Electrically Induced Phase Transition and Synaptic Functionality in MoTe2/Graphene Memristors
An electrically induced reversible 2H ↔ 1T′ phase transition is demonstrated in a vertical Au/Ti/MoTe2/graphene memristor with a laterally contacted graphene electrode. Resistive switching proceeds through a compositionally invariant amorphous/2H ↔ amorphous/1T′ transformation, in which a self‐formed amorphous MoTe2 interfacial region is proposed to ...
Chien‐Hua Wang +7 more
wiley +1 more source
Architecture‐Driven Functional Coupling in Vertically Aligned Nanocomposites
Vertically aligned nanocomposites define a growth‐engineered architecture in which vertical interfaces, strain fields, defect pathways, and phase connectivity are created simultaneously. This review shows how these architectural features couple ferroic, optical, ionic, electrochemical, and device responses, establishing design rules and open challenges
Md Shatil Islam‐Shanto +4 more
wiley +1 more source
The Future of Semiconductor Lithography? Look to Flash [PDF]
Thirty years ago, when I began working in lithography for semiconductor manufacturing, the bellwether of our industry was DRAM. Resolution was defined by the smallest DRAM half-pitch, and our technology nodes were named after DRAM densities. DRAM costs often determined the affordability of a personal computer, and everyone wanted more memory.
openaire +1 more source
Covalent Functionalization of 2D Semiconductors: A Roadmap to Advanced Electronic Devices
This Review presents recent advances in the covalent functionalization strategies for two‐dimensional semiconductors and their implementation in modern technologies. Layered materials are modified through diverse molecular chemistries (e.g., thiols, diazonium salts, alkyl halides, and electron‐deficient species) to tailor their surface properties ...
Ramiro Quirós‐Ovies +2 more
wiley +1 more source
An Adaptive Inhibitory WSe2 Transistor for Retinomorphic In‐Sensor Image Processing
Conventional retinomorphic devices typically require deliberate gate‐bias tuning for each illumination condition. In this paper, we demonstrate an adaptive inhibitory WSe2 transistor that uses photo‐induced regime shift between the subthreshold and accumulation modes to achieve decision‐free, intensity‐adaptive image processing within a single pixel ...
Juhwan Baek +12 more
wiley +1 more source
Arrays of Organic Thin Film Transistors Fabricated with Aligned Solution-Stamping
Patterning of organic semiconductors faces many technological challenges because organic semiconductor materials are highly sensitive to the fabrication environment, such as intensive irradiation and harsh chemical process during conventional lithography.
Qing Yan +4 more
doaj +1 more source
CORNERSTONE’s Silicon Photonics Rapid Prototyping Platforms: Current Status and Future Outlook
The field of silicon photonics has experienced widespread adoption in the datacoms industry over the past decade, with a plethora of other applications emerging more recently such as light detection and ranging (LIDAR), sensing, quantum photonics ...
Callum G. Littlejohns +32 more
doaj +1 more source
A removable sacrificial polymer layer engineers the thermal boundary condition during nanosecond laser ablation of PET, suppressing heat‐affected‐zone formation without relying on costly ultrafast lasers. This strategy enables deep, high‐aspect‐ratio trenches with no detectable heat‐affected zone, templating silver‐filled mesh electrodes with record ...
Mehdi Zarei +3 more
wiley +1 more source
Top‐Down Fabrication of Ordered Nanophotonic Structures for Biomedical Applications
The size, distribution, and specific shape of ordered nanophotonic structures are crucial for their biomedical applications. Bottom‐up approaches such as self‐assembly, emulsification, and precipitation are commonly fabricated nanophotonic structures ...
Baohua Wen +4 more
doaj +1 more source
Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization
Source and mask joint optimization (SMO) is a widely used computational lithography method for state-of-the-art optical lithography process to improve the yield of semiconductor wafers.
Xu Ma, Zhiqiang Wang, Gonzalo R. Arce
doaj +1 more source

