Results 221 to 230 of about 11,779 (261)

Optical metrology of semiconductor wafers in lithography

SPIE Proceedings, 2013
This paper presents a concise description of 3 optical measurement systems that play a critical role in optical lithography of semiconductor devices. A level sensor and alignment sensor are described that are used to measure, respectively, wafer height variations and the wafer location prior to resist exposure.
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Diagnostics and lithography of semiconductor structures for nanoelectronics

Nanotechnologies in Russia, 2008
A complex of metrological, diagnostic, and technological support of investigations and innovations in the field of nanotechnologies based on the Nanostructures joint service center is presented. Results of the study of the atomic structure of the surface, interfaces, and structural defects in semiconductor materials; the development of modern electron ...
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EUV LITHOGRAPHY FOR SEMICONDUCTOR MANUFACTURING AND NANOFABRICATION

COSMOS, 2007
EUV lithography is the exposure technology in which even 15 nm node which is the limit of Si device can be achieved. Unlike the conventional optical lithography, this technology serves as a reflection type optical system, and a multilayer coated mirror is used.
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Semiconductor-, Lithography-, and Electrically-Related Applications

1999
Electron-beam (e-beam) lithography has over the past 15 years or so taken a predominant role in Si wafer patterning in the semiconductor industry due to its sub-micron (and potential nano-scale) resolution. This high resolution and the accurate focussing of e-beams is however limited by charging which occurs in the photo-resist: a trapping of charge ...
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Projection exposure apparatus for semiconductor lithography

2021
HARTJES JOACHIM, WOLF ALEXANDER, GRUNER TORALF   +2 more
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Multiphoton Lithography of Organic Semiconductor Devices for 3D Printing of Flexible Electronic Circuits, Biosensors, and Bioelectronics

Advanced Materials, 2022
Mohammad Reza Abidian, Chandra Mohan, Anto Sam Crosslee Louis Sam Titus   +2 more
exaly  

Semiconductor Lithography

1988
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Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers

Advanced Materials, 2008
Bong Hoon Kim, Seong-Jun Jeong, Sang Ouk Kim   +2 more
exaly  

Scalable Fabrication of Strongly Textured Organic Semiconductor Micropatterns by Capillary Force Lithography

Advanced Materials, 2012
Arturas Vailionis, Alberto Salleo, Young Min Park   +2 more
exaly  

Semiconductor lithography for the next millennium

Microelectronics Reliability, 1997
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