Results 201 to 210 of about 11,779 (261)

Photopatterning of organic mixed ionic electronic conductors for monolithic complementary inverter. [PDF]

iScience
Xie X, Zhang L, Ma M, Ye G, Zhang J, Chen X, You M, Liu J.   +7 more
europepmc   +1 more source

A review of commercial and laboratory-based microfluidic devices based on glass and/or silicon substrates. [PDF]

RSC Adv
Deb A, Nagesh G, Harrison T, Spicer D, Ting DS, Ahamed MJ.   +5 more
europepmc   +1 more source

Dimensional Scaling Effect in Percolative Oxide Semiconductor Transistors. [PDF]

ACS Nano
Tseng R, Kuo YH, Pan YY, Li ZH, Wang ST, Chen CF, Lo ST, Chan YC, Wu YJ, Chen SC, Kuo CC, Wang CC, Wu CH, Lu WH, Bao X, Thao NTP, Minamitan E, Javey A, Lin CL, Lien DH.   +19 more
europepmc   +1 more source

Resistive switching memristors: structures, materials, fabrication techniques, and process challenges for VLSI integration. [PDF]

RSC Adv
Singla R, Pant D, Nautiyal P, Painuly A.
europepmc   +1 more source

STARE: a semiconductor-integrated transmit-array architecture for 6G beamforming. [PDF]

Nat Commun
Kim J, Kim B, Park M, Oh J, Oh J.
europepmc   +1 more source

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Control of lithography in semiconductor manufacturing

IEEE Control Systems, 2006
Lithography is important in semiconductor manufacturing because it affects both the performance and yield of the devices in each wafer. The formation of a layer in lithography equipment involves a series of steps, each of which requires process control, namely, surface preparation, spin coat, soft bake, alignment and exposure, post-exposure bake ...
Thomas F Edgar
exaly   +2 more sources

Semiconductor lithography for the next millennium

IEEE Spectrum, 1996
Volume production of ICs sporting 0.1-micrometer structures is being predicted for 2007. Manufacturing tools now being developed will feature much shorter wavelengths and elaborate mirrors in place of traditional lenses. Also being honed is proximity X-ray lithography, which has produced a first level of a memory circuit with 0.25-micrometer dimensions.
L Geppert
exaly   +2 more sources

Lithography for semiconductor technology

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
Abstract We present a short overview of lithography applied to semiconductor technology. It covers optical, X-rays, electrons and ions beam lithographies. The properties of resists and of the associated processes, which are the heart of this technology, are presented.
Christian Ngô, Charles Rosilio
openaire   +1 more source