Results 181 to 190 of about 11,779 (261)

Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography. [PDF]

Chem Sci
Chu TTH, Le DN, Lee M, Narayan DM, Kim DS, Shirodkar S, Choe M, Yoo S, Tiwale N, Choi R, Ahn J, Sung MM, Nam CY, Kim J.   +13 more
europepmc   +1 more source

Multi‐command wearable magnetic human‐machine interface enabled by low‐noise sensing and time‐series deep learning

InfoScience, EarlyView.
This study integrates a wrist‐worn sensing platform based on a low‐noise planar Hall magnetoresistive sensor with time‐series deep learning to enable long‐range, single‐sensor, multi‐command gesture recognition with high accuracy. Further evaluations show reliable generalization across different days, previously unseen users, wearing‐position ...
Guannan Mu, Proloy Taran Das, Jan Schmidtpeter, Andreas Knüpfer, Rui Xu, Denys Makarov   +5 more
wiley   +1 more source

Electroluminescent photoresists extending lithographic scaling to OLEDs. [PDF]

Nature
Lo SW, Shivarudraiah SB, Lin ZH, Helbling P, Song L, Wang J, Nouman M, Jiang F, Stemmler G, Carretta DM, Chen MN, Zhu J, Kumar S, Wang H, Christofferson AJ, Bao Y, Shih CJ.   +16 more
europepmc   +1 more source

Wearable photovoltaic textiles: From device technologies to long‐term reliability

InfoScience, EarlyView.
Wearable photovoltaic textiles are highlighted as reliable energy sources that combine solar cell efficiency with hierarchical textile‐specific mechanical and environmental durability. Structural and encapsulation strategies, including planarization, neutral‐axis engineering, and advanced barrier designs, enable waterproofing, washability, UV shielding,
Eun Gyo Jeong, So Yeong Jeong, Yongmin Jeon, Myung Sub Lim, Seo‐Yoon Bae, Sung‐Min Lee   +5 more
wiley   +1 more source

Viscoelasticity-guided covalent assembly of atomically precise nanoclusters via nitrene-mediated two-photon lithography. [PDF]

Nat Commun
Ji S, Shen W, Liu W, Hu Z, Peng D, Wu W, Huang R, Shi Z, Wang W, Si Y, Zhou Y, Xiong C, Fang L, Zhang X, Hou Z, Liu G, Wu Z, Zhang H, Wu Y.   +18 more
europepmc   +1 more source

Quasi‐2D perovskite memristors: From layered structures to advanced computing applications

InfoScience, EarlyView.
Quasi‐2D perovskites enable stable memristive switching through dimensional engineering that controls ion migration pathways. The layered structure suppresses leakage, improves environmental stability, and enables analog conductance modulation for neuromorphic computing, artificial vision, and in‐memory architectures, transforming ion migration from a ...
Jie Ma, Yujian Du, Yuljae Cho
wiley   +1 more source

A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment. [PDF]

Sensors (Basel)
Joo K, Lee KH, Jeon JW.
europepmc   +1 more source

Lithography for Quarter Micron Semiconductor Era. Improved Resolution in Optical Projection Lithography.

Journal of The Society of Instrument and Control Engineers, 1993
ASAI, Satoru, HANYU, Isamu
openaire   +1 more source

Van der Waals ferroelectric semiconductor tunnel junction with ultra‐low switching voltage

InfoMat, EarlyView.
Ferroelectric tunnel junctions are promising building blocks for energy‐efficient memory and brain‐inspired computing, but their practical use is limited by the relatively high voltages required for operation. Here, we develop an all‐two‐dimensional ferroelectric tunnel junction based on AgBiP2Se6 that enables reliable memory operation below 0.2 V and ...
Fuqin Sun, Ruihuan Duan, Ziqian Xin, Yinxiao Li, Bingyuan Xue, Zihua Tian, Kejie Guan, Fan Liu, Xiaoshuang Gou, Yingyi Wang, Weifan Zhou, Cheng Zhang, Lin Liu, Zhao Wang, Jia Shi, Zheng Liu, Xiaowei Wang, Ting Zhang   +17 more
wiley   +1 more source

Polarity-engineered Sn-Ti cluster photoresists for sub-10-nm high-resolution lithography. [PDF]

Smart Mol
Wang D, Xu R, Zhang M, Gong X, Li W, Zhou D, Zhao J, Zhu H, Lu Z, Chen P, Peng X.   +10 more
europepmc   +1 more source