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Semiconductor-, Lithography-, and Electrically-Related Applications
1999Electron-beam (e-beam) lithography has over the past 15 years or so taken a predominant role in Si wafer patterning in the semiconductor industry due to its sub-micron (and potential nano-scale) resolution. This high resolution and the accurate focussing of e-beams is however limited by charging which occurs in the photo-resist: a trapping of charge ...
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Using Destructive Optical Interference in Semiconductor Lithography
Optics and Photonics News, 2006Integrated circuits—one of the greatest inventions of the last half of the 20th century—are still made using photolithography, even though their dimensions are now well below the exposure wavelength. Carefully tailored destructive interference is what makes it possible.
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LithoBench: Benchmarking AI Computational Lithography for Semiconductor Manufacturing
Advances in Neural Information Processing Systems 36, 2023Su Zheng +4 more
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Sustainable semiconductor manufacturing: lessons for lithography and etch
Advanced Etch Technology and Process Integration for Nanopatterning XII, 2023Emily E. Gallagher +5 more
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Reduction of Bubble-Induced Defect in Semiconductor Lithography Process
2023Kyoung-Whan Oh +5 more
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Semiconductor quantum point contact fabricated by lithography with an atomic force microscope
Applied Physics Letters, 1997R Held, T Heinzel, P Studerus
exaly
Semiconductor lithography for the next millennium
Microelectronics Reliability, 1997openaire +1 more source

