Results 21 to 30 of about 1,875 (175)

An alternative method for the determination of siloxane activities toward basic equilibration catalysts [PDF]

open access: yesJournal of the Serbian Chemical Society, 2005
The method used is based on the well-known fact that siloxane equilibrates once formed, do not change their compositions unless some siloxane compound is added, in which case new equilibrium compositions appear.
Govedarica Milutin N.
doaj   +3 more sources

Facile synthesis of multi-layer graphene by electrochemical exfoliation using organic solvent

open access: yesNanotechnology Reviews, 2018
This paper presents a facile method of producing graphene nanosheets by organic liquid-assisted electrochemical exfoliation using tetramethyleammonium hydroxide (TMAH) as organic electrolyte.
Das Swapan   +3 more
doaj   +1 more source

Effect of TMAH on the rheological behavior of alumina slurries for gelcasting

open access: yesJournal of Asian Ceramic Societies, 2017
Tetramethyl ammonium hydroxide (TMAH) has been demonstrated to increase solids loading effectively and to accelerate gelling rate of alumina slurries gelled by Isobam (a copolymer of isobutylene and maleic anhydride) system.
Jian Zhang   +6 more
doaj   +1 more source

Effective suppression of interface states in recessed-gate MIS-HEMTs by TMAH wet etching

open access: yesApplied Physics Express, 2023
The effect of tetramethylammonium hydroxide (TMAH) treatment prior to gate dielectric deposition on the performance of recessed-gate AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) was investigated.
Yu Li   +11 more
doaj   +1 more source

Characterization of m-GaN and a-GaN Crystallographic Planes after Being Chemically Etched in TMAH Solution

open access: yesEnergies, 2021
This paper proposes a new technique to engineer the Fin channel in vertical GaN FinFET toward a straight and smooth channel sidewall. Consequently, the GaN wet etching in the TMAH solution is detailed; we found that the m-GaN plane has lower surface ...
Nedal Al Taradeh   +9 more
doaj   +1 more source

Fabrication of recessed-gate AlGaN/GaN MOSFETs using TMAH wet etching with Cu ion implantation

open access: yesResults in Physics
In this study, recessed-gate AlGaN/GaN MOSFETs were fabricated using a novel recess etching method––TMAH wet etching with Cu ion implantation. This innovative approach injects Cu ions selectively into the target AlGaN layer, creating defects that are ...
Jun Hyeok Heo   +5 more
doaj   +1 more source

Mathematical modeling of transesterification process kinetics of triglycerides catalyzed by TMAH [PDF]

open access: yesMATEC Web of Conferences, 2019
Biodiesel is a renewable fuel mainly produced by methylation of triglycerides of vegetable oils or animal fats. The production processes nowadays are particularly based on the utilization of inorganic alkali catalysts. However, it has been proved that an
Šánek Lubomír   +3 more
doaj   +1 more source

Investigating the Effects of Gel Casting Parameters on the Suspension Rheology and Mechanical Properties of Titanium Carbide Green Body [PDF]

open access: yesArchives of Metallurgy and Materials, 2018
In this paper the chemo-rheological behavior of aqueous TiC suspension and physical properties of gelcasted green body were investigated. The monomer system used in this project was acrylamide (AM) and methylenebisacrylamide (MBAM).
H. Foratirad   +2 more
doaj   +1 more source

High Performance Organic-Nanostructured Silicon Hybrid Solar Cell with Modified Surface Structure

open access: yesNanoscale Research Letters, 2018
Silicon nanowires (SiNWs) with excellent light trapping properties have been widely applied in photovoltaic devices, which provide opportunities for boosting the photons harvested by Si.
Xiaoli Duan   +2 more
doaj   +1 more source

Photolithographic Patterning of Colloidal Quantum Dots Enabled by Plasma‐Induced Ligand Polymerization

open access: yesAdvanced Materials Technologies, EarlyView.
Plasma‐induced ligand polymerization on colloidal quantum dots (QDs) renders them resistant to organic solvents, enabling conventional photoresist‐based photolithography. This approach achieves microscale patterning with feature sizes down to 3 µm, preserving the optical properties of the QDs and offering a simple and scalable route for QD‐based ...
Boram Kim, Jaehyeon Kim, Heeyeop Chae
wiley   +1 more source

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