Results 31 to 40 of about 1,875 (175)
EFFECT OF POTASSIUM ION ON ANISOTROPY OF TMAH
IEEJ Transactions on Sensors and Micromachines, 2000 We have clarified the effect of potassium ion addition to TMAH solution on orientation dependence of etching rate in silicon anisotropic etching and etched surface roughness. Hemispherical specimen of single crystal silicon and wagon wheel pattern were used for experiments.
Tabata, Osamu +3 more
openaire +2 more sources
High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
Micro and Nano Systems Letters, 2021 Wet anisotropic etching is extensively employed in silicon bulk micromachining to fabricate microstructures for various applications in the field of microelectromechanical systems (MEMS).
Prem Pal +5 more
doaj +1 more source
Advanced Science, EarlyView.We demonstrate that microemulsion solvents can actively template molecular‐level pores within selective layer during interfacial polymerization. By creating localized quasi‐homogeneous polymerization zones, the membrane achieved a 7.1‐fold enhancement in water permeance with increased selectivity.
Feng Li +4 more
wiley +1 more source
Friction-induced selective etching on silicon by TMAH solution
RSC Advances, 2018 Friction-induced selective etching by TMAH solution was proposed for patterning a silicon surface with site control, high flexibility and low cost.
Chao Zhou +7 more
openaire +3 more sources
Single‐Step Analog In‐Memory Matrix Computation in Three‐Dimensional Circuits
Advanced Intelligent Systems, EarlyView.A wooden model illustrates a 3D memristive array designed for single‐step kernel convolutions. It shows how two‐dimensional input data are mapped into the 3D array and convolved in parallel with stored kernels. Color‐coded connection points represent programmed memory‐element values, with each color corresponding to a specific kernel weight.
Alireza Jaberi Rad +8 more
wiley +1 more source
Advanced Intelligent Systems, EarlyView.A two‐terminal IGZO memtransistor enabling low‐voltage operation is demonstrated through coupling enhancement. By utilizing drain‐induced Fowler–Nordheim tunneling, the device achieves programming below 10 V with a large memory window and high on/off ratio.
Junhyeong Park +5 more
wiley +1 more source
Beilstein Journal of Nanotechnology, 2016 The optimization of etchant parameters in wet etching plays an important role in the fabrication of semiconductor devices. Wet etching of tetramethylammonium hydroxide (TMAH)/isopropyl alcohol (IPA) on silicon nanowires fabricated by AFM lithography is ...
Siti Noorhaniah Yusoh +1 more
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Two-step Fabrication of Large Area SiO2/Si Membranes
Medžiagotyra, 2012 Two-step fabrication technique of SiO2/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF6/O2 reactive ion etching is ...
Viktoras GRIGALIŪNAS +7 more
doaj +1 more source
FlexMat, EarlyView.Abstract Imagers operating in the visible to near‐infrared (NIR) range play an important role in applications such as industrial sorting, security surveillance, and autonomous driving. However, conventional imaging technologies based on silicon and III–V semiconductors suffer from several limits, including restricted spectral range, high fabrication ...
Xin Hong +4 more
wiley +1 more source
Effect of the Hydrodynamic Cavitation for the Treatment of Industrial Wastewater
Chemical Engineering Transactions, 2018 In the present work, the degradation of tetramethyl ammonium hydroxide (TMAH) from synthetic liquid waste of electronic industry was investigated by using hydrodynamic cavitation process.
Valentina Innocenzi +2 more
doaj +1 more source