Results 121 to 130 of about 1,875 (175)

Boron Etch-stop In TMAH Solutions

Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95, 1996
Abstract Etch rates of 〈100〉 single-crystal silicon in tetramethyl ammonium hydroxide (TMAH) solutions have been measured as a function of boron doping concentration with the purpose of studying the feasibility of an etch-stop. The boron concentration has been varied up to 2.5 × 1020 cm−3.
Elin Steinsland, Martin Nese, Anders Hanneborg, Ralph W. Bernstein, Halle Sandmo, Gjermund Kittilsland   +5 more
openaire   +1 more source

Advanced Monitoring of TMAH Solution

Solid State Phenomena, 2014
Tetramethyl ammonium hydroxide (TMAH) has wide applications in semiconductor industry, including photoresist development, silica etching (especially Sigma etching), and wafer cleaning, etc. One of the critical areas of the photolithography process is the development of unexposed (negative) or exposed (positive) photoresists without pattern distortion ...
Jing Jing Wang, Eugene Shalyt, Chuan Nan Bai, Guang Liang, Michael MacEwan, Vishal Parekh   +5 more
openaire   +1 more source

Optimization of TMAH etching for MEMS

SPIE Proceedings, 1999
Tetra-methyl ammonium hydroxide (TMAH) is an anisotropic silicon etchant that is gaining considerable use in silicon sensor micromachining due to its excellent compatibility with CMOS processing, selectivity, anisotropy and relatively low toxicity, as compared to the more used KOH and EDP etchants.
S. BRIDA, L. FERRARIO, V. GUARNIERI, F. GIACOMOZZI, B. MARGESIN, M. PARANJAPE, VERZELLESI, Giovanni, M. ZEN   +7 more
openaire   +2 more sources

TMAH etching of silicon and the interaction of etching parameters

Sensors and Actuators A: Physical, 1997
Abstract A study of tetramethylammonium hydroxide (TMAH) etching of silicon and the interaction of etching parameters has been carried out. We find that the silicon etch rate increases as the TMAH concentration increases and it reaches a maximum at 4 wt.%. The etch rate of n-type silicon is found to be slightly higher than that of p-type silicon.
W K Choi
exaly   +2 more sources

Contributions of TMAH Surfactant on Hierarchical Structures of PVA/Fe3O4–TMAH Ferrogels by Using SAXS Instrument

Journal of Inorganic and Organometallic Polymers and Materials, 2018
The magnetic hydrogels combining polyvinyl-alcohol (PVA) and Fe3O4 (magnetite)–TMAH (tetra-methyl ammonium hydroxide) have been successfully fabricated via a Freezing-thawing route. The magnetite nanoparticles were prepared from iron sands by using coprecipitation method.
null Sunaryono, Ahmad Taufiq, Nandang Mufti, Hendra Susanto, Edy Giri Rahman Putra, Siriwat Soontaranon, null Darminto   +6 more
openaire   +1 more source

Anisotropic etching of silicon in TMAH solutions

Sensors and Actuators A: Physical, 1992
Abstract Detailed characteristics of tetramethyl ammonium hydroxide (TMAH, (CH3)4NOH) as silicon anisotropic etching solutions with various concentrations from 5 to 40 wt.% and temperatures from 60 to 90 °C have been studied. The etch rates of (100) and (110) crystal planes decrease with increasing concentration.
Osamu Tabata, Ryouji Asahi, Hirofumi Funabashi, Keiichi Shimaoka, Susumu Sugiyama   +4 more
openaire   +1 more source

TMAH/IPA anisotropic etching characteristics

Sensors and Actuators A: Physical, 1993
The main advantages of tetramethyl ammonium hydroxide (TMAH)-based solutions is their full compatibility with IC technologies. In this work a new etching system of TMAH/IPA (isopropyl alcohol) is suggested. The influence of the addition of IPA to TMAH solutions on their etching characteristics is presented.
Merlos Domingo, Ángel, Acero Leal, María Cruz, Bao, Min-Hang, Bausells, Joan, Esteve i Tintó, Jaume   +4 more
openaire   +2 more sources

Cannizzaro reaction of aldehydes in TMAH thermochemolysis

Journal of Analytical and Applied Pyrolysis, 1997
Abstract Recently, tetramethylammonium hydroxide (TMAH) has been advantageously used in the analytical pyrolysis of polymers, but yielded a great amount of carboxylic acid methyl esters which were absent in conventional pyrolysis. Our experiments with model compounds such as furaldehyde, benzaldehyde, hydroxy-, methoxy-, dimethoxybenzaldehyde and ...
I. Tanczos, M. Schöflinger, H. Schmidt, J. Balla   +3 more
openaire   +1 more source

Microstructures etched in doped TMAH solutions

Microelectronic Engineering, 2000
Tetra-methyl ammonium hydroxide, or TMAH, is an anisotropic silicon etchant that is gaining more and more attention in the fabrication process of mechanical microstructures and device isolation, as an alternative to the more usual KOH and EDP etchants [1]: because of its high compatibility with conventional IC processes, due to the absence of metal ...
S. Brida, M. Paranjape, G. Pignatel, Faes, Alessandro, Guarnieri, Vittorio, Giacomozzi, Flavio, Margesin, Benno, Zen, Mario   +7 more
openaire   +2 more sources

Anisotropy and selectivity control of TMAH

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176), 2002
A new approach to control the characteristics of TMAH silicon anisotropic etchant is proposed. The effects of potassium ions on TMAH etching characteristics at a concentration of 20 wt.% and temperature of 80/spl deg/C were investigated. A K/sub 2/CO/sub 3/ additive to the TMAH was used as a potassium ion source.
openaire   +1 more source