Results 1 to 10 of about 770,418 (181)

Shadow-wall lithography of ballistic superconductor–semiconductor quantum devices [PDF]

Nature Communications, 2021
Advanced fabrication techniques enable a wide range of quantum devices, such as the realization of a topological qubit. Here, the authors introduce an on-chip fabrication technique based on shadow walls to implement topological qubits in an InSb nanowire
Sebastian Heedt, Marina Quintero-Pérez, Francesco Borsoi, Alexandra Fursina, Nick van Loo, Grzegorz P. Mazur, Michał P. Nowak, Mark Ammerlaan, Kongyi Li, Svetlana Korneychuk, Jie Shen, May An Y. van de Poll, Ghada Badawy, Sasa Gazibegovic, Nick de Jong, Pavel Aseev, Kevin van Hoogdalem, Erik P. A. M. Bakkers, Leo P. Kouwenhoven   +18 more
doaj   +9 more sources

Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches [PDF]

Light: Science & Applications
Inverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions.
Yixin Yang, Kexuan Liu, Yunhui Gao, Chen Wang, Liangcai Cao   +4 more
doaj   +3 more sources

Lensless metrology for semiconductor lithography at EUV [PDF]

Modeling Aspects in Optical Metrology VII, 2019
The production of modern semiconductor devices is based on photolithography, a process through which a pattern engraved on a mask is projected on a silicon wafer coated with a photosensitive material. In the past few decades, continuous technological progress in this field allowed the industry to follow Moore’s law by reducing the size of the printed ...
Iacopo Mochi, Dimitrios Kazazis, Li-Ting Tseng, Sara Fernandez, Rajendran Rajeev, Uldis Locans, Atoosa Dejkameh, Ricarda Nebling, Ekinci Yasin   +8 more
openaire   +2 more sources

Multiphoton Lithography of Organic Semiconductor Devices for 3D Printing of Flexible Electronic Circuits, Biosensors, and Bioelectronics

Advanced Materials, 2022
In recent years, 3D printing of electronics have received growing attention due to their potential applications in emerging fields such as nanoelectronics and nanophotonics.
Milad Khorrami, Anto Sam Crosslee Louis Sam Titus, Sheereen Majd   +2 more
exaly   +2 more sources

The Future of Semiconductor Lithography? Look to Flash [PDF]

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2013
Thirty years ago, when I began working in lithography for semiconductor manufacturing, the bellwether of our industry was DRAM. Resolution was defined by the smallest DRAM half-pitch, and our technology nodes were named after DRAM densities. DRAM costs often determined the affordability of a personal computer, and everyone wanted more memory.
C. Mack
openaire   +2 more sources

Chemical Lift-Off Lithography of Metal and Semiconductor Surfaces [PDF]

ACS Materials Letters, 2019
Chemical lift-off lithography (CLL) is a subtractive soft-lithographic technique that uses polydimethylsiloxane (PDMS) stamps to pattern self-assembled monolayers of functional molecules for applications ranging from biomolecule patterning to transistor fabrication.
Kevin M. Cheung, Dominik M. Stemer, Chuanzhen Zhao, Thomas D. Young, Jason N. Belling, Anne M. Andrews, Paul S. Weiss   +6 more
openaire   +5 more sources

Meta-device for sensing subwavelength lateral displacement [PDF]

Light: Science & Applications
Accurate transverse displacement measurement is essential for precise mask-to-wafer positioning in lithography. While lateral displacement metrology has achieved nanometer-level precision, the limitations imposed by coherent state and grating challenge ...
Shufan Chen, Yubin Fan, Hao Li, Xiaodong Qiu, Ben Wang, Lijian Zhang, Shumin Xiao, Din Ping Tsai   +7 more
doaj   +2 more sources

Inverse Lithography Technology (ILT) Under Chip Manufacture Context [PDF]

Micromachines
As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
doaj   +2 more sources

AI-Assisted Composite Etch Model for MPT [PDF]

Micromachines
For advanced semiconductor nodes, the demand for high-precision patterning of complex foundry circuits drives the widespread use of Lithography-Etch-Lithography-Etch (LELE)—a key Multiple Patterning Technology (MPT)—in Deep Ultraviolet (DUV) processes ...
Yanbin Gong, Fengsheng Zhao, Devin Sima, Wenzhang Li, Yingxiong Guo, Cheming Hu, Shengrui Zhang   +6 more
doaj   +2 more sources

Can mems take advantage of advances in semiconductor lithography? [PDF]

2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), 2010
Progress of lithography has helped to spearhead the semiconductor industry to follow Moore's law to sustain improvement of performance and reduction of cost for decades. The MEMS industry, having started later and being less developed in economy of scale, can take advantage of the experience of semiconductor patterning to make MEMS patterning cheaper ...
B. Lin
semanticscholar   +3 more sources