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Control of lithography in semiconductor manufacturing
IEEE Control Systems, 2006Lithography is important in semiconductor manufacturing because it affects both the performance and yield of the devices in each wafer. The formation of a layer in lithography equipment involves a series of steps, each of which requires process control, namely, surface preparation, spin coat, soft bake, alignment and exposure, post-exposure bake ...
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The future costs of semiconductor lithography
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1989A method for comparing the costs for photoprocessing high volume semiconductor logic and memory wafers is presented. Industry lithographic trends and process structures are discussed and a cost model is applied. Some typical results obtained with optical tooling and x-ray synchrotron based lithography are discussed for 1/2 μ ground rules.
R. Hill
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Immersion lithography: New opportunities for semiconductor manufacturing
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 2004Immersion lithography has recently emerged as the preferred lithography solution for manufacturing the next generation of semiconductor devices (likely to address the 65, 45, and possibly the 32nm nodes). Full-field immersion scanners operating at λ=193nm with de-ionized water as the immersion fluid have been recently demonstrated.
Darío Gil +6 more
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Lithography simulation in semiconductor manufacturing
SPIE Proceedings, 2005In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how ...
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Optimization of alignment in semiconductor lithography equipment
Precision Engineering, 2009Recent enhanced integration of semiconductors permits less and less overlay error at exposure. Accordingly, higher-order alignment adjustment, which considers not only linear but also nonlinear error components, has been recently carried out. However, conventional higher-order alignment adjustment methods are based on least squares, and thus are only ...
Ryuhei Miyashiro, Youzou Fukagawa
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EUV LITHOGRAPHY FOR SEMICONDUCTOR MANUFACTURING AND NANOFABRICATION
Cosmos, 2007EUV lithography is the exposure technology in which even 15 nm node which is the limit of Si device can be achieved. Unlike the conventional optical lithography, this technology serves as a reflection type optical system, and a multilayer coated mirror is used.
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Japanese Journal of Applied Physics, 2021
Investigations were made on the application of aqueous ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution (compared to the de facto standard aqueous tetramethylammonium hydroxide or TMAH) for mainstream lithographic ...
J. Santillan +8 more
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Investigations were made on the application of aqueous ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution (compared to the de facto standard aqueous tetramethylammonium hydroxide or TMAH) for mainstream lithographic ...
J. Santillan +8 more
semanticscholar +1 more source
Minimax Optimization for Recipe Management in High-Mixed Semiconductor Lithography Process
IEEE Transactions on Industrial Informatics, 2020This article addresses the application of minimax optimization in the control design of complex dynamic systems of the semiconductor manufacturing.
M. Khakifirooz +3 more
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EL-3 application to 0.5 μm semiconductor lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1983D. E. Davis +4 more
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Lithography for semiconductor technology
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997Abstract We present a short overview of lithography applied to semiconductor technology. It covers optical, X-rays, electrons and ions beam lithographies. The properties of resists and of the associated processes, which are the heart of this technology, are presented.
Christian Ngô, Charles Rosilio
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