Results 211 to 220 of about 4,153 (244)
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A study of the TMAH based clean performance on advanced photomask
Photomask Technology 2018, 2018As semiconductor devices become extremely integrated and their geometry continues to shrink, even slight critical dimension (CD) move or phase decay during photomask cleaning may have a negative impact on the CD uniformity performance of photomask. In addition, the printing of sub-resolution assist-features (SRAF) on photomask becomes the main limiting
Jian Shen +8 more
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Anisotropic etching of surfactant-added TMAH solution
Technical Digest. IEEE International MEMS 99 Conference. Twelfth IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.99CH36291), 1999The anisotropic silicon etching characteristics of surfactant-added tetramethyl ammonium hydroxide (TMAH) solution were investigated. It was found that the etch rate of the [110] crystal plane abruptly decreases by more than one order of magnitude and that the etch rate ratio of the etch rate of the [100] crystal plane to the etch rate of the [110 ...
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On hillocks generated during anisotropic etching of Si in TMAH
Journal of Microelectromechanical Systems, 1996Hillocks on etched Si{100} surfaces produced by anisotropic etching are a common irritant in the creation of micromachined devices. Close inspection of typical pyramidal hillock shapes reveals that they are usually bounded by convex -directed edges and {111} or near-{111} planes.
L.M. Landsberger +3 more
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Effective improvement in the etching characteristics of Si{110} in low concentration TMAH solution
Micro & Nano Letters, 2018An aqueous tetramethylammonium hydroxide (TMAH) solution is widely used for silicon wet anisotropic etching to perform bulk micromachining for the fabrication of microstructures on a silicon wafer. To reduce the etching time to increase the productivity,
V. Swarnalatha, A. V. N. Rao, P. Pal
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Journal of Environmental Chemical Engineering, 2023
Wu-Xing Chen +8 more
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Wu-Xing Chen +8 more
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An efficient treatment technique for TMAH wastewater by catalytic oxidation
Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130), 2001Developers used in photolithography contain toxic tetramethylammoniumhydroxide (TMAH) and this creates a problem of how to properly treat developer wastewater. We have developed a TMAH wastewater treatment technique that consists of a combination of two novel decomposition processes: pyrolyzing TMAH to TMA and decomposing TMA to N/sub 2/, H/sub 2/O ...
K. Hirano +5 more
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Techniques for the analysis of Cl-ion in TMAH
SPIE Proceedings, 1998Fabricating integrated circuits with increasingly smaller elements mandates that the chlorine ion contents in 2.38% TMAH to be under the 50 ppb level. Previously, the interference from TMAH inhibited the analysis of chlorine ion in TMAH by ion chromatography.
Bang-Chein Ho +2 more
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Mask-Under-Etch Experiments of Si{110} in TMAH
Engineering Solutions for the Next Millennium. 1999 IEEE Canadian Conference on Electrical and Computer Engineering (Cat. No.99TH8411), 2003This work investigates the etching of {110} silicon at 80°C in TMAH at 25wt% and 12wt%. A wagonwheel pattern having 1" spokes is used, and the under-etched surfaces and inclination angles are observed in detail. Under-etched surfaces are often complex, composed of 2 or 3 facets, some smooth and some rough.
A. Pandy, L.M. Landsberger, M. Kahrizi
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Metal purifier for TMAH developer solution
Advances in Patterning Materials and Processes XL, 2023Jinhong Yu, Robb Fang, Yoshiaki Yamada
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