Results 41 to 50 of about 770,517 (280)

All‐in‐One Analog AI Hardware: On‐Chip Training and Inference with Conductive‐Metal‐Oxide/HfOx ReRAM Devices

Advanced Functional Materials, EarlyView.
An all‐in‐one analog AI accelerator is presented, enabling on‐chip training, weight retention, and long‐term inference acceleration. It leverages a BEOL‐integrated CMO/HfOx ReRAM array with low‐voltage operation (<1.5 V), multi‐bit capability over 32 states, low programming noise (10 nS), and near‐ideal weight transfer.
Donato Francesco Falcone, Victoria Clerico, Wooseok Choi, Tommaso Stecconi, Folkert Horst, Laura Bégon‐Lours, Matteo Galetta, Antonio La Porta, Nikhil Garg, Fabien Alibart, Bert Jan Offrein, Valeria Bragaglia   +11 more
wiley   +1 more source

Friction-Induced Nanofabrication: A Review

Chinese Journal of Mechanical Engineering, 2021
As the bridge between basic principles and applications of nanotechnology, nanofabrication methods play significant role in supporting the development of nanoscale science and engineering, which is changing and improving the production and lifestyle of ...
Bingjun Yu, Linmao Qian
doaj   +1 more source

Circular‐Polarization‐Sensitive Organic Photodetectors with a Chiral Nanopatterned Electrode Inverse‐Designed by Genetic Algorithm

Advanced Functional Materials, EarlyView.
A chiral photodetector capable of selectively distinguishing left‐ and right‐handed circularly polarized light is experimentally demonstrated. The device, which features a nanopatterned electrode inverse‐designed by a genetic algorithm within a metal–dielectric–metal nanocavity that incorporates a vacuum‐deposited small‐molecule multilayer, exhibits ...
Kyung Ryoul Park, Jewoong Lee, In‐Suk Choi, Changsoon Kim   +3 more
wiley   +1 more source

Optimizing Movement Sequences for Step-and-Scan Lithography Equipment

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2013
The purpose of this work is to improve the throughput of step-and-scan lithography equipment to shorten the production time of a wafer. For this purpose, we propose a method for solving the MSOP (Movement Sequence Optimization Problem), which is the ...
Yuji SHINANO, Nobuo INUI, Youzou FUKAGAWA, Noburu TAKAKURA   +3 more
doaj   +1 more source

Intermediate Resistive State in Wafer‐Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications

Advanced Functional Materials, EarlyView.
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa, Milan Buttberg, Ke Ran, Rana Walied Ahmad, Dennis Braun, Lukas Völkel, Jimin Lee, Sofía Cruces, Bart Macco, Bárbara Canto, Holger Lerch, Thorsten Wahlbrink, Holger Kalisch, Michael Heuken, Andrei Vescan, Joachim Mayer, Zhenxing Wang, Ilia Valov, Stephan Menzel, Max C. Lemme   +19 more
wiley   +1 more source

12-Spin-Qubit Arrays Fabricated on a 300 mm Semiconductor Manufacturing Line [PDF]

Nano letters (Print)
Intel’s efforts to build a practical quantum computer are focused on developing a scalable spin-qubit platform leveraging industrial high-volume semiconductor manufacturing expertise and 300 mm fabrication infrastructure.
Hubert C George, M. Ma̧dzik, E. Henry, Andrew J Wagner, M. M. Islam, F. Borjans, Elliot J. Connors, J. Corrigan, Matthew J. Curry, M. Harper, Daniel Keith, L. Lampert, F. Luthi, F. Mohiyaddin, Sandra Murcia, R. Nair, Rambert Nahm, Aditi Nethwewala, S. Neyens, B. Patra, Roy D. Raharjo, C. Rogan, Rostyslav Savytskyy, Thomas F. Watson, Joshua Ziegler, O. Zietz, S. Pellerano, Ravi Pillarisetty, Nathaniel C. Bishop, S. Bojarski, Jeanette Roberts, Jim Clarke   +31 more
semanticscholar   +1 more source

Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips

Advanced Functional Materials, EarlyView.
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee, Sofía Cruces, Xiaohua Liu, Yang Chen, Vasilis A. Maroufidis, Janghyun Jo, Lukas Völkel, Dennis Braun, Michael Möller, Leon Brackmann, Holger Kalisch, Michael Heuken, Andrei Vescan, Rafal E. Dunin‐Borkowski, Joachim Mayer, Stefan Wiefels, Max C. Lemme   +16 more
wiley   +1 more source

2D Magnetic and Topological Quantum Materials and Devices for Ultralow Power Spintronics

Advanced Functional Materials, EarlyView.
2D magnets and topological quantum materials enable ultralow‐power spintronics by combining robust magnetic order with symmetry‐protected, Berry‐curvature‐driven transport. Fundamentals of 2D anisotropy and spin‐orbit‐coupling induced band inversion are linked to scalable growth and vdW stacking.
Brahmdutta Dixit, Yifei Yang, Shawn Li, Yu‐Chia Chen, Qi Jia, Jian‐Ping Wang   +5 more
wiley   +1 more source

Adaptive reinforcement learning for lithography optimization: a scalable AI-driven solution for next-generation semiconductor manufacturing

Scientific Reports
Semiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid, Fahad Shafique, Hamza Atif, Waleed Waheed, Rizwan Khan, Muhammad Akmal   +5 more
doaj   +1 more source

CORNERSTONE’s Silicon Photonics Rapid Prototyping Platforms: Current Status and Future Outlook

Applied Sciences, 2020
The field of silicon photonics has experienced widespread adoption in the datacoms industry over the past decade, with a plethora of other applications emerging more recently such as light detection and ranging (LIDAR), sensing, quantum photonics ...
Callum G. Littlejohns, David J. Rowe, Han Du, Ke Li, Weiwei Zhang, Wei Cao, Thalia Dominguez Bucio, Xingzhao Yan, Mehdi Banakar, Dehn Tran, Shenghao Liu, Fanfan Meng, Bigeng Chen, Yanli Qi, Xia Chen, Milos Nedeljkovic, Lorenzo Mastronardi, Rijan Maharjan, Sanket Bohora, Ashim Dhakal, Iain Crowe, Ankur Khurana, Krishna C. Balram, Luca Zagaglia, Francesco Floris, Peter O’Brien, Eugenio Di Gaetano, Harold M.H. Chong, Frederic Y. Gardes, David J. Thomson, Goran Z. Mashanovich, Marc Sorel, Graham T. Reed   +32 more
doaj   +1 more source