Results 11 to 20 of about 14,706 (300)
Advanced lithography for compound semiconductor applications
III-Vs Review, 2002 AbstractThis paper focuses on state-of-the-art lithography technology for advanced applications in compound semiconductor material processing. The need for thinned substrate materials in high frequency as well as power devices creates new challenges in the handling of extremely fragile and costly substrates.
Weixlberger, J., Lindner, P.
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Micromachines, 2022 A kind of ultra-thin transmissive color filter based on a metal-semiconductor-metal (MSM) structure is proposed. The displayed color can cover the entire visible range and switches after H2 treatment. An indium gallium zinc oxide (IGZO) semiconductor was
Xiangrui Fan +3 more
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Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective
Nanomaterials, 2021 The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment.
Eleanor Mullen, Michael A. Morris
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Lithography Alignment Techniques Based on Moiré Fringe
Photonics, 2023 In Moiré fringe lithography alignment technology, alignment is realized by monitoring the grating interference fringe image in real-time. The technique exhibits excellent sensitivity to displacement changes and is not easily affected by the gap changes ...
Wenbo Jiang +3 more
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Safety and Health at Work, 2021 Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents.
Sangjun Choi, Donguk Park, Yunkyung Park
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Analysis of the Cylindrical Flexure Hinges with Circular Notches [PDF]
한국정밀공학회지, 2022 Flexure hinges are widely used as joint linkages for precision stages applied to lithography processes. Among them, precision stages with 3 DOF (Degrees of Freedom) of x, y and θz prevail in semiconductor manufacturing and they have been adopting single ...
Jun-Hee Moon
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Large-area metasurface on CMOS-compatible fabrication platform: driving flat optics from lab to fab
Nanophotonics, 2020 A metasurface is a layer of subwavelength-scale nanostructures that can be used to design functional devices in ultrathin form. Various metasurface-based optical devices – coined as flat optics devices – have been realized with distinction performances ...
Li Nanxi +7 more
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Recent Advances in Organic-inorganic Hybrid Photoresists
Journal of Microelectronic Manufacturing, 2021 Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices. To date, most photoresists have been based on organic polymers, which have been dominating the semiconductor industries over the past few decades.
Zhihao Wang +10 more
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Advanced mask aligner lithography (AMALITH)
, 2022 Paper 83261YMask aligners were the dominating lithography tool for the first 20 years of semiconductor industry. In the 1980s industry changed over to projection lithography.
Motzek, K. +9 more
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A 3D printed metallized Fabry–Perot cavity antenna with improved bandwidth and low side‐lobe levels
Electronics Letters, 2021 A 3D printed metallized Fabry–Perot cavity antenna centred at 5.8 GHz is presented in this letter. A non‐uniform grid superstrate and a choke groove are employed in the Fabry–Perot cavity antenna to improve the input bandwidth and decrease the side lobes.
Ke Xu, Lin Zhou, Bing Zhang, Xing Chen
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