Results 291 to 300 of about 14,706 (300)
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Fabrication of high performance 512K static-random access memories in 0.25 μm complementary metal–oxide semiconductor technology using x-ray lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1993
D Seeger, K Petrillo, P Agnello
exaly  

Semiconductor on glass photocathodes as high-performance sources for parallel electron beam lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1996
R F W Pease
exaly  

Nanoimprint lithography and future patterning for semiconductor devices

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2011
Tatsuhiko Higashiki, Tetsuro Nakasugi
exaly  

Semiconductor technology roadmaps and lithography implications

Advances in Patterning Materials and Processes XLII
Karey Holland, Steven P. Holland
openaire   +1 more source

Jet-printed Lithography for Semiconductor Device Fabrication

NIP & Digital Fabrication Conference, 2002
W.S. Wong   +4 more
openaire   +1 more source

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