Results 241 to 250 of about 11,779 (261)

EL‐3 application to 0.5 μm semiconductor lithography Available to Purchase

Journal of Vacuum Science & Technology B, 1983
A D Wilson
exaly  

Ultrathin semiconductor layer masks for high vacuum focused Ga ion beam lithography

Applied Physics Letters, 1988
M B Panish, H Temkin
exaly  

Masks, lithography device and semiconductor component

2005
MANN HANS-JUERGEN, LOWISCH MARTIN, SINGER WOLFGANG   +2 more
openaire   +3 more sources

Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2011
Lloyd C Litt
exaly  

The Potential for Economic Application of Maskless Lithography in Semiconductor Manufacturing

IEEE Transactions on Semiconductor Manufacturing, 2010
Robert Leachman
exaly  

Semiconductor technology roadmaps and lithography implications

Advances in Patterning Materials and Processes XLII
Karey Holland, Steven P. Holland
openaire   +1 more source

Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography

Journal of Vacuum Science & Technology B, 1996
D M Tennant, G D Kubiak, D A Tichenor
exaly  

Lithography : Manufacturing Technologies in Semiconductor Device

Journal of the Society of Mechanical Engineers, 1986
openaire   +1 more source

Sub-100 nm KrF lithography for complementary metal–oxide–semiconductor circuits Available to Purchase

Journal of Vacuum Science & Technology B, 1999
M Fritze, V Suntharalingam
exaly  

Sustainable Semiconductor Manufacturing: The Role of Lithography

IEEE Transactions on Semiconductor Manufacturing
Emily Gallagher, Lars-Åke Ragnarsson, Cedric Rolin   +2 more
openaire   +1 more source