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Tree pollen allergen sensitization: Prevalence, risk factors, and geographic variation in the United States. [PDF]
Robinson M +5 more
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Thermal conductivity of Si/SiGe and SiGe/SiGe superlattices
Applied Physics Letters, 2002The cross-plane thermal conductivity of four Si/Si0.7Ge0.3 superlattices and three Si0.84Ge0.16/Si0.76Ge0.24 superlattices, with periods ranging from 45 to 300 and from 100 to 200 Å, respectively, were measured over a temperature range of 50 to 320 K. For the Si/Si0.7Ge0.3 superlattices, the thermal conductivity was found to decrease with a decrease in
Scott T. Huxtable +9 more
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SiGe nano-heteroepitaxy on Si and SiGe nano-pillars
Nanotechnology, 2018In this paper, SiGe nano-heteroepitaxy on Si and SiGe nano-pillars was investigated in a 300 mm industrial reduced pressure-chemical vapour deposition tool. An integration scheme based on diblock copolymer patterning was used to fabricate nanometre-sized templates for the epitaxy of Si and SiGe nano-pillars.
Mastari, M +10 more
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Noise in Si/SiGe and Ge/SiGe MODFET
SPIE Proceedings, 2004The progress of SiGe strained layer heteroepitaxy on virtual buffer substrates has opened up the opportunities for Si-based n- and p-channel HFETs with excellent RF performance. These devices have been reached outstanding high frequency figures of merit with fMAX of 188 GHz and 135 GHz, for the n-HFET and the p-HFET, respectively.
Frederic P. Aniel +6 more
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Radiation emission from wrinkled SiGe/SiGe nanostructure
Applied Physics Letters, 2010Semiconductor optical emitters radiate light via band-to-band optical transitions. Here, a different mechanism of radiation emission, which is not related to the energy band of the materials, is proposed. In the case of carriers traveling along a sinusoidal trajectory through a wrinkled nanostructure, radiation was emitted via changes in their velocity
Fedorchenko, A. I. +3 more
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High speed Si/SiGe and Ge/SiGe MODFETs
2003 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, 2003. Digest of Papers., 2003The high frequency and noise performances of n- and p-SiGe based MODFETs are reviewed. Their excellent HF and low noise behavior makes them well suited for RF mobile communications. We discuss their physical modeling, design optimization and self-heating effects.
F. Aniel +7 more
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Base current tuning in SiGe HBT's by SiGe in the emitter
International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224), 2002Npn-type SiGe heterojunction bipolar transistors (HBT's) have high cut-off frequencies, but low breakdown voltages due to their high current gain. We show that a SiGe layer in the emitter can increase the base current and hence the breakdown voltage while the collector current and cut-off frequency are not reduced.
H.G.A. Huizing +3 more
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2017
The Subnikov-de Haas oscillations have been investigated in a two-dimensional hole gas in pure germanium quantum well in SiGe/Ge/SiGe heterostructure with the hole concentration p(H) 5,68??10???? ?????? and mobility ??= 4,68??10??? ?????? ?????????????????? in magnetic fields up to 15 T and the temperature range from 40 mK to 4 K.
Mironov, O.A. +2 more
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The Subnikov-de Haas oscillations have been investigated in a two-dimensional hole gas in pure germanium quantum well in SiGe/Ge/SiGe heterostructure with the hole concentration p(H) 5,68??10???? ?????? and mobility ??= 4,68??10??? ?????? ?????????????????? in magnetic fields up to 15 T and the temperature range from 40 mK to 4 K.
Mironov, O.A. +2 more
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Pt Reactions with Ge, SiGe, and Si/SiGe Superlattices
MRS Proceedings, 1992ABSTRACTReactions between Pt and SiGe alloy have been studied by comparing several structures: Pt/Ge, Pt/SiGe, and Pt/Si-SiGe superlattices. The Ge, SiGe layers and Si-SiGe superlattices were grown on (100) Si substrates by the ultrahigh vacuum/chemical vapor deposition technique. Pt-Ge reactions start around 200 °C, forming PtzGe.
P. J. Wang +4 more
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2016 46th European Solid-State Device Research Conference (ESSDERC), 2016
We report on the layout effects in strained SiGe channel FDSOI pMOSFETS down to 20nm gate length. Two SiGe integration schemes are compared: the SiGe-first approach, with Ge-enrichment performed prior to the STI module and the SiGe-last approach using only a SiGe epitaxy after the STI module.
Berthelon, Rémy +8 more
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We report on the layout effects in strained SiGe channel FDSOI pMOSFETS down to 20nm gate length. Two SiGe integration schemes are compared: the SiGe-first approach, with Ge-enrichment performed prior to the STI module and the SiGe-last approach using only a SiGe epitaxy after the STI module.
Berthelon, Rémy +8 more
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