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Mask-Under-Etch Experiments of Si{110} in TMAH

Engineering Solutions for the Next Millennium. 1999 IEEE Canadian Conference on Electrical and Computer Engineering (Cat. No.99TH8411), 2003
This work investigates the etching of {110} silicon at 80°C in TMAH at 25wt% and 12wt%. A wagonwheel pattern having 1" spokes is used, and the under-etched surfaces and inclination angles are observed in detail. Under-etched surfaces are often complex, composed of 2 or 3 facets, some smooth and some rough.
A. Pandy, L.M. Landsberger, M. Kahrizi
openaire +1 more source

Metal purifier for TMAH developer solution

Advances in Patterning Materials and Processes XL, 2023
Jinhong Yu, Robb Fang, Yoshiaki Yamada
openaire +1 more source

The search for organic compounds with TMAH thermochemolysis: From Earth analyses to space exploration experiments

TrAC - Trends in Analytical Chemistry, 2020
Yuanyuan He, Arnaud Buch, Cyril Szopa
exaly

Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

Journal of Hazardous Materials, 2021
Inae Lee, Kyungho Choi, Kyung-Duk Zoh
exaly

Treatment technologies and mechanisms for tetramethylammonium hydroxide (TMAH) wastewater from micro-electronic industry: A review

Resources, Conservation and Recycling, 2023
exaly

Removal of tetramethylammonium hydroxide (TMAH) from thin-film transistor liquid crystal display (TFT-LCD) industry wastewater by hydrolysis acidification-aerobic and anaerobic processes

Journal of Cleaner Production, 2021
Juan Lv, Changyuan Ou
exaly

Degradation of tetramethylammonium hydroxide (TMAH) during UV-LED/H2O2 reaction: Degassing effect, radical contribution, and degradation mechanism

Journal of Hazardous Materials, 2022
Changha Lee, Kyung-Duk Zoh
exaly