Results 281 to 290 of about 14,706 (300)
Some of the next articles are maybe not open access.

Ultrathin semiconductor layer masks for high vacuum focused Ga ion beam lithography

Applied Physics Letters, 1988
L R Harriott, M B Panish, Temkin H
exaly  

EL-3 application to 0.5 μm semiconductor lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1983
W Stickel
exaly  

Lithography : Manufacturing Technologies in Semiconductor Device

Journal of the Society of Mechanical Engineers, 1986
openaire   +1 more source

The Potential for Economic Application of Maskless Lithography in Semiconductor Manufacturing

IEEE Transactions on Semiconductor Manufacturing, 2010
Robert C Leachman
exaly  

Sustainable Semiconductor Manufacturing: The Role of Lithography

IEEE Transactions on Semiconductor Manufacturing
Emily Gallagher   +2 more
openaire   +1 more source

Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1996
G F Cardinale, G D Kubiak, D M Tennant
exaly  

Monolayer graphene-insulator-semiconductor emitter for large-area electron lithography

Applied Physics Letters, 2017
Matthew P Kirley   +2 more
exaly  

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