yueping Lai, Liang‐Wen Feng
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Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2010 The present paper considers optimization of lens adjustment in semiconductor lithography equipment. For improving productivity, the laser irradiation power of recent semiconductor lithography equipment has been boosted, which causes significant ...
Yuji SHINANO +3 more
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Micromachines, 2022 A kind of ultra-thin transmissive color filter based on a metal-semiconductor-metal (MSM) structure is proposed. The displayed color can cover the entire visible range and switches after H2 treatment. An indium gallium zinc oxide (IGZO) semiconductor was
Xiangrui Fan +3 more
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