Results 211 to 220 of about 11,779 (261)

Progress and outlook of lithography for semiconductor IC

2009 IEEE Custom Integrated Circuits Conference, 2009
Progress of lithography from the lensless type to lens-based systems using different kinds of photon and electron beams is reported here. The stages of lithography development with their physical principles are linked to the corresponding impacts to IC designers to help them understand the reasons they are more and more restricted.
Burn J. Lin, R. G. Liu
openaire   +1 more source

Advanced semiconductor lithography

OSA Annual Meeting, 1993
Optical microlithography has been the enabling technology behind the spectacular growth of the integrated circuit industry over the last two decades.
openaire   +1 more source

The advantages of nanoimprint lithography for semiconductor device manufacturing

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 2019
Imprint lithography is an effective and well known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate.
Keita Sakai, Kiyohito Yamamoto, Hiromi Hiura, Takahiro Nakayama, Toshiya Asano, Tomohiko Hayashi, Yukio Takabayashi, Takehiko Iwanaga, Douglas J. Resnick   +8 more
openaire   +1 more source

The future costs of semiconductor lithography

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1989
A method for comparing the costs for photoprocessing high volume semiconductor logic and memory wafers is presented. Industry lithographic trends and process structures are discussed and a cost model is applied. Some typical results obtained with optical tooling and x-ray synchrotron based lithography are discussed for 1/2 μ ground rules.
openaire   +1 more source

Lithography simulation in semiconductor manufacturing

SPIE Proceedings, 2005
In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how ...
openaire   +1 more source

Laser ablation lithography on thermoelectric semiconductor

Applied Surface Science, 2006
In this paper, experimental results of the investigation of the periodic structure on thermoelectric semiconductor Cu2Se are presented. Periodic structures were formed on surfaces of semiconductors due to multi-beam interaction of Q-switched Nd:YAG laser, which was operated in the lowest order of Gaussian mode and pulse duration 7 ns.
O.Yu. Semchuk, V.N. Semioshko, L.G. Grechko, M. Willander, M. Karlsteen   +4 more
openaire   +1 more source

Semiconductor foundry, lithography, and partners

SPIE Proceedings, 2002
The semiconductor foundry took off in 1990 with an annual capacity of less than 0.1M 8-inch-equivalent wafers at the 2-mm node. In 2000, the annual capacity rose to more than 10M. Initially, the technology practiced at foundries was 1 to 2 generations behind that at integrated device manufacturers (IDMs).
openaire   +1 more source

Computational lithography and its role in nanoimprint lithography for semiconductor device manufacturing

Photomask Technology 2020, 2020
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the ...
Toshiya Asano, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Hiromi Hiura, Keita Sakai, Mitsuru Hiura, Osamu Morimoto, Yukio Takabayashi, Takehiko Iwanaga   +11 more
openaire   +1 more source

Optimization of alignment in semiconductor lithography equipment

Precision Engineering, 2009
Recent enhanced integration of semiconductors permits less and less overlay error at exposure. Accordingly, higher-order alignment adjustment, which considers not only linear but also nonlinear error components, has been recently carried out. However, conventional higher-order alignment adjustment methods are based on least squares, and thus are only ...
Ryuhei Miyashiro, Youzou Fukagawa
openaire   +1 more source

Growth and Manipulation of Organic Semiconductors Microcrystals by Wet Lithography

Advanced Functional Materials, 2015
As fabrication and positioning of micro‐ and nanocrystals grow in importance in a wide range technological applications, there is an increasing requirement for the development of a shared technological platform that is able to process materials from solutions on large areas.
Gentili Denis, Liscio Fabiola, Mariucci Luigi, Beverina Luca, Melucci Manuela, Toffanin Stefano, Milita Silvia, Cavallini Massimiliano   +7 more
openaire   +2 more sources