Results 161 to 170 of about 8,891 (213)

Differences in anisotropic etching properties of KOH and TMAH solutions

Sensors and Actuators A: Physical, 2000
We compared the anisotropic etching properties of KOH and TMAH solutions. We used hemispherical specimens of single-crystal silicon whose surface exhibited every crystallographic orientation, in order to evaluate the etching properties as a function of the orientation.
Mitsuhiro Shikida
exaly   +2 more sources

Boron Etch-stop In TMAH Solutions

Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95, 1996
Abstract Etch rates of 〈100〉 single-crystal silicon in tetramethyl ammonium hydroxide (TMAH) solutions have been measured as a function of boron doping concentration with the purpose of studying the feasibility of an etch-stop. The boron concentration has been varied up to 2.5 × 1020 cm−3.
Elin Steinsland, Martin Nese, Anders Hanneborg, Ralph W. Bernstein, Halle Sandmo, Gjermund Kittilsland   +5 more
openaire   +1 more source

Advanced Monitoring of TMAH Solution

Solid State Phenomena, 2014
Tetramethyl ammonium hydroxide (TMAH) has wide applications in semiconductor industry, including photoresist development, silica etching (especially Sigma etching), and wafer cleaning, etc. One of the critical areas of the photolithography process is the development of unexposed (negative) or exposed (positive) photoresists without pattern distortion ...
Jing Jing Wang, Eugene Shalyt, Chuan Nan Bai, Guang Liang, Michael MacEwan, Vishal Parekh   +5 more
openaire   +1 more source

Optimization of TMAH etching for MEMS

SPIE Proceedings, 1999
Tetra-methyl ammonium hydroxide (TMAH) is an anisotropic silicon etchant that is gaining considerable use in silicon sensor micromachining due to its excellent compatibility with CMOS processing, selectivity, anisotropy and relatively low toxicity, as compared to the more used KOH and EDP etchants.
S. BRIDA, L. FERRARIO, V. GUARNIERI, F. GIACOMOZZI, B. MARGESIN, M. PARANJAPE, VERZELLESI, Giovanni, M. ZEN   +7 more
openaire   +2 more sources

Contributions of TMAH Surfactant on Hierarchical Structures of PVA/Fe3O4–TMAH Ferrogels by Using SAXS Instrument

Journal of Inorganic and Organometallic Polymers and Materials, 2018
The magnetic hydrogels combining polyvinyl-alcohol (PVA) and Fe3O4 (magnetite)–TMAH (tetra-methyl ammonium hydroxide) have been successfully fabricated via a Freezing-thawing route. The magnetite nanoparticles were prepared from iron sands by using coprecipitation method.
null Sunaryono, Ahmad Taufiq, Nandang Mufti, Hendra Susanto, Edy Giri Rahman Putra, Siriwat Soontaranon, null Darminto   +6 more
openaire   +1 more source

Anisotropic etching of silicon in TMAH solutions

Sensors and Actuators A: Physical, 1992
Abstract Detailed characteristics of tetramethyl ammonium hydroxide (TMAH, (CH3)4NOH) as silicon anisotropic etching solutions with various concentrations from 5 to 40 wt.% and temperatures from 60 to 90 °C have been studied. The etch rates of (100) and (110) crystal planes decrease with increasing concentration.
Osamu Tabata, Ryouji Asahi, Hirofumi Funabashi, Keiichi Shimaoka, Susumu Sugiyama   +4 more
openaire   +1 more source

Cannizzaro reaction of aldehydes in TMAH thermochemolysis

Journal of Analytical and Applied Pyrolysis, 1997
Abstract Recently, tetramethylammonium hydroxide (TMAH) has been advantageously used in the analytical pyrolysis of polymers, but yielded a great amount of carboxylic acid methyl esters which were absent in conventional pyrolysis. Our experiments with model compounds such as furaldehyde, benzaldehyde, hydroxy-, methoxy-, dimethoxybenzaldehyde and ...
I. Tanczos, M. Schöflinger, H. Schmidt, J. Balla   +3 more
openaire   +1 more source

Microstructures etched in doped TMAH solutions

Microelectronic Engineering, 2000
Tetra-methyl ammonium hydroxide, or TMAH, is an anisotropic silicon etchant that is gaining more and more attention in the fabrication process of mechanical microstructures and device isolation, as an alternative to the more usual KOH and EDP etchants [1]: because of its high compatibility with conventional IC processes, due to the absence of metal ...
S. Brida, M. Paranjape, G. Pignatel, Faes, Alessandro, Guarnieri, Vittorio, Giacomozzi, Flavio, Margesin, Benno, Zen, Mario   +7 more
openaire   +2 more sources

Silicon anisotropic etching of TMAH solution

ISIE 2001. 2001 IEEE International Symposium on Industrial Electronics Proceedings (Cat. No.01TH8570), 2002
Detailed characteristics of tetramathyl ammonium hydroxide (TMAH, (CH/sub 3/)/sub 4/ NOH) as a silicon anisotropic etching solution with various concentrations from 5 to 40 wt% and temperatures between 60 to 90/spl deg/C have been studied. The etching of (100) crystal decreases with increasing concentration and decreasing temperature.
W. Sonphao, S. Chaisirikul
openaire   +1 more source

Reaction Kinetics of Poly-Si Etching in TMAH Solution

Solid State Phenomena, 2021
Tetramethylammonium hydroxide (TMAH) is a metal-free strong alkaline solution which can etch poly-Si. The concentration of dissolved gas as well as the concentration of TMAH affects etching rate of poly-Si. The detailed kinetics of poly-Si etching in TMAH solution is investigated in this study.
Tae Gun Park, Sang Woo Lim
openaire   +1 more source