Results 241 to 250 of about 770,517 (280)

Optical metrology of semiconductor wafers in lithography

SPIE Proceedings, 2013
This paper presents a concise description of 3 optical measurement systems that play a critical role in optical lithography of semiconductor devices. A level sensor and alignment sensor are described that are used to measure, respectively, wafer height variations and the wafer location prior to resist exposure.
openaire   +1 more source

Metal oxide resist formulation and process advancements towards high-NA EUV lithography

Advanced Lithography
Metal Oxide Resists (MOR) are uniquely suited to single-patterning EUV lithography in current high-volume manufacturing and for next generation high-NA applications.
Amrit K. Narasimhan, Alexander C Marwitz, Kanta Yanagi, P. de Schepper, Dylan Vu, J. Doise, Kai Jiang, Kevin Woo, B. Cardineau, Kazuki Kasahara, J. Stowers   +10 more
semanticscholar   +1 more source

Diagnostics and lithography of semiconductor structures for nanoelectronics

Nanotechnologies in Russia, 2008
A complex of metrological, diagnostic, and technological support of investigations and innovations in the field of nanotechnologies based on the Nanostructures joint service center is presented. Results of the study of the atomic structure of the surface, interfaces, and structural defects in semiconductor materials; the development of modern electron ...
openaire   +1 more source

Advanced lithography materials: From fundamentals to applications.

Advances in Colloid and Interface Science
The semiconductor industry has long been driven by advances in a nanofabrication technology known as lithography, and the fabrication of nanostructures on chips relies on an important coating, the photoresist layer. Photoresists are typically spin-coated
Yanhui Zhang, Haojie Yu, Li Wang, Xudong Wu, Jiawen He, Wenbing Huang, Cheng Ouyang, Dingning Chen, B. Keshta   +8 more
semanticscholar   +1 more source

Advancing semiconductor patterning with EUV hyper NA: opportunities and challenges

Advanced Lithography
Enhanced chip performance and miniaturization in the semiconductor industry are driven by improved lithographic capabilities, such as those of lithography systems with larger Numerical Aperture (NA).
G. Bottiglieri, Pieter Woltgens, Reinier van der Meer, S. Blok, Bram Slachter, John McNamara, M. A. van de Kerkhof, J. van Schoot, Michael Patra, J. Neumann, Heiko Feldmann   +10 more
semanticscholar   +1 more source

Semiconductor-, Lithography-, and Electrically-Related Applications

1999
Electron-beam (e-beam) lithography has over the past 15 years or so taken a predominant role in Si wafer patterning in the semiconductor industry due to its sub-micron (and potential nano-scale) resolution. This high resolution and the accurate focussing of e-beams is however limited by charging which occurs in the photo-resist: a trapping of charge ...
openaire   +1 more source

Using Destructive Optical Interference in Semiconductor Lithography

Optics and Photonics News, 2006
Integrated circuits—one of the greatest inventions of the last half of the 20th century—are still made using photolithography, even though their dimensions are now well below the exposure wavelength. Carefully tailored destructive interference is what makes it possible.
openaire   +1 more source

Improved defectivity and particle control for nanoimprint lithography high-volume semiconductor manufacturing

Advanced Lithography, 2017
T. Nakayama, M. Yonekawa, Y. Matsuoka, Hisanobu Azuma, Yukio Takabayashi, A. Aghili, M. Mizuno, Jin Choi, Chris E. Jones   +8 more
semanticscholar   +1 more source

New prospects for electron beams as tools for semiconductor lithography

Scanning Microscopies, 2009
H. C. Pfeiffer
semanticscholar   +1 more source

A review of nanoimprint lithography for high-volume semiconductor device manufacturing

, 2017
D. Resnick, Jin Choi
semanticscholar   +1 more source