Results 11 to 20 of about 770,517 (280)

Ultra-high precision nano additive manufacturing of metal oxide semiconductors via multi-photon lithography

Nature Communications
As a basic component of the versatile semiconductor devices, metal oxides play a critical role in modern electronic information industry. However, ultra-high precision nanopatterning of metal oxides often involves multi-step lithography and transfer ...
Chun Cao, Xianmeng Xia, Xiaoming Shen, Xiaobing Wang, Zhenyao Yang, Qiulan Liu, Chenliang Ding, Dazhao Zhu, Cuifang Kuang, Xu Liu   +9 more
doaj   +2 more sources

Charting CEBL's role in mainstream semiconductor lithography [PDF]

SPIE Proceedings, 2013
historically kept it out of mainstream fabs. Thanks to continuing EBDW advances combined with the industry’s move to unidirectional (1D) gridded layout style, EBDW promises to cost-efficiently complement 193nm ArF immersion (193i) optical lithography in high volume manufacturing (HVM).
D. Lam
openaire   +2 more sources

Optimum Adjustment for Distortion in Semiconductor Lithography Equipment

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2008
In this paper, we consider the problem of lens distortion adjustment of semiconductor lithography equipment. The objective of adjustment is to minimize the maximum absolute value of distortion.
Youzou FUKAGAWA, Yuji SHINANO, Mario NAKAMORI   +2 more
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Strained 2D Semiconductor Lateral Heterojunctions via Grayscale Thermal‐Scanning Probe Lithography [PDF]

Small Science
Nanoscale tailoring of the optoelectronic response of 2D transition metal dichalcogenides semiconductor layers (TMD) is demonstrated thanks to a novel strain engineering approach based on grayscale thermal‐Scanning Probe Lithography (t‐SPL).
Giorgio Zambito, Giulio Ferrando, Matteo Barelli, Michele Ceccardi, Federico Caglieris, Daniele Marrè, Francesco Bisio, Francesco Buatier de Mongeot, Maria Caterina Giordano   +8 more
doaj   +2 more sources

Cryo-electron tomography reconstructs polymer in liquid film for fab-compatible lithography [PDF]

Nature Communications
Liquid film is ubiquitous in nature and serves as the critical medium for the dissolution of photoresist to create nanoscale circuit patterns in lithography, which is a core task since the birth of semiconductor industry.
Liming Zheng, Yijie Xia, Xia Jia, Mingyi Gao, Nan Liu, Jiling Song, XiaoPeng Li, Xiaole Zhao, Xin Gao, Wen Zhou, Wenbing Kang, Lijiang Yang, Qianqian Wang, Yiqin Gao, Hong-Wei Wang, Hailin Peng   +15 more
doaj   +2 more sources

An inorganic-blended p-type semiconductor with robust electrical and mechanical properties

Nature Communications
Inorganic semiconductors typically have limited p-type behavior due to the scarcity of holes and the localized valence band maximum, hindering the progress of complementary devices and circuits.
You Meng, Weijun Wang, Rong Fan, Zhengxun Lai, Wei Wang, Dengji Li, Xiaocui Li, Quan Quan, Pengshan Xie, Dong Chen, He Shao, Bowen Li, Zenghui Wu, Zhe Yang, SenPo Yip, Chun-Yuen Wong, Yang Lu, Johnny C. Ho   +17 more
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Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Nanomaterials, 2021
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment.
Eleanor Mullen, Michael A. Morris
doaj   +1 more source

Lithography Alignment Techniques Based on Moiré Fringe

Photonics, 2023
In Moiré fringe lithography alignment technology, alignment is realized by monitoring the grating interference fringe image in real-time. The technique exhibits excellent sensitivity to displacement changes and is not easily affected by the gap changes ...
Wenbo Jiang, Huaran Wang, Wenda Xie, Zhefei Qu   +3 more
doaj   +1 more source

Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010

Safety and Health at Work, 2021
Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents.
Sangjun Choi, Donguk Park, Yunkyung Park
doaj   +1 more source

Analysis of the Cylindrical Flexure Hinges with Circular Notches [PDF]

한국정밀공학회지, 2022
Flexure hinges are widely used as joint linkages for precision stages applied to lithography processes. Among them, precision stages with 3 DOF (Degrees of Freedom) of x, y and θz prevail in semiconductor manufacturing and they have been adopting single ...
Jun-Hee Moon
doaj   +1 more source