Results 251 to 260 of about 14,884,423 (272)

SU-8 for Microsystem Fabrication

2014
SU-8 is a negative-tone photoresist that can be used to fabricate thick, high aspect ratio structures. The thickness of SU-8 structures ranges from several micrometers to several hundred micrometers or up to millimeters by direct spin coating or stacking of multiple layers of dry films.
Yi Chiu, Yu-Ting Cheng
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SU-8 ON PMMA – A NEW TECHNOLOGY FOR MICROFLUIDICS

International Journal of Computational Engineering Science, 2003
Conventional SU-8 lithography process for fabricating microfluidic devices ofthe uses silicon or glass as wafer materials. Since silicon and glass are hard and brittle, drilling fluid access holes or dicing the wafers into individual devies are difficult. We investigated the use of polymethylmethacrylate (PMMA) as a new wafer material.
Thai-Quang Truong, Nam-Trung Nguyen
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CHARACTERIZATION AND APPLICATION OF PAG DILUTED SU-8

International Journal of Computational Engineering Science, 2003
The concentration of photoacidgenerator (PAG) in SU-8 determines the UV absorption and, therefore, is a limiting factor of the applicable SU-8 thickness. The motivation of this work is to improve SU-8 process control and expand the application scope of SU-8 by modifying its PAG concentration.
Zhong-Geng Ling, Kun Lian, Jian Zhang
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Su-8-based nanocomposites for acoustical matching layer

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, 2009
SU-8, an epoxy-based photoresist, was introduced as the acoustical matching layer between silicon and water for lab-on-chip applications integrating acoustic characterization. Acoustical performances, including the acoustic longitudinal wave velocity and attenuation of the SU-8-based matching layer, were characterized at a frequency of 1 GHz at room ...
Wang, S., Campistron, Pierre, Carlier, Julien, Debavelaere-Callens, Dorothée, Nongaillard, Bertrand, Ndieguene, Assane, Nassar, Georges, Soyer, Caroline, Zhao, X.   +8 more
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In situ fabrication of SU-8 movable parts by using PAG-diluted SU-8 as the sacrificial layer

Microsystem Technologies, 2006
In this paper we proposed a novel technology to make SU-8 movable parts in situ by using PAG-diluted SU-8 or SU-8R, a SU-8 solution with no photoacid generator (PAG) content, as the sacrificial layer. Since they are not or less sensitive to UV light the unexposed bottom layer in UV lithography will be dissolved to release the movable components during ...
Z. Ling, K. Lian
openaire   +1 more source

Thick SU-8 photolithography for BioMEMS

SPIE Proceedings, 2003
SU-8, negative-tone epoxy base, photoresist has a great potential for ultra-thick high aspect ratio structures in low cost micro-fabrication technologies. Commercial formulation of NanoTM SU-8 2075 is investigate, process limitations are discuss. Good layer uniformity (few %) for single layer up to 200 μm could be obtained in a covered RC8 (Suss ...
Marc Rabarot, Jacqueline Bablet, Marine Ruty, Matthieu Kipp, Isabelle Chartier, Christophe Dubarry   +5 more
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Baryon masses in broken SU(8)

Physical Review D, 1978
We demonstrate that the mass relations among 1/2/sup +/ baryons predicted in quark models can be obtained in SU(8) symmetry, by adding higher-order effects or by including spin-triplet mass breaking. The masses of 3/2/sup +/ isobars are also discussed.
Ramesh C. Verma, M. P. Khanna
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SU-8 Processing on a Variety of Substrates

MRS Proceedings, 1999
AbstractSU-8 has become a popular material for micromachining high aspect ratio structures. Typically, SU-8 is spun on a polished silicon wafer for processing. After patterning, the SU-8 is used for micromachined structures directly (such as fluidic channels) or as a mold for electroforming.
Yuh-Min Chiang, Mark Bachman, Hung-Pin Chang, Charles Chu, G. P. Li   +4 more
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Silanization and antibody immobilization on SU-8

Applied Surface Science, 2007
SU-8, an epoxy based negative photoresist, has emerged as a structural material for microfabricated sensors due to its attractive mechanical properties like low Young's modulus and chemical properties like inertness to various chemicals used in microfabrication. It can be used to fabricate MEMS structures of high aspect ratio.
JOSHI, M, PINTO, RICHARD, RAMGOPAL RAO, V, MUKHERJI, SOUMYA   +3 more
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SU-8 SPIKE ELECTRODES FOR NEURAL SIGNALS

2011
Electrodes are widely used to record biological signals from living tissue, namely in neuroscience where researchers need to record brain signals in vivo. This paper presents a rapid low-cost prototyping technology for protocol-specific electrode designs. The suggested fabrication process combines SU-8 photoresist patterning in multiple layers with the
Ribeiro, J. F., Silva, M. F., Cardoso, V. F., Dias, N. S., Jacinto, L. R., Carmo, João Paulo Pereira, Minas, Graça, Correia, J. H.   +7 more
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