Results 11 to 20 of about 4,153 (244)
Effect of TMAH on the rheological behavior of alumina slurries for gelcasting
Tetramethyl ammonium hydroxide (TMAH) has been demonstrated to increase solids loading effectively and to accelerate gelling rate of alumina slurries gelled by Isobam (a copolymer of isobutylene and maleic anhydride) system.
Jian Zhang +6 more
doaj +3 more sources
Effective suppression of interface states in recessed-gate MIS-HEMTs by TMAH wet etching
The effect of tetramethylammonium hydroxide (TMAH) treatment prior to gate dielectric deposition on the performance of recessed-gate AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) was investigated.
Yu Li +11 more
doaj +2 more sources
Fabrication of recessed-gate AlGaN/GaN MOSFETs using TMAH wet etching with Cu ion implantation
In this study, recessed-gate AlGaN/GaN MOSFETs were fabricated using a novel recess etching method––TMAH wet etching with Cu ion implantation. This innovative approach injects Cu ions selectively into the target AlGaN layer, creating defects that are ...
Jun Hyeok Heo +5 more
doaj +2 more sources
This paper proposes a new technique to engineer the Fin channel in vertical GaN FinFET toward a straight and smooth channel sidewall. Consequently, the GaN wet etching in the TMAH solution is detailed; we found that the m-GaN plane has lower surface ...
Nedal Al Taradeh +9 more
doaj +2 more sources
We demonstrated dual-surface modification of GaN/AlGaN/GaN high-electron mobility transistors using tetramethylammonium hydroxide (TMAH) and piranha solutions prior to gate metallization.
M. Siva Pratap Reddy +3 more
doaj +2 more sources
Low leakage and high blocking voltage GaN-on-GaN Schottky diode by TMAH surface treatment
In this study, the impact of surface treatment by TMAH and HF on the electrical characteristics of GaN-on-GaN Schottky diodes is examined through I–V and C–V characterizations.
Vishwajeet Maurya +10 more
doaj +2 more sources
Friction-induced selective etching on silicon by TMAH solution
Friction-induced selective etching by TMAH solution was proposed for patterning a silicon surface with site control, high flexibility and low cost.
Chao Zhou +7 more
openaire +4 more sources
Surface Texturing of Silicon {100} in an Extremely Low Concentration TMAH for Minimized Reflectivity
Micro-texturing of silicon front surface which consists of geometrical array of structures is needed to reduce the overall reflectance and to increase light trapping by multiple internal reflections of incident light for solar cell application.
Gupta, Arti +2 more
core +2 more sources
Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution
A wide bandgap, an enhanced piezoelectric coefficient, and low dielectric permittivity are some of the outstanding properties that have made ScxAl1−xN a promising material in numerous MEMS and optoelectronics applications.
A. S. M. Z. Shifat +6 more
semanticscholar +1 more source
One of the main objectives of present and future space exploration missions dedicated to astrobiology is the detection of organic molecules of interest for life (e.g. amino and fatty acids).
D. Boulesteix +7 more
semanticscholar +1 more source

