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Maximal supergravities in SU(8/1)
Physical Review D, 1989It is shown that four- and ten-dimensional chiral maximal supergravities can be described in SU(8/1) superalgebra. The supermultiplets of both of these theories belong to an irreducible representation of SU(8/1). Dimensional reduction is also discussed.
, Kim, , Kim, , Kim, , Park
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Diffusion of water into SU-8 microcantilevers
Physical Chemistry Chemical Physics, 2010We present a method to monitor the diffusion of liquid molecules in polymers. A microdrop of water is deposited by a piezoelectric drop generator onto the upper surface of a cantilever made of SU-8 based photoresist. In response, the cantilever bends in the opposite direction.
Liu, C. +8 more
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Viscoelastic Material Properties of SU-8 and Carbon-Nanotube-Reinforced SU-8 Materials
Electronic and Photonic Packaging, Electrical Systems Design and Photonics, and Nanotechnology, 2006The viscoelastic material properties of SU-8 and carbon nanotube-reinforced SU-8 composite material are characterized by tensile testing. Dogbone samples of 0.1mm thickness are prepared by micro-fabrication process, which is composed of spin coat, soft bake, expose, and post exposure bake.
Seungbae Park +3 more
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2010 IEEE Antennas and Propagation Society International Symposium, 2010
Originally developed and patented by IBM in 1989 and commercially introduced by MicroChem Corporation in 1996, SU-8 rapidly found wide use in UV and X-ray lithography as a negative tone photoresist for microsystem technology applications [1]. Its very low optical absorption in UV and X-ray ranges leads to uniform exposure conditions for thicknesses up ...
Rashidian, A. +4 more
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Originally developed and patented by IBM in 1989 and commercially introduced by MicroChem Corporation in 1996, SU-8 rapidly found wide use in UV and X-ray lithography as a negative tone photoresist for microsystem technology applications [1]. Its very low optical absorption in UV and X-ray ranges leads to uniform exposure conditions for thicknesses up ...
Rashidian, A. +4 more
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Journal of Micromechanics and Microengineering, 2010
SU-8 can be patterned with high resolution, is flexible and tough. These characteristics qualify SU-8 as a material for making spotting pins for printing DNA and protein microarrays, and it can potentially replace the commonly used silicon and steel pins that are expensive, brittle in the case of silicon and can damage the substrate during the printing
R Safavieh +4 more
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SU-8 can be patterned with high resolution, is flexible and tough. These characteristics qualify SU-8 as a material for making spotting pins for printing DNA and protein microarrays, and it can potentially replace the commonly used silicon and steel pins that are expensive, brittle in the case of silicon and can damage the substrate during the printing
R Safavieh +4 more
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Journal of Microelectromechanical Systems, 2007
This paper presents the optimization and characterization of SU-8 quad beam optical accelerometers based on intensity modulation. An applied acceleration causes a misalignment between three waveguides, resulting in variation of losses. Mechanical simulations have focused on the evaluation of sensitivity and the design of a robust junction between the ...
Andreu Llobera +4 more
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This paper presents the optimization and characterization of SU-8 quad beam optical accelerometers based on intensity modulation. An applied acceleration causes a misalignment between three waveguides, resulting in variation of losses. Mechanical simulations have focused on the evaluation of sensitivity and the design of a robust junction between the ...
Andreu Llobera +4 more
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MRS Proceedings, 1998
AbstractAn existing test system for recording the stress-strain curves of metal microspecimens has been used to measure the strength of the ultrathick photoresist SU-8. The microspecimens are 3 mm long with a gage section 0.2 mm wide. The SU-8-25 specimens were 0.08 mm thick with an average strength of nearly 120 MPa, and the SU-8-50 specimens were 0 ...
A. Mcaleavey +3 more
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AbstractAn existing test system for recording the stress-strain curves of metal microspecimens has been used to measure the strength of the ultrathick photoresist SU-8. The microspecimens are 3 mm long with a gage section 0.2 mm wide. The SU-8-25 specimens were 0.08 mm thick with an average strength of nearly 120 MPa, and the SU-8-50 specimens were 0 ...
A. Mcaleavey +3 more
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Polyallylamine as an Adhesion Promoter for SU-8 Photoresist
Microscopy and Microanalysis, 2016AbstractResist lithography is an important microfabrication technique in the electronics industry. In this, patterns are transferred by irradiation onto a photosensitive polymer. SU-8 has emerged as a favorite photoresist for High Aspect Ratio (HAR) lithography, showing high chemical and mechanical stability and biocompatibility.
Shiladitya, Chatterjee +4 more
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Characterization of SU-8 for electrokinetic microfluidic applications
Lab on a Chip, 2005The characterization of SU-8 microchannels for electrokinetic microfluidic applications is reported. The electroosmotic (EO) mobility in SU-8 microchannels was determined with respect to pH and ionic strength by the current monitoring method. Extensive electroosmotic flow (EOF), equal to that for glass microchannels, was observed at pH > or =4.
Tiina, Sikanen +5 more
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Immobilisation of DNA to polymerised SU-8 photoresist
Biosensors and Bioelectronics, 2006SU-8 is an epoxy-based photosensitive resist, which is currently used for a large variety of MEMS and lab-on-a-chip applications. Here, we demonstrate a one-step process to functionalize SU-8 with DNA probes. The immobilisation procedure relies on direct coupling of DNA to SU-8 and resulted in surfaces with functional capture probe densities of ...
Rodolphe, Marie +8 more
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