Results 11 to 20 of about 11,779 (261)

Overview of EUV, E-Beam, and X-Ray Lithographies and Introduction to Photoresists [PDF]

MATEC Web of Conferences
The development of photolithography is advanced rapidly, and various technologies have mature, such as Extreme ultraviolet (EUVL) and electron beam lithography. The photoligraphy materials have also been gradually upgraded and improved.
Wang Yizhu
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Shadow-wall lithography of ballistic superconductor–semiconductor quantum devices

Nature Communications, 2021
Advanced fabrication techniques enable a wide range of quantum devices, such as the realization of a topological qubit. Here, the authors introduce an on-chip fabrication technique based on shadow walls to implement topological qubits in an InSb nanowire
Sebastian Heedt, Marina Quintero-Pérez, Francesco Borsoi, Alexandra Fursina, Nick van Loo, Grzegorz P. Mazur, Michał P. Nowak, Mark Ammerlaan, Kongyi Li, Svetlana Korneychuk, Jie Shen, May An Y. van de Poll, Ghada Badawy, Sasa Gazibegovic, Nick de Jong, Pavel Aseev, Kevin van Hoogdalem, Erik P. A. M. Bakkers, Leo P. Kouwenhoven   +18 more
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The Evolution, Challenges, and Cutting-Edge Breakthroughs in Wafer Lithography Technology [PDF]

MATEC Web of Conferences
Lithography technology is the core process in the manufacturing of integrated circuits. However, with the continuous development and progress of science and technology, lithography technology is encountering various challenges.
Wu Ruiqi
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A 3D printed metallized Fabry–Perot cavity antenna with improved bandwidth and low side‐lobe levels

Electronics Letters, 2021
A 3D printed metallized Fabry–Perot cavity antenna centred at 5.8 GHz is presented in this letter. A non‐uniform grid superstrate and a choke groove are employed in the Fabry–Perot cavity antenna to improve the input bandwidth and decrease the side lobes.
Ke Xu, Lin Zhou, Bing Zhang, Xing Chen
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Lensless metrology for semiconductor lithography at EUV [PDF]

Modeling Aspects in Optical Metrology VII, 2019
The production of modern semiconductor devices is based on photolithography, a process through which a pattern engraved on a mask is projected on a silicon wafer coated with a photosensitive material. In the past few decades, continuous technological progress in this field allowed the industry to follow Moore’s law by reducing the size of the printed ...
Mochi, Iacopo, Kazazis, Dimitrios, Tseng, Li-Ting, Fernandez, Sara, Rajeev, Rajendran, Locans, Uldis, Dejkameh, Atoosa, Nebling, Ricarda, Ekinci, Yasin   +8 more
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Technological strategies for self-assembly of PS-b-PDMS in cylindrical sub-10 nm nanostructures for lithographic applications

Advances in Physics: X, 2018
The continuous demand for small portable electronics is pushing the semiconductor industry to develop novel lithographic methods to fabricate the elementary structures for microelectronics devices with dimensions below 10 nm.
Tommaso Jacopo Giammaria, Michele Laus, Michele Perego   +2 more
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Nanosphere Lithography for Nitride Semiconductors

, 2010
Ch ...
Choi, HW, Fu, WY
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Lens System Adjustment in Semiconductor Lithography Equipment

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2008
In this paper, we address the problem of lens aberration adjustment for lenses of semiconductor lithography equipment. The objective of aberration adjustment is to minimize the maximum value of aberration in any part of the images that are projected on ...
Yuji SHINANO, Youzou FUKAGAWA, Yoshimi TAKANO, Toshiyuki YOSHIHARA   +3 more
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Innovation on Line Cut Methods of Self-aligned Multiple Patterning

Journal of Microelectronic Manufacturing, 2019
Self-aligned multiple patterning (SAMP) can enable the semiconductor scaling before EUV lithography becomes mature for industry use. Theoretically any small size of pitch can be achieved by repeating SADP on same wafer but with challenges of pitch ...
Jeff Shu
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Review of Metasurfaces and Metadevices: Advantages of Different Materials and Fabrications

Nanomaterials, 2022
Flat optics, metasurfaces, metalenses, and related materials promise novel on-demand light modulation within ultrathin layers at wavelength scale, enabling a plethora of next-generation optical devices, also known as metadevices.
Wei-Lun Hsu, Yen-Chun Chen, Shang Ping Yeh, Qiu-Chun Zeng, Yao-Wei Huang, Chih-Ming Wang   +5 more
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