Results 281 to 290 of about 14,706 (300)
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Nanoscale GaAs metal–semiconductor–metal photodetectors fabricated using nanoimprint lithography
Applied Physics Letters, 1999S Y Chou, Yu Zhaoning, Chou S Y
exaly
Ultrathin semiconductor layer masks for high vacuum focused Ga ion beam lithography
Applied Physics Letters, 1988L R Harriott, M B Panish, Temkin H
exaly
EL-3 application to 0.5 μm semiconductor lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1983W Stickel
exaly
Lithography : Manufacturing Technologies in Semiconductor Device
Journal of the Society of Mechanical Engineers, 1986openaire +1 more source
The Potential for Economic Application of Maskless Lithography in Semiconductor Manufacturing
IEEE Transactions on Semiconductor Manufacturing, 2010Robert C Leachman
exaly
Sustainable Semiconductor Manufacturing: The Role of Lithography
IEEE Transactions on Semiconductor ManufacturingEmily Gallagher +2 more
openaire +1 more source
Fabrication of metal–oxide–semiconductor devices with extreme ultraviolet lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1996G F Cardinale, G D Kubiak, D M Tennant
exaly
Monolayer graphene-insulator-semiconductor emitter for large-area electron lithography
Applied Physics Letters, 2017Matthew P Kirley +2 more
exaly

