Results 161 to 170 of about 4,153 (244)

Effect of cations on silicon anisotropic etching process in solutions containing TMAH and TMAH with tensioactive compounds

Sensors and Actuators A: Physical, 2020
Abstract Almost everything has been written on silicon anisotropic etching in alkaline solutions, however, the difference between etching in pure KOH and TMAH as well as in these solutions containing tensioactive compounds has not been completely elucidated yet.
Irena Zubel
exaly   +3 more sources

The search for organic compounds with TMAH thermochemolysis: From Earth analyses to space exploration experiments

TrAC - Trends in Analytical Chemistry, 2020
International audienceTetramethylammonium hydroxide (TMAH) is one of the most popular methylation reagents that have been increasingly used for the detection of organic compounds within a wide range of samples, such as soil, coal, lacquer, lignin ...
Yuanyuan He, A Buch, Cyril Szopa
exaly   +3 more sources

Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

Journal of Hazardous Materials, 2021
In this study, we used a nano-ozone bubble to enhance the efficiency of the ozone/H(2)O(2 )process for the degradation of tetramethylammonium hydroxide (TMAH) found in semiconductor wastewater at high levels. The nano-ozone bubble significantly increased
Tae-Kyoung Kim, Inae Lee, Kyungho Choi   +2 more
exaly   +3 more sources

Microstructures etched in doped TMAH solutions

Microelectronic Engineering, 2000
Tetra-methyl ammonium hydroxide, or TMAH, is an anisotropic silicon etchant that is gaining more and more attention in the fabrication process of mechanical microstructures and device isolation, as an alternative to the more usual KOH and EDP etchants [1]: because of its high compatibility with conventional IC processes, due to the absence of metal ...
S. Brida, M. Paranjape, G. Pignatel, Faes, Alessandro, Guarnieri, Vittorio, Giacomozzi, Flavio, Margesin, Benno, Zen, Mario   +7 more
openaire   +3 more sources

Etch characteristics of KOH, TMAH and dual doped TMAH for bulk micromachining of silicon

Microelectronics Journal, 2006
Abstract High precision bulk micromachining of silicon is a key process step to shape spatial structures for fabricating different type of microsensors and microactuators. A series of etching experiments have been carried out using KOH, TMAH and dual doped TMAH at different etchant concentrations and temperatures wherein silicon, silicon dioxide and ...
Kanishka Biswas, S. Kal
exaly   +2 more sources

Degradation of tetramethylammonium hydroxide (TMAH) during UV-LED/H2O2 reaction: Degassing effect, radical contribution, and degradation mechanism

Journal of Hazardous Materials, 2022
© 2022 Elsevier B.V.Semiconductor wastewater usually has a low level of dissolved oxygen and alcohol because ultra-pure water used in the process undergoes rigorous degassing and wafer development, respectively.
Tae-Kyoung Kim, Changha Lee, Yu Sik Hwang   +2 more
exaly   +3 more sources

Experiments on anisotropic etching of Si in TMAH

Solar Energy Materials and Solar Cells, 2001
Abstract Recently, TMAH has been widely studied due to its MOS compatibility, nontoxic, and good anisotropic etching characteristics. In this work, TMAH etching of Si was carried out at different temperatures (70°C, 80°C and 90°C) and concentrations (5, 15 and 25 wt%). From a patterned Si wafer, inverted pyramids with smooth surface and sharp pyramid
James Jungho Pak
exaly   +2 more sources

pH-controlled TMAH etchants for silicon micromachining

Sensors and Actuators A: Physical, 1996
The etching characteristics of pH-controlled tetramethyl ammonium hydroxide (TMAH) by dissolving Si or acid have been studied. TMAH with 10 and 22 wt.% at 80/spl deg/C were used as etchants, (NH/sub 4/)/sub 2/,CO/sub 3/ and (NH/sub 4/)HPO/sub 4/ were used as acid.
Osamu Tabata
exaly   +2 more sources