Results 211 to 220 of about 770,517 (280)

Advancing nanolithography: a comprehensive review of materials for local anodic oxidation with AFM. [PDF]

Beilstein J Nanotechnol
Lorenzoni M.
europepmc   +1 more source

Facile, etch-free atomic layer-coated resist templates for rapid prototyping of efficient visible metasurfaces. [PDF]

Microsyst Nanoeng
Seong J, Jeon Y, Lee S, Kim J, Kim S, Jeon C, Ryu YS, An J, Rho J.   +8 more
europepmc   +1 more source

Detection of Irregular Loads Using SAW Delay-Line Devices. [PDF]

Sensors (Basel)
Yin Y, Zhao Z, You R, Liang Y, Wang W.
europepmc   +1 more source

Method of high-order advanced lithography overlay correction to enhance the manufacturing performance of integrated circuits. [PDF]

Nanoscale Adv
Rui D, Zhang L, Wei Y, Su Y.
europepmc   +1 more source

Nanopatterning optimization of zinc phosphide: hole mobility up to 560 cm²/V s with selective area epitaxy.

J Mater Chem C Mater
Lemerle R, Freitas HR, Hagger T, Dede D, Webb LE, Aigroz C, Piazza V, Spadaro MC, Arbiol J, Morral AFI.   +9 more
europepmc   +1 more source

Nano-scale lithography and microscopy of organic semiconductors

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Semiconductor lithography for the next millennium

IEEE Spectrum, 1996
Volume production of ICs sporting 0.1-micrometer structures is being predicted for 2007. Manufacturing tools now being developed will feature much shorter wavelengths and elaborate mirrors in place of traditional lenses. Also being honed is proximity X-ray lithography, which has produced a first level of a memory circuit with 0.25-micrometer dimensions.
L. Geppert
exaly   +3 more sources

LithoBench: Benchmarking AI Computational Lithography for Semiconductor Manufacturing

Advances in Neural Information Processing Systems 36, 2023
Computational lithography provides algorithmic and mathematical support for resolution enhancement in optical lithography, which is critical for semiconductor manufacturing.
Su Zheng, Haoyu Yang, Binwu Zhu, Bei Yu 0001, Martin D. F. Wong   +4 more
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Sustainable semiconductor manufacturing: lessons for lithography and etch

Advanced Etch Technology and Process Integration for Nanopatterning XII, 2023
Sustainability is gaining momentum as countries and companies announce targets for net-zero carbon emissions by 2050. imec has created a bottom-up model using tool data, process recipes, and integrated wafer process flows to create a virtual fab.
Emily E. Gallagher, Philippe Bezard, Lizzie Boakes, Andrea Firrincieli, Cedric Rolin, Lars-Ake Ragnarsson   +5 more
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The advantages of nanoimprint lithography for semiconductor device manufacturing

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 2019
Imprint lithography is an effective and well known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate.
Keita Sakai, Kiyohito Yamamoto, Hiromi Hiura, Takahiro Nakayama, Toshiya Asano, Tomohiko Hayashi, Yukio Takabayashi, Takehiko Iwanaga, Douglas J. Resnick   +8 more
openaire   +2 more sources