Results 251 to 260 of about 14,706 (300)

Topological photonics for single-photon sources. [PDF]

Light Sci Appl
Ding F.
europepmc   +1 more source

Scalable quantum photonic platform based on site-controlled quantum dots coupled to circular Bragg grating resonators. [PDF]

Light Sci Appl
Gaur K, Barua A, Tripathi S, Roche LJ, Wilksen S, Steinhoff A, Baraz S, Nitin N, Palekar CC, Koulas-Simos A, Limame I, Mudi P, Rodt S, Gies C, Reitzenstein S.   +14 more
europepmc   +1 more source

Miniaturisation of Raman spectroscopy systems: from benchtop to backpocket.

Lab Chip
Hardy M, Kanade PP, Buchan E, Goldberg Oppenheimer P, McPolin CPT, Bowman RM.   +5 more
europepmc   +1 more source

Some of the next articles are maybe not open access.

Related searches:

Semiconductor lithography for the next millennium

IEEE Spectrum, 1996
Volume production of ICs sporting 0.1-micrometer structures is being predicted for 2007. Manufacturing tools now being developed will feature much shorter wavelengths and elaborate mirrors in place of traditional lenses. Also being honed is proximity X-ray lithography, which has produced a first level of a memory circuit with 0.25-micrometer dimensions.
L Geppert
exaly   +2 more sources

Lithography simulation in semiconductor manufacturing

SPIE Proceedings, 2005
In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how ...
Chris A Mack
exaly   +2 more sources

Control of lithography in semiconductor manufacturing

IEEE Control Systems, 2006
Lithography is important in semiconductor manufacturing because it affects both the performance and yield of the devices in each wafer. The formation of a layer in lithography equipment involves a series of steps, each of which requires process control, namely, surface preparation, spin coat, soft bake, alignment and exposure, post-exposure bake ...
exaly   +2 more sources

EUV LITHOGRAPHY FOR SEMICONDUCTOR MANUFACTURING AND NANOFABRICATION

Cosmos, 2007
EUV lithography is the exposure technology in which even 15 nm node which is the limit of Si device can be achieved. Unlike the conventional optical lithography, this technology serves as a reflection type optical system, and a multilayer coated mirror is used.
Hiroo Kinoshita
exaly   +2 more sources

Immersion lithography: New opportunities for semiconductor manufacturing

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 2004
Immersion lithography has recently emerged as the preferred lithography solution for manufacturing the next generation of semiconductor devices (likely to address the 65, 45, and possibly the 32nm nodes). Full-field immersion scanners operating at λ=193nm with de-ionized water as the immersion fluid have been recently demonstrated.
Timothy A Brunner
exaly   +2 more sources

Lithography for semiconductor technology

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
Abstract We present a short overview of lithography applied to semiconductor technology. It covers optical, X-rays, electrons and ions beam lithographies. The properties of resists and of the associated processes, which are the heart of this technology, are presented.
Christian Ngô, Charles Rosilio
openaire   +1 more source

Progress and outlook of lithography for semiconductor IC

2009 IEEE Custom Integrated Circuits Conference, 2009
Progress of lithography from the lensless type to lens-based systems using different kinds of photon and electron beams is reported here. The stages of lithography development with their physical principles are linked to the corresponding impacts to IC designers to help them understand the reasons they are more and more restricted.
Burn J. Lin, R. G. Liu
openaire   +1 more source