Results 221 to 230 of about 1,030,278 (260)

Techniques for shadow mask deposition of nonplanar dielectric layers

The 16th Annual Meeting of the IEEE Lasers and Electro-Optics Society, 2003. LEOS 2003., 2004
In this investigation, we explore the deposition of nonplanar dielectric layers using laser micromachined shadow masks. Depositing dielectrics on semiconductors is advantageous for a variety of reasons. By finishing VCSELs or RC-LEDs with dielectric layers, expense and time can be avoided.
S.B. Blickenstaff, T.R. Nelson, A.M. Sarangan   +2 more
openaire   +1 more source

Shadow Masked Pulsed Laser Deposition of WSex Films: Experiment and Modeling

Applied Surface Science, 2013
Abstract Pulsed laser deposition of WSex films was carried out in a buffer gas (Ar). The mask was placed between a WSe2 target and a substrate in order to prevent the deposition of micro- and nanoparticles. At Ar pressure of 2 Pa the laser plume was effectively scattered by the gas into a shadow area, and the ion bombardment of the film was the most ...
R I Romanov, S N Grigoriev, V Yu Fominski   +2 more
exaly   +2 more sources

Influence of shadow mask design and deposition methods on nonplanar dielectric material deposition

Journal of Micro/Nanopatterning, Materials, and Metrology, 2005
In this paper, we report on the deposition of nonplanar SiO2 and SiNx dielectric layers using plasma-enhanced chemical vapor deposition (PECVD), radio frequency (rf) sputtering and reactive rf sputtering through metal and dielectric shadow masks. The layers were analyzed for trends in deposition rate and curvature as a function of shadow mask material ...
Sarah B. Blickenstaff, Andrew M. Sarangan, Thomas R. Nelson, Kevin Leedy, Donald Agresta   +4 more
openaire   +1 more source

Silicon shadow masks for fine-feature thin-film depositions

IEEE Electron Device Letters, 1982
In this paper we investigate the possibility of using silicon wafers with anisotropically etched-through slots as shadow masks. We report slots having widths of 11 µm and 172 µm. A double-etching scheme that makes possible a considerably narrower slot width as well as greater uniformity of the widths of the slots is evaluated.
M. Sango, T. Van Duzer
openaire   +1 more source

Reconfigurable shadow mask technology: a microsystem for metal nanoline deposition

Nanotechnology, 2004
Reconfigurable shadow mask technology, presented in this paper, introduces the use of microsystems for in situ metal deposition, and direct patterning of structures with micron and submicron lateral and vertical dimensions. A multilayer microstructure acts as a set of addressable active shutters and shadow masks in a physical vapour deposition (PVD ...
Christophe G Courcimault, Mark G Allen
openaire   +1 more source

Apparatus for deposition of composition spread alloy films: The rotatable shadow mask

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2012
Composition spread alloy films (CSAFs) are materials libraries used for high throughput investigations of multicomponent materials such as alloys, AxByC1−x−y. CSAFs are prepared such that the alloy film has a lateral spatial gradient in its local composition; thus, they include a set of alloy samples with a distribution of compositions that spans a ...
Benoit Fleutot, James B. Miller, Andrew J. Gellman   +2 more
openaire   +1 more source

11-4: Ionization Electric-Field Organic Material Deposition Method for Reducing Shadow-Mask Effect

Digest of Technical Papers SID International Symposium, 2021
To make a full‐color high‐resolution organic light emitting diodes (OLEDs) device, it is necessary to reduce mask shadow effect. The ionization‐electric field organic material deposition was proposed as an advanced method of organic material thin film deposition to reduce mask shadow effect. The organic material was ionized by contact with tungsten (W)
Heemin Park, Seungyong Song, Duckjung Lee, Jungsun Park, Yeongje Park, Wonhyeok Park, Sangsoo Kim, Hyeyong Chu   +7 more
exaly   +2 more sources

Fabrication of TiN thin film by shadow-masked pulsed laser deposition

Thin Solid Films, 2001
A shadow-masked pulsed laser deposition (SPLD) technique has been used to fabricate TiN thin film on a silicon substrate. By interposing a chosen mask of the appropriate size and location between the laser-induced plasma plume and the substrate, it was possible to vary the quality and smoothness of the resultant film.
Chen, C., Ong, P.P., Wang, H.
openaire   +1 more source

Direct growth of nanostructures by deposition through an Si3N4 shadow mask

Physica E: Low-dimensional Systems and Nanostructures, 1999
Abstract We propose a method for the simultaneous fabrication of a multitude of identical nanodots . Without any further lithographic procedures, structures in the regime of 100 nm and below can be directly prepared by vapour deposition while partly shadowing the substrate with a free standing stencil mask, – here an Si 3N4 membrane with an ...
Köhler, J., Albrecht, M., Musil, C.R., Bucher, E.   +3 more
openaire   +3 more sources

PECVD Shadow Mask Deposition of Amorphous Silicon– a Shortcut to Local Passivating Contacts

2020
We develop and investigate shadow masks for the local PECVD deposition of amorphous Si (a-Si) fingers to be applied as local poly-crystalline Si (poly-Si) passivating contacts in the industrial fabrication of novel solar cell concepts such as TOPCon, PERC+POLO and POLO-IBC.
Stöhr, M., Beier, B., Aprojanz, J., Vogt, A., Ambrosius, N., Brendel, R., Dullweber, T.   +6 more
openaire   +1 more source