Strain and atomic stacking of bismuth thin film in its quasi-van der Waals epitaxy on (111) Si substrate. [PDF]
Wu CH, Chou C, Lin HH.
europepmc +1 more source
Molecular-beam epitaxy of monolayer MoSe2: growth characteristics and domain boundary formation
Monolayer (ML) transition metal dichalcogenides (TMDs) are of great research interest due to their potential use in ultrathin electronic and optoelectronic applications. They show promise in new concept devices in spintronics and valleytronics.
L Jiao +10 more
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Tungsten Oxide Mediated Quasi-van der Waals Epitaxy of WS2 on Sapphire. [PDF]
Cohen A +11 more
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Substrate pre-sputtering for layer-by-layer van der Waals epitaxy of 2D materials
Two-dimensional transition metal chalcogenides, with their atomically layered structure, favorable electronic and mechanical properties, and often strong spin–orbit coupling, are ideal systems for fundamental studies and for applications ranging from ...
A. Rajan +7 more
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Growth, structure, and morphology of van der Waals epitaxy Cr1+δTe2 films. [PDF]
Wang X, Zhou H, Bai L, Wang HQ.
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Facilitating Uniform Large-Scale MoS2, WS2 Monolayers, and Their Heterostructures through van der Waals Epitaxy. [PDF]
Huang CC +12 more
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Structural properties of Bi thin film grown on Si (111) by quasi-van der Waals epitaxy. [PDF]
Chou C, Wu BX, Lin HH.
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A new approach for the growth of vertical 2D van‐der‐Waals heterostructures is reported: Using metal‐organic molecular beam epitaxy (MOMBE), aspects of chemical and physical vapor deposition are combined to grow ultrathin films of WX2 (X = Se, S) on ...
Adrian Schütze +3 more
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Van der Waals epitaxy of nearly single-crystalline nitride films on amorphous graphene-glass wafer. [PDF]
Ren F +21 more
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Direct Growth of Wafer‐Scale Self‐Separated GaN on Reusable 2D Material Substrates
Free‐standing gallium nitride has been prepared using various methods; however, the removal of the original substrate is still challenging with low success rates.
Chang‐Hsun Huang +2 more
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