Wafer-Scale Deterministic Fabrication of Axis-Ratio-Engineered Silicon Nanoparticles for On-Resonance Electric-Magnetic Dipole Interference. [PDF]
Kim T, Lee J.
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Engineering Oncolytic Virus‐Armed Macrophages for Enhanced Cancer Immunotherapy
ZIFOA‐M is engineered by conjugating oncolytic adenovirus‐loaded ZIF‐8 nanoparticles onto macrophage surfaces via bioorthogonal chemistry. Upon tumor infiltration, the platform releases OA to downregulate CD47/CD24 on tumor cells, restoring macrophage phagocytosis.
Jilong Wang +10 more
wiley +1 more source
A silicon microneedle array atmospheric pressure plasma ionization source for real-time trace gas chemical analysis. [PDF]
Chew BS +6 more
europepmc +1 more source
ABSTRACT The multifunctional integration of chips with high flexibility and scalable manufacturing is crucial for enhancing chip performance, reducing chip size, and simplifying chip design. However, balancing volume, cost, flexibility, and functionality using traditional heterogeneous integration methods is challenging.
Lang Chen +7 more
wiley +1 more source
Improving 3C-SiC Quality Through Wafer-Bonded Switchback Epitaxy. [PDF]
Colston G +6 more
europepmc +1 more source
Organoid Brain‐Machine‐Interface Devices for Central Nervous System Repair
We envision organoid brain‐machine‐interface (Organoid‐BMI) devices as new biohybrid bidirectional communication pathways to connect the human CNS and the external world for personalized CNS repair and regeneration. ABSTRACT Central nervous system (CNS) repair and regeneration suffer from tremendous clinical challenges due to current limitations in ...
Yantao Xing +10 more
wiley +1 more source
Silicon Dioxide Multi-Mode Interference Spectrometers. [PDF]
Harkness JG +5 more
europepmc +1 more source
The Mechanism of Ruthenium Oxide Catalyzed Electroless Etching of Silicon in Oxidizing HF Solution. [PDF]
Bai B +6 more
europepmc +1 more source
Robust Shape-from-Focus via Physics-Inspired Distortion-Aware Focal Depth Regression. [PDF]
Li X +5 more
europepmc +1 more source
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Wafer-to-wafer fusion bonding of oxidized silicon to silicon at low temperatures
Sensors and Actuators A: Physical, 1998Abstract In this paper a silicon wafer-to-wafer bonding process is presented where silicon dioxide is used as an intermediate layer. Because the process temperature is very low (120 °C) and because the chemical treatment of the surface before bonding does not damage aluminium patterns, wafers containing electronic circuity can be bonded.
A. Berthold, B. Jakoby, M.J. Vellekoop
openaire +1 more source

