Results 41 to 50 of about 14,706 (300)

The Future of Semiconductor Lithography? Look to Flash [PDF]

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2013
Thirty years ago, when I began working in lithography for semiconductor manufacturing, the bellwether of our industry was DRAM. Resolution was defined by the smallest DRAM half-pitch, and our technology nodes were named after DRAM densities. DRAM costs often determined the affordability of a personal computer, and everyone wanted more memory.
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Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

, 2015
This work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162).Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated
J. R. Y. Stevenson, Samuel, Ifor David William, B. Ebenhoch, I. D. W. Samuel, S. Zhang, Whitworth, Guy Luke, G. L. Whitworth, Stevenson, James Robert Young, Zhang, Shuyu, Ebenhoch, Bernd, Turnbull, Graham A., G. A. Turnbull   +11 more
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Photo-reduction of silver salts on highly heterogeneous lead zirconate titanate [PDF]

, 2007
This paper presents the work undertaken to determine the influences on the photo-induced growth of silver nanoclusters on the surfaces of lead zirconate titanate thin films.
Dunn, Steve, Jones, Paul M.
core   +1 more source

All‐in‐One Analog AI Hardware: On‐Chip Training and Inference with Conductive‐Metal‐Oxide/HfOx ReRAM Devices

Advanced Functional Materials, EarlyView.
An all‐in‐one analog AI accelerator is presented, enabling on‐chip training, weight retention, and long‐term inference acceleration. It leverages a BEOL‐integrated CMO/HfOx ReRAM array with low‐voltage operation (<1.5 V), multi‐bit capability over 32 states, low programming noise (10 nS), and near‐ideal weight transfer.
Donato Francesco Falcone, Victoria Clerico, Wooseok Choi, Tommaso Stecconi, Folkert Horst, Laura Bégon‐Lours, Matteo Galetta, Antonio La Porta, Nikhil Garg, Fabien Alibart, Bert Jan Offrein, Valeria Bragaglia   +11 more
wiley   +1 more source

Intermediate Resistive State in Wafer‐Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications

Advanced Functional Materials, EarlyView.
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa, Milan Buttberg, Ke Ran, Rana Walied Ahmad, Dennis Braun, Lukas Völkel, Jimin Lee, Sofía Cruces, Bart Macco, Bárbara Canto, Holger Lerch, Thorsten Wahlbrink, Holger Kalisch, Michael Heuken, Andrei Vescan, Joachim Mayer, Zhenxing Wang, Ilia Valov, Stephan Menzel, Max C. Lemme   +19 more
wiley   +1 more source

Ultra-high precision nano additive manufacturing of metal oxide semiconductors via multi-photon lithography

Nature Communications
As a basic component of the versatile semiconductor devices, metal oxides play a critical role in modern electronic information industry. However, ultra-high precision nanopatterning of metal oxides often involves multi-step lithography and transfer ...
Chun Cao, Xianmeng Xia, Xiaoming Shen, Xiaobing Wang, Zhenyao Yang, Qiulan Liu, Chenliang Ding, Dazhao Zhu, Cuifang Kuang, Xu Liu   +9 more
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Optimizing Movement Sequences for Step-and-Scan Lithography Equipment

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2013
The purpose of this work is to improve the throughput of step-and-scan lithography equipment to shorten the production time of a wafer. For this purpose, we propose a method for solving the MSOP (Movement Sequence Optimization Problem), which is the ...
Yuji SHINANO, Nobuo INUI, Youzou FUKAGAWA, Noburu TAKAKURA   +3 more
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Friction-Induced Nanofabrication: A Review

Chinese Journal of Mechanical Engineering, 2021
As the bridge between basic principles and applications of nanotechnology, nanofabrication methods play significant role in supporting the development of nanoscale science and engineering, which is changing and improving the production and lifestyle of ...
Bingjun Yu, Linmao Qian
doaj   +1 more source

Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips

Advanced Functional Materials, EarlyView.
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee, Sofía Cruces, Xiaohua Liu, Yang Chen, Vasilis A. Maroufidis, Janghyun Jo, Lukas Völkel, Dennis Braun, Michael Möller, Leon Brackmann, Holger Kalisch, Michael Heuken, Andrei Vescan, Rafal E. Dunin‐Borkowski, Joachim Mayer, Stefan Wiefels, Max C. Lemme   +16 more
wiley   +1 more source

Chemical Lift-Off Lithography of Metal and Semiconductor Surfaces [PDF]

ACS Materials Letters, 2019
Chemical lift-off lithography (CLL) is a subtractive soft-lithographic technique that uses polydimethylsiloxane (PDMS) stamps to pattern self-assembled monolayers of functional molecules for applications ranging from biomolecule patterning to transistor fabrication.
Kevin M. Cheung, Dominik M. Stemer, Chuanzhen Zhao, Thomas D. Young, Jason N. Belling, Anne M. Andrews, Paul S. Weiss   +6 more
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