Results 101 to 110 of about 14,706 (300)
Photonic crystals as functional mirrors for semiconductor lasers
, 2008 In recent years, interest has grown in the research fields of semiconductor lasers and photonic crystals. This thesis looks at integrating photonic crystals into existing semiconductor laser technology to act as functional laser mirrors.
Moore, Stephen A.
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Advanced Materials, EarlyView.This study presents a compact dynamic‐field‐driven nucleation and growth (DFNG) model that captures ferroelectric switching behavior under arbitrary voltage waveforms. It enables extraction of time‐dependent domain wall velocity and growth dimensionality, which can then be extended to device‐level modeling.
Yi Liang +10 more
wiley +1 more source
Nanoimprint—Mo(o)re than Lithography
EncyclopediaNanoimprint lithography (NIL) is a high-resolution parallel patterning method based on molding. It has proven resolution down to the nanometer range and can be scaled up for large areas and high throughput.
Helmut Schift
doaj +1 more source
, 2009 This paper was presented at the 2nd Micro and Nano Flows Conference (MNF2009), which was held at Brunel University, West London, UK. The conference was organised by Brunel University and supported by the Institution of Mechanical Engineers, IPEM, the ...
2nd Micro and Nano Flows Conference (MNF2009) +5 more
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Advances in Unconventional Lithography
, 2011 The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine ...
core +1 more source
Advanced Materials Interfaces, EarlyView.We report electrochemical quantum capacitance spectroscopy as an ambient, in situ probe for defect‐mediated electronic structure at 2D material interfaces. Using monolayer MoS2, the method resolves band edges and vacancy states, tracks sulfur‐vacancy evolution during hydrogen evolution, and links interfacial density‐of‐states changes to nearly ...
Mengyu Yan +9 more
wiley +1 more source
Charting CEBL's role in mainstream semiconductor lithography [PDF]
SPIE Proceedings, 2013 historically kept it out of mainstream fabs. Thanks to continuing EBDW advances combined with the industry’s move to unidirectional (1D) gridded layout style, EBDW promises to cost-efficiently complement 193nm ArF immersion (193i) optical lithography in high volume manufacturing (HVM).
openaire +1 more source
Advanced Materials Interfaces, EarlyView.Schematic illustration of a sustainable nanofabrication process: chitosan derived from natural sources is used as a biodegradable thin film resist, patterned via Constant Pulse‐Assisted Force Lithography (CP‐AFL) to create tunable nanogrooves. These grooves template gold nanowire formation, enabling high‐resolution nanopatterning under ambient ...
Paolo Pellegrino +7 more
wiley +1 more source
Heterodyne polarimetry technology for inspection of critical dimensions
EPJ Web of Conferences, 2010 Heterodyne polarimetry is based on the analysis of phases and polarization states of two frequency shifted cross-polarized waves, generated by Zeeman lasers and their analogs [1]. In semiconductor industry, manufacturing of memory chips depends on the
Protopopov V.
doaj +1 more source
, 2016 Strategies to confine electromagnetic field within ultrathin film emerge as essential technologies for applications from thin-film solar cells to imaging and sensing devices.
Minjung Choi (2792131) +6 more
core +1 more source