Adaptive reinforcement learning for lithography optimization: a scalable AI-driven solution for next-generation semiconductor manufacturing [PDF]
Scientific ReportsSemiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid +5 more
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Two-photon states meet polarization-gradient metasurfaces for nanometric, low-dose lateral-displacement metrology [PDF]
Light: Science & ApplicationsAccurate displacement sensing is indispensable in advanced semiconductor lithography. Conventional coherent-light-based approaches are hindered by photon budget limitations, slowing down in-situ measurements. In a recent study, Chen et al.
Qian-Mei Deng +3 more
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Meta-device for sensing subwavelength lateral displacement [PDF]
Light: Science & ApplicationsAccurate transverse displacement measurement is essential for precise mask-to-wafer positioning in lithography. While lateral displacement metrology has achieved nanometer-level precision, the limitations imposed by coherent state and grating challenge ...
Shufan Chen +7 more
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Inverse Lithography Technology (ILT) Under Chip Manufacture Context [PDF]
MicromachinesAs semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
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Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective
Nanomaterials, 2021 The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment.
Eleanor Mullen, Michael A. Morris
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Lithography Alignment Techniques Based on Moiré Fringe
Photonics, 2023 In Moiré fringe lithography alignment technology, alignment is realized by monitoring the grating interference fringe image in real-time. The technique exhibits excellent sensitivity to displacement changes and is not easily affected by the gap changes ...
Wenbo Jiang +3 more
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Safety and Health at Work, 2021 Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents.
Sangjun Choi, Donguk Park, Yunkyung Park
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Analysis of the Cylindrical Flexure Hinges with Circular Notches [PDF]
한국정밀공학회지, 2022 Flexure hinges are widely used as joint linkages for precision stages applied to lithography processes. Among them, precision stages with 3 DOF (Degrees of Freedom) of x, y and θz prevail in semiconductor manufacturing and they have been adopting single ...
Jun-Hee Moon
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Large-area metasurface on CMOS-compatible fabrication platform: driving flat optics from lab to fab
Nanophotonics, 2020 A metasurface is a layer of subwavelength-scale nanostructures that can be used to design functional devices in ultrathin form. Various metasurface-based optical devices – coined as flat optics devices – have been realized with distinction performances ...
Li Nanxi +7 more
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Recent Advances in Organic-inorganic Hybrid Photoresists
Journal of Microelectronic Manufacturing, 2021 Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices. To date, most photoresists have been based on organic polymers, which have been dominating the semiconductor industries over the past few decades.
Zhihao Wang +10 more
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