Results 211 to 220 of about 1,030,278 (260)

van der Waals devices for surface-sensitive experiments.

open access: yesNanoscale
Taufertshöfer N   +13 more
europepmc   +1 more source

Limitations of Patterning Thin Films by Shadow Mask High Vacuum Chemical Vapor Deposition

open access: yesThin Solid Films, 2014
A key factor in engineering integrated devices such as electro-optic switches or waveguides is the patterning of high quality crystalline thin films into specific geometries. In this contribution high vacuum chemical vapor deposition (HV-CVD) was employed to grow titanium dioxide (TiO2) patterns onto silicon. The directed nature of precursor transport -
Patrik Hoffmann   +2 more
exaly   +3 more sources

Spreading of Thin-Film Metal Patterns Deposited on Nonplanar Surfaces Using a Shadow Mask Micromachined in Si (110) [PDF]

open access: yesJournal of Vacuum Science & Technology B, 2007
The application of a three dimensional, self-aligning shadow mask in (110)-oriented silicon for thin-film metal deposition is discussed. This shadow mask is used for the deposition of metal tracks on the bottom of structures with vertical sidewalls, i.e., the patterning of metal catalytic patches underneath the membrane that covers the deep flow ...
Roald M Tiggelaar   +2 more
exaly   +3 more sources

Conformally Overlaid Ferromagnetic Shadow Masks for Etching and Deposition Processes

open access: yesJournal of Microelectromechanical Systems
The pattern fabrication using a shadow mask does not involve the use of solutions, which is beneficial for scenarios incompatible with wet processes. However, when the shadow mask is partially fixed from its edges, the conformal overlay of the mask may ...
Jaeman Song, Jungchul Lee, Taeyeong Kim
exaly   +3 more sources
Some of the next articles are maybe not open access.

Related searches:

Asilicon Shadow Mask for Deposition on Isolated Areas

Journal of Micromechanics and Microengineering, 2000
A shadow mask with high pattern flexibility is realized by deep reactive ion etching (RIE) on Si wafer. The novel features of the mask are the presence of a mechanical alignment structure and of patterns with isolated islands inside them. The advantage of this shadow mask is the possibility of deposition of any kind of pattern shape by evaporation or ...
Yoshio Mita
exaly   +3 more sources

Stoichiometry and Thickness Variation of YBa2Cu3O7−x in Pulsed Laser Deposition With a Shadow Mask

Applied Physics Letters, 1997
The deposition of particulate species, typically seen in pulsed laser deposition can be eliminated by the deployment of a line-of-sight shadow technique. Since the technique uses the discrimination between ballistic and diffusive species, it is important to understand the lateral stoichiometry and thickness dependence under various deposition ...
Supab Choopun   +2 more
exaly   +2 more sources

Home - About - Disclaimer - Privacy