Results 31 to 40 of about 389,974 (331)

Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering

Scientific Reports, 2019
Titanium nitride (TiN) has recently emerged as an attractive alternative material for plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either sputtering or atomic layer deposition has greatly limited its potential ...
Chun-Chieh Chang, J. Nogan, Zu-Po Yang, W. Kort-Kamp, Willard Ross, T. Luk, D. Dalvit, A. Azad, Houtong Chen   +8 more
semanticscholar   +1 more source

Design of Nanoscaled Surface Morphology of TiO₂–Ag₂O Composite Nanorods through Sputtering Decoration Process and Their Low-Concentration NO₂ Gas-Sensing Behaviors

Nanomaterials, 2019
TiO2−Ag2O composite nanorods with various Ag2O configurations were synthesized by a two-step process, in which the core TiO2 nanorods were prepared by the hydrothermal method and subsequently the Ag2O crystals were deposited by sputtering ...
Yuan-Chang Liang, Yen-Chen Liu
doaj   +1 more source

A correlation between fractal growth, water contact angle, and SERS intensity of R6G on ion beam nanostructured ultra-thin gold (Au) films

Frontiers in Physics, 2023
Introduction: This study focuses on the detection of rhodamine-6G using surface-enhanced Raman scattering (SERS) on gold nanostructures (AuNS) of different sizes.
Priya Jasrotia, Bhanu Priya, Raj Kumar, Priyanka Bishnoi, Ankush vij, Ankush vij, Tanuj Kumar   +6 more
doaj   +1 more source

Composition depth profile analysis of electrodeposited alloys and metal multilayers: the reverse approach [PDF]

, 2011
The reverse depth profile analysis is a recently developed method for the study of a deposit composition profile in the near-substrate zone. The sample preparation technique enables one to separate the deposit and a thin cover layer from its substrate ...
Bartók, András, Csík, Attila, Molnár, György, Neuróhr, Katalin, Péter, László, Vad, Kálmán   +5 more
core   +1 more source

Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

, 2019
Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical properties of refractory ceramic thin films grown at low temperatures by magnetron sputtering.
G. Greczynski, I. Petrov, J. Greene, L. Hultman   +3 more
semanticscholar   +1 more source

Crystal Structure And Optical Properties Of TiO2 Thin Films Prepared By Reactive RF Magnetron Sputtering

Archives of Metallurgy and Materials, 2015
In sputtering deposition process of TiO2, metal Ti or sintered TiO2 target is used as deposition source. In this study, we have compared the characteristic of target materials.
Goto S., Adachi Y., Matsuda K., Nose M.
doaj   +1 more source

Mass Loss Due to Sputtering and Thermal Processes in Meteoroid Ablation

, 2005
Conventional meteoroid theory assumes that the dominant mode of ablation is by evaporation following intense heating during atmospheric flight. In this paper we consider the question of whether sputtering may provide an alternative disintegration process
Adolfsson, Almen, Anderson, Barlow, Bellot Rubio, Bohdansky, Bohdansky, Borovicka, Bronshten, Campbell, Ceplecha, Coulson, Coulson, Draine, Draine, Elford, Ellyett, Ellyett, Fisher, Fujiwara, Fyfe, Hawkes, Hawkes, Hedin, Hedin, Jacchia, Janches, Jones, Jurac, K.A. Hill, L.A. Rogers, Lebedinets, LeBlanc, Matsunami, McKinley, Molchanov, Nicol, R.L. Hawkes, Simek, Spurny, Spurny, Steel, Tielens, Verniani, von Zahn, Öpik   +45 more
core   +1 more source

Nanocomposites of metallic copper and spinel ferrite films: Growth and self-assembly of copper particles [PDF]

, 2005
Nanocomposites of metallic copper and iron oxides films have been prepared by RF-sputtering of pure CuFeO2 delafossite target. The films are made of copper and spinel ferrite crystallites of less than 10 nm in diameter. The content of metallic copper and
Barnabé, Antoine, Bonningue, Corine, Mugnier, Emmanuelle, Pasquet, Isabelle, Presmanes, Lionel, Tailhades, Philippe   +5 more
core   +3 more sources

Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering

Coatings, 2019
The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO2) thin films. Microstructure observations show that an increase in the sputtering power has a significant
A. Wiatrowski, Agata Obstarczyk, M. Mazur, D. Kaczmarek, D. Wojcieszak   +4 more
semanticscholar   +1 more source

Low-Temperature and High-Speed Fabrication of Nanocrystalline Ge Films on Cu Substrates Using Sub-Torr-Pressure Plasma Sputtering

IEEE Open Journal of Nanotechnology, 2022
We fabricated nanocrystalline Ge films using radio-frequency (RF) magnetron plasma sputtering deposition under a high Ar-gas pressure. The Ge nanograins changed from amorphous to crystalline when the distance between the Ge sputtering target and the ...
Giichiro Uchida, Kenta Nagai, Ayaka Wakana, Yumiko Ikebe   +3 more
doaj   +1 more source