Results 21 to 30 of about 389,974 (331)
Micro-LEDs have been attracting attention as a potential candidate for the next generation of display technology. Here we demonstrate the feasibility of large-area monolithic integration of multi-color InGaN micro-LEDs via pulsed sputtering deposition ...
Soichiro Morikawa +3 more
doaj +1 more source
Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications.
A. Iqbal, F. Mohd-Yasin
semanticscholar +1 more source
High frequency supercapacitors (HFSCs) are promising in alternating current line filtering and adaptable storage of high-frequency pulse electrical energy.
Pai Lu +4 more
doaj +1 more source
Structural and electrical properties of CuAlMo thin films prepared by magnetron sputtering [PDF]
The structural and electrical properties of a low resistivity CuAlMo thin film resistor material were investigated. The thin films were grown on Al2O3 and glass substrates by direct current (dc) magnetron sputtering.
Bashev +31 more
core +1 more source
Production of Size-Controlled Gold Nanoclusters for Vapor–Liquid–Solid Method
This study demonstrated the deposition of size-controlled gold (Au) nanoclusters via direct-current magnetron sputtering and inert gas condensation techniques.
Alam Saj +5 more
doaj +1 more source
Coulomb explosion sputtering of selectively oxidized Si [PDF]
We have studied multiply charged Arq+ ion induced potential sputtering of a unique system comprising of coexisting Silicon and Silicon oxide surfaces. Such surfaces are produced by oblique angle oxygen ion bombardment on Si(100), where ripple structures ...
A Chakrabarti +8 more
core +1 more source
A study of Pt-/alpha-Fe2O3 nanocomposites by XPS [PDF]
alpha-Fe2O3 matrices were deposited on Fluorine-doped Tin Oxide (FTO) substrates by Plasma Enhanced- Chemical Vapor Deposition (PE-CVD) from Fe(hfa)_2TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N’,N’-tetramethylethylenediamine).
CARRARO, GIORGIO +5 more
core +1 more source
Surface charging of thick porous water ice layers relevant for ion sputtering experiments [PDF]
We use a laboratory facility to study the sputtering properties of centimeter-thick porous water ice subjected to the bombardment of ions and electrons to better understand the formation of exospheres of the icy moons of Jupiter.
Brouet, Y. +8 more
core +2 more sources
The growth of vertically aligned carbon nanofibers (VACNFs) in a catalytic dc ammonia/acetylene plasma process on silicon substrates is often accompanied by sidewall deposition of material that contains predominantly Si and N.
Ryan Pearce +6 more
doaj +1 more source
The Surface Properties of Implant Materials by Deposition of High-Entropy Alloys (HEAs)
High-entropy alloys (HEAs) contain more than five alloying elements in a composition range of 5–35% and with slight atomic size variation. Recent narrative studies on HEA thin films and their synthesis through deposition techniques such as sputtering ...
Khalid Usman +7 more
doaj +1 more source

