Results 171 to 180 of about 4,153 (244)

TMAH etching of silicon and the interaction of etching parameters

Sensors and Actuators A: Physical, 1997
Abstract A study of tetramethylammonium hydroxide (TMAH) etching of silicon and the interaction of etching parameters has been carried out. We find that the silicon etch rate increases as the TMAH concentration increases and it reaches a maximum at 4 wt.%. The etch rate of n-type silicon is found to be slightly higher than that of p-type silicon.
J T L Thong, W K Choi
exaly   +2 more sources

Reaction Kinetics of Poly-Si Etching in TMAH Solution

Solid State Phenomena, 2021
Tetramethylammonium hydroxide (TMAH) is a metal-free strong alkaline solution which can etch poly-Si. The concentration of dissolved gas as well as the concentration of TMAH affects etching rate of poly-Si. The detailed kinetics of poly-Si etching in TMAH solution is investigated in this study.
Tae Gun Park, Sang Woo Lim
openaire   +2 more sources

Contributions of TMAH Surfactant on Hierarchical Structures of PVA/Fe3O4–TMAH Ferrogels by Using SAXS Instrument

Journal of Inorganic and Organometallic Polymers and Materials, 2018
The magnetic hydrogels combining polyvinyl-alcohol (PVA) and Fe3O4 (magnetite)–TMAH (tetra-methyl ammonium hydroxide) have been successfully fabricated via a Freezing-thawing route. The magnetite nanoparticles were prepared from iron sands by using coprecipitation method.
null Sunaryono, Ahmad Taufiq, Nandang Mufti, Hendra Susanto, Edy Giri Rahman Putra, Siriwat Soontaranon, null Darminto   +6 more
openaire   +2 more sources

Silicon Etching Characteristics in Modified TMAH Solution

, 2019
In the present work, we have studied the etching characteristics of Si{100} and Si{110} in modified low concentration TMAH solution by adding different concentrations of NH2OH. The etch rate of silicon and thermal oxide, and etched surface morphology, which are important parameters to be known in the fabrication of MEMS structures using silicon wet ...
Veerla Swarnalatha, Avvaru Venkata Narasimha Rao, Prem Pal   +2 more
openaire   +2 more sources

Optimization of TMAH etching for MEMS

SPIE Proceedings, 1999
Tetra-methyl ammonium hydroxide (TMAH) is an anisotropic silicon etchant that is gaining considerable use in silicon sensor micromachining due to its excellent compatibility with CMOS processing, selectivity, anisotropy and relatively low toxicity, as compared to the more used KOH and EDP etchants.
S. BRIDA, L. FERRARIO, V. GUARNIERI, F. GIACOMOZZI, B. MARGESIN, M. PARANJAPE, VERZELLESI, Giovanni, M. ZEN   +7 more
openaire   +3 more sources

Influence of TMAH and NaOH on the stability of SiC aqueous suspensions

Ceramics International, 2020
Abstract The study aimed at evaluation of the rheological properties of aqueous suspensions of SiC stabilized with either TMAH (tetramethyloammonium hydroxide) or NaOH in the amount of a given dispersant in the range of 0–1.0 wt% as calculated on the dry mass of SiC powder.
Joanna Gnyla, Agnieszka Gubernat, Łukasz Zych, Marek Nocuń, Zuzanna Góral, Radosław Lach   +5 more
openaire   +2 more sources

Differences in anisotropic etching properties of KOH and TMAH solutions

Sensors and Actuators A: Physical, 2000
We compared the anisotropic etching properties of KOH and TMAH solutions. We used hemispherical specimens of single-crystal silicon whose surface exhibited every crystallographic orientation, in order to evaluate the etching properties as a function of the orientation.
Mitsuhiro Shikida
exaly   +2 more sources

Treatment technologies and mechanisms for tetramethylammonium hydroxide (TMAH) wastewater from micro-electronic industry: A review

Resources, Conservation and Recycling, 2023
Yin-Hu Wu, Hong-Ying Hu
exaly   +2 more sources

Biodegradation of tetramethylammonium hydroxide (TMAH) in completely autotrophic nitrogen removal over nitrite (CANON) process

Bioresource Technology, 2016
[[abstract]]This study conducted a completely autotrophic nitrogen removal over nitrite (CANON) process in a continuous anoxic upflow bioreactor to treat synthetic wastewater with TMAH (tetramethylammonium hydroxide) ranging from 200 to 1000mg/L.
Jih-Gaw Lin
exaly   +2 more sources

Removal of tetramethylammonium hydroxide (TMAH) from thin-film transistor liquid crystal display (TFT-LCD) industry wastewater by hydrolysis acidification-aerobic and anaerobic processes

Journal of Cleaner Production, 2021
Tetramethylammonium Hydroxide (TMAH) is widely used as a developer in the thin-film transistor liquid crystal display (TFT-LCD) industry, which is a corrosive alkaline and neuronal toxic compound.
Juan Lv, Changyuan Ou
exaly   +2 more sources