Results 201 to 210 of about 4,153 (244)

Encapsulation of naked dies for bulk silicon etching with TMAH

Microelectronics Reliability, 2002
Abstract Because of the increasing number of metal levels within a semiconductor device and the ongoing transition to new package types failure analysis from the back side of a die becomes necessary. A useful chemical for bulk silicon removal is tetra-methyl-ammonium-hydroxide (TMAH). Because of the aggressive etch conditions, the edges of naked dies
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Biological treatment of electronic industry wastewater containing TMAH, MEA and sulfate in an UASB reactor

Journal of Environmental Science and Health. Part A: Toxic/Hazardous Substances and Environmental Engineering, 2019
This study investigated the feasibility of the methanogenic treatment of electronic industry wastewater containing tetramethylammonium hydroxide (TMAH), monoethanolamine (MEA) and sulfate in a lab-scale mesophilic up-flow anaerobic sludge blanket reactor.
Kampachiro Urasaki, H. Sumino, Tsuyoshi Danshita, Takashi Yamaguchi, K. Syutsubo   +4 more
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Formation of pyramids at surface of TMAH etched silicon

Applied Surface Science, 1999
An investigation on the influence of etchant concentration and ambient temperature on the formation of pyramids arising from the TMAH etching of silicon has been carried out. The number and size of the pyramids were used as parameters for the investigation.
Choi, W.K., Thong, J.T.L., Luo, P., Bai, Y., Tan, C.M., Chua, T.H.   +5 more
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Tetramethylammonium hydroxide (TMAH) thermochemolysis: proposed mechanisms based upon the application of 13C-labeled TMAH to a synthetic model lignin dimer

Organic Geochemistry, 1999
Abstract The mechanism by which heated tetramethylammonium hydroxide (TMAH) degrades the lignin biopolymer was investigated by the novel application of 13C-labeled TMAH (13C-TMAH) in the thermochemolysis of a synthetic model guaiacyl lignin dimer. GC-MS analysis of the products showed labeling patterns consistent with a base-catalyzed intramolecular ...
T.R. Filley, R.D. Minard, P.G. Hatcher
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Si and SiGe Alloys Wet Etching Using TMAH Chemistry

ECS Transactions, 2013
From MEMS to CMOS applications, silicon wet anisotropic etching is nowadays considered as an interesting alternative to face new and various technological challenges. This paper focuses on the TMAH chemistry and its use for Si and Si1-xGex alloys etching.
Virginie Loup, Laurence Gabette, Marie-Christine Roure, Riadh Kachtouli, Marine Jourdan, Pascal Besson, Sebastien Petitdidier   +6 more
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High-performance PIN photodiodes on TMAH thinned silicon wafers

Microelectronics Journal, 2008
The electro-optical characteristics of PIN photodiodes fabricated on high-resistivity silicon substrates locally thinned by bulk micromachining techniques are discussed. Experimental results and numerical simulations demonstrate that devices fabricated by the proposed approach have leakage current, quantum efficiency and speed performance comparable to
Gian-Franco Dalla Betta, S. Ronchin, A. Zoboli, Nicola Zorzi   +3 more
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Morphological and crystallographic evolution of patterned silicon substrate etched in TMAH solutions

, 2019
Wet etching of Si substrate enables fabrication of sophisticated Si microstructures for a number of applications. However, the detailed anisotropic etching behavior of Si in the alkaline TMAH solutions is still not well understood.
Jian Shen, Yuandong Chen, Fei-hu Zhang, Dan Zhang, Y. Gan   +4 more
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Fabrication of an AlN ridge structure using inductively coupled Cl2/BCl3 plasma and a TMAH solution

Japanese Journal of Applied Physics, 2019
We fabricated an AlN ridge structure using a chlorine-based inductive-coupled plasma reactive-ion etching (ICP-RIE) and a tetramethylammonium hydroxide (TMAH) solution.
H. Okumura
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An Experimental Study of TMAH Etching Silicon for MEMS

First International Conference on Integration and Commercialization of Micro and Nanosystems, Parts A and B, 2007
In the process of Micro-Electrical-Mechanical System (MEMS), the anisotropic wet chemical etching rate of the silicon wafer is very important for fabricating MEMS to determine the fabricating method, processing and etching time. The etching rates of the silicon wafer in the TMAH solution with the different temperature are obtained in this paper.
Feiyan Chen, Guoqing Hu, Baihai Wu
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Effect of TMAH on rheological behavior of SiC aqueous suspension

Journal of the European Ceramic Society, 2004
Tetramethyl ammonium hydroxide (TMAH) was used as dispersant for SiC aqueous suspension. The effects of dispersant concentration and pH on the rheological behavior of SiC aqueous suspension were studied. TMAH improves dispersion by increasing the negative zeta potential of SiC particles. The recommended amount of TMAH is 0.6 wt.% in order to obtain the
Wei Li, Ping Chen, Mingyuan Gu, Yanping Jin   +3 more
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