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Semiconductor-, Lithography-, and Electrically-Related Applications

1999
Electron-beam (e-beam) lithography has over the past 15 years or so taken a predominant role in Si wafer patterning in the semiconductor industry due to its sub-micron (and potential nano-scale) resolution. This high resolution and the accurate focussing of e-beams is however limited by charging which occurs in the photo-resist: a trapping of charge ...
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Using Destructive Optical Interference in Semiconductor Lithography

Optics and Photonics News, 2006
Integrated circuits—one of the greatest inventions of the last half of the 20th century—are still made using photolithography, even though their dimensions are now well below the exposure wavelength. Carefully tailored destructive interference is what makes it possible.
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LithoBench: Benchmarking AI Computational Lithography for Semiconductor Manufacturing

Advances in Neural Information Processing Systems 36, 2023
Su Zheng   +4 more
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Sustainable semiconductor manufacturing: lessons for lithography and etch

Advanced Etch Technology and Process Integration for Nanopatterning XII, 2023
Emily E. Gallagher   +5 more
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Multiphoton Lithography of Organic Semiconductor Devices for 3D Printing of Flexible Electronic Circuits, Biosensors, and Bioelectronics

Advanced Materials, 2022
Milad Khorrami   +2 more
exaly  

Scalable Fabrication of Strongly Textured Organic Semiconductor Micropatterns by Capillary Force Lithography

Advanced Materials, 2012
Arturas Vailionis   +2 more
exaly  

Reduction of Bubble-Induced Defect in Semiconductor Lithography Process

2023
Kyoung-Whan Oh   +5 more
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Semiconductor lithography for the next millennium

Microelectronics Reliability, 1997
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