Results 181 to 190 of about 4,153 (244)

A review of the existing and emerging technologies for wastewaters containing tetramethyl ammonium hydroxide (TMAH) and waste management systems in micro-chip microelectronic industries.

Chemosphere, 2022
The present work aims to describe and review the available technologies and the recent advancements in treating industrial wastewater containing tetramethylammonium hydroxide (TMAH).
V. Innocenzi, S. Zueva, N. Ippolito, F. Ferella, M. Prisciandaro, F. Vegliò   +5 more
semanticscholar   +1 more source

Structural characterization using 2D NMR spectroscopy and TMAH-GC × GC-MS: Application to humic acids from soils of an integrated agricultural system and an Atlantic native forest.

Science of the Total Environment, 2021
Understanding the chemical make-up of soils and their structure is critical for constraining the role of soil organic matter (SOM) into the global biogeochemical cycles, as well as to understand the capability of SOM to sequester carbon and mitigate ...
A. Tadini, Aleksandar I. Goranov, L. Martin-Neto, Alberto C. C. Bernardi, Patricia P A Oliveira, J. Pezzopane, P. Hatcher   +6 more
semanticscholar   +1 more source

Boron Etch-stop In TMAH Solutions

Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95, 1996
Abstract Etch rates of 〈100〉 single-crystal silicon in tetramethyl ammonium hydroxide (TMAH) solutions have been measured as a function of boron doping concentration with the purpose of studying the feasibility of an etch-stop. The boron concentration has been varied up to 2.5 × 1020 cm−3.
Elin Steinsland, Martin Nese, Anders Hanneborg, Ralph W. Bernstein, Halle Sandmo, Gjermund Kittilsland   +5 more
openaire   +1 more source

Advanced Monitoring of TMAH Solution

Solid State Phenomena, 2014
Tetramethyl ammonium hydroxide (TMAH) has wide applications in semiconductor industry, including photoresist development, silica etching (especially Sigma etching), and wafer cleaning, etc. One of the critical areas of the photolithography process is the development of unexposed (negative) or exposed (positive) photoresists without pattern distortion ...
Jing Jing Wang, Eugene Shalyt, Chuan Nan Bai, Guang Liang, Michael MacEwan, Vishal Parekh   +5 more
openaire   +1 more source

Highly reproducible c-Si texturing by metal-free TMAH etchant and monoTEX agent

, 2021
Surface texturing of a silicon solar cell is critical to provide surface antireflection and light trapping. The common texturing method based on KOH as an etchant with isopropyl alcohol (IPA) as a wetting agent suffers two disadvantages: introducing ...
Wensheng Liang, T. Kho, Jingnan Tong, P. Narangari, S. Armand, M. Ernst, D. Walter, S. Surve, M. Stocks, A. Blakers, K. Fong   +10 more
semanticscholar   +1 more source

Aerobic degradation of high tetramethylammonium hydroxide (TMAH) and its impacts on nitrification and microbial community.

Chemosphere, 2020
Tetramethylammonium hydroxide (TMAH) was often used as developer in the high-tech industries. Information regarding biological treatment of high TMAH-containing wastewater is limited.
Yi-Ju Wu, Laurensia Irmayani, Aussie Amalia Setiyawan, L. Whang   +3 more
semanticscholar   +1 more source

Anisotropic etching of silicon in TMAH solutions

Sensors and Actuators A: Physical, 1992
Abstract Detailed characteristics of tetramethyl ammonium hydroxide (TMAH, (CH3)4NOH) as silicon anisotropic etching solutions with various concentrations from 5 to 40 wt.% and temperatures from 60 to 90 °C have been studied. The etch rates of (100) and (110) crystal planes decrease with increasing concentration.
Osamu Tabata, Ryouji Asahi, Hirofumi Funabashi, Keiichi Shimaoka, Susumu Sugiyama   +4 more
openaire   +1 more source

Cannizzaro reaction of aldehydes in TMAH thermochemolysis

Journal of Analytical and Applied Pyrolysis, 1997
Abstract Recently, tetramethylammonium hydroxide (TMAH) has been advantageously used in the analytical pyrolysis of polymers, but yielded a great amount of carboxylic acid methyl esters which were absent in conventional pyrolysis. Our experiments with model compounds such as furaldehyde, benzaldehyde, hydroxy-, methoxy-, dimethoxybenzaldehyde and ...
I. Tanczos, M. Schöflinger, H. Schmidt, J. Balla   +3 more
openaire   +1 more source

Deep eutectic solvent (TMAH·5H2O/Urea) with low viscosity for cellulose dissolution at room temperature.

Carbohydrate Polymers
A deep eutectic solvent (DES) formulated with tetramethylammonium hydroxide pentahydrate /urea (TMAH·5H2O/Urea) was designed for the first time to dissolve cellulose at room temperature.
Li Li, Maozhi Zhang, Yun Feng, Xun Zhang, Feng Xu   +4 more
semanticscholar   +1 more source

Removal of tetramethylammonium hydroxide (TMAH) by cold plasma treatment combined with periodate oxidation: Degradation, kinetics, and toxicity study.

Chemosphere
Tetramethylammonium hydroxide (TMAH), which is a chemical used in the electronic industry, is classified as a hazardous material (HAZMAT class 8) that threatens aquatic ecosystems and human health.
Hee-Jun Kim, Hyeok Kim, Uje Lee, Hyun-Suk Oh, Hyun-Woo Kim, Jaewoo Lee   +5 more
semanticscholar   +1 more source