Results 231 to 240 of about 770,517 (280)

20-nm consecutive discrete tuning range semiconductor laser with 125 GHz channel spacing based on slotted surface grating fabricated by standard lithography

Semiconductor Science and Technology, 2020
A widely tunable semiconductor laser based on slotted surface grating is presented. This regrowth-free tunable semiconductor laser is fabricated by contact i-line lithography rather than electron beam lithography.
Fengxin Dong, Anjin Liu, Pijie Ma, Mingjin Wang, Wanhua Zheng   +4 more
semanticscholar   +1 more source

Progress and outlook of lithography for semiconductor IC

2009 IEEE Custom Integrated Circuits Conference, 2009
Progress of lithography from the lensless type to lens-based systems using different kinds of photon and electron beams is reported here. The stages of lithography development with their physical principles are linked to the corresponding impacts to IC designers to help them understand the reasons they are more and more restricted.
Burn J. Lin, R. G. Liu
openaire   +1 more source

Precision Mechanical Systems In Semiconductor Lithography Equipment Design And Development

American Journal of Advanced Technology and Engineering Solutions
The integration of AI and machine learning in precision mechanical systems has significantly transformed semiconductor lithography, enabling higher accuracy, enhanced system reliability, and optimized operational efficiency.
Aleem Al Razee Tonoy, Manam Ahmed, Md Rabbi Khan   +2 more
semanticscholar   +1 more source

Advanced semiconductor lithography

OSA Annual Meeting, 1993
Optical microlithography has been the enabling technology behind the spectacular growth of the integrated circuit industry over the last two decades.
openaire   +1 more source

Laser ablation lithography on thermoelectric semiconductor

Applied Surface Science, 2006
In this paper, experimental results of the investigation of the periodic structure on thermoelectric semiconductor Cu2Se are presented. Periodic structures were formed on surfaces of semiconductors due to multi-beam interaction of Q-switched Nd:YAG laser, which was operated in the lowest order of Gaussian mode and pulse duration 7 ns.
O.Yu. Semchuk, V.N. Semioshko, L.G. Grechko, M. Willander, M. Karlsteen   +4 more
openaire   +1 more source

Semiconductor foundry, lithography, and partners

SPIE Proceedings, 2002
The semiconductor foundry took off in 1990 with an annual capacity of less than 0.1M 8-inch-equivalent wafers at the 2-mm node. In 2000, the annual capacity rose to more than 10M. Initially, the technology practiced at foundries was 1 to 2 generations behind that at integrated device manufacturers (IDMs).
openaire   +1 more source

Computational lithography and its role in nanoimprint lithography for semiconductor device manufacturing

Photomask Technology 2020, 2020
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the ...
Toshiya Asano, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Hiromi Hiura, Keita Sakai, Mitsuru Hiura, Osamu Morimoto, Yukio Takabayashi, Takehiko Iwanaga   +11 more
openaire   +1 more source

Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication

International Journal of Molecular Sciences
Lithography is crucial to semiconductor manufacturing, enabling the production of smaller, more powerful electronic devices. This review explores the evolution, principles, and advancements of key lithography techniques, including extreme ultraviolet ...
Prithvi Basu, Jyoti Verma, V. Abhinav, R. K. Ratnesh, Y. Singla, Vibhor Kumar   +5 more
semanticscholar   +1 more source

Single Rare-Earth Ion Doped Tin-Oxo Nanocluster Photoresists for High-Resolution Extreme Ultraviolet Lithography.

Nano letters (Print)
Rare-earth (RE) metals are known as industrial vitamins and show significant regulatory effects in many fields. In this work, we first demonstrated that the vitamin effect of RE metals can also be applied to extreme ultraviolet (EUV) lithography. Using a
Fangfang Liu, Guangyue Shi, Ni Zhen, Zuohu Zhou, Tao Guo, Yang Qiao, Jun Zhao, Jin-Cheng Liu, Feng Luo, Lei Zhang   +9 more
semanticscholar   +1 more source

Growth and Manipulation of Organic Semiconductors Microcrystals by Wet Lithography

Advanced Functional Materials, 2015
As fabrication and positioning of micro‐ and nanocrystals grow in importance in a wide range technological applications, there is an increasing requirement for the development of a shared technological platform that is able to process materials from solutions on large areas.
Gentili Denis, Liscio Fabiola, Mariucci Luigi, Beverina Luca, Melucci Manuela, Toffanin Stefano, Milita Silvia, Cavallini Massimiliano   +7 more
openaire   +2 more sources