Results 141 to 150 of about 4,818,117 (298)

A Universal van der Waals Tunneling Injector for Monolayer CMOS

Advanced Materials, EarlyView.
A universal van der Waals injector unlocks polarity‐flexible tunneling contacts for monolayer CMOS. SnSe2, an intrinsically degenerate 2D semiconductor, establishes polarity‐specific band alignments with both WSe2 and MoS2 channels, enabling steep switching, high on/off ratios, and a unified route to low‐power 2D logic.
Hanbin Cho, Jing Huang, Seonguk Yang, Subin Im, Sangwoo Park, Jeongin Yeo, Sungyeon Kim, Gilhwan Do, Wenxuan Zhu, Soobeom Shin, Jongwon Lee, Yongjoon Shin, Do‐Sun Lee, Hu Young Jeong, Tae‐Eon Park, Jun Kang, Kyungmin Ko, Joonki Suh   +17 more
wiley   +1 more source

Metal electrode influence on the wet selective etching of GaAs/AlGaAs [PDF]

, 2011
Metal electrodes were found to influence the wet selective etching of GaAs in a citric acid/hydrogen peroxide solution. The authors found that metal films such as a Cr/Au or Ti/Au alloy deposited on a semiconductor surface can mostly prevent the etching ...
Yang XH, Han Q, Wang XP, Wang, J (reprint author), Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China, hanqin@semi.ac.cn, Ni HQ, He JF, Wang J   +6 more
core  

Wet‐Chemical Etching of Silicon Wafer Surfaces Using Aqueous HF‐HBrO3 and HF‐HBrO3‐Br2 Solutions

Advanced Materials Interfaces
Solutions containing hydrofluoric acid (HF) and bromic acid (HBrO3) are investigated as nitrogen oxide (NOx)‐free mixtures for wet‐chemical etching of (100) silicon wafer surfaces. Isotropic etching behavior with high dissolution rates of up to 10 µm min−
Nils Schubert, Niklas Zomack, Ann‐Lucia Neumann, André Stapf, Dominic Walter, Andreas Lißner, Andreas Siegfried Braeuer, Edwin Kroke   +7 more
doaj   +1 more source

Review of Inorganic Separator Engineering for Next‐Generation Lithium–Sulfur Batteries: Compromise or Cornerstone?

Advanced Materials, EarlyView.
Inorganic compound‐modified separators transform lithium–sulfur batteries from passive polysulfide confinement to active reaction‐pathway regulation. A Practical Relevance Index (PRI)‐guided framework bridges interfacial chemistry of inorganic separators with practical constraints, establishing unified design principles for scalable, high‐energy ...
Yuting Qin, Tianyi Wang, Xingyu Wang, Kaifu Xu, Yuzhou Wang, Chengyin Wang, Bing Sun, Guoxiu Wang   +7 more
wiley   +1 more source

DELINEATION OF DEFECTS IN SIMOX STRUCTURES USING A CHEMICAL ETCHING TECHNIQUE [PDF]

, 1992
Residual defects in the overlayer of fully annealed SIMOX material have been studied by means of a chemical etching technique. The etching procedure has been calibrated and an optimum recipe is reported.
NEJIM A, GILES LF UNIV SURREYDEPT ELECTR & ELECT ENGNGUILDFORD GU2 5XHSURREYENGLAND, FAN TW, HEMMENT PLF, GILES LF   +4 more
core  

Post-Synthetic Anisotropic Wet-Chemical Etching of Colloidal Sodalite ZIF Crystals. [PDF]

Angew Chem Int Ed Engl, 2015
Avci C, Ariñez-Soriano J, Carné-Sánchez A, Guillerm V, Carbonell C, Imaz I, Maspoch D.   +6 more
europepmc   +1 more source

Sub‐Nanometer Cobalt on Tungsten Titanium Carbide MXene (W2TiC2Tx): An Electrocatalyst for Highly Efficient and Stable Alkaline Hydrogen Evolution at Industrial‐Scale Current Density

Advanced Materials, EarlyView.
A novel W2TiC2Tx MXene prepared through a MAX‐phase route supports sub‐nanometer Co for highly efficient alkaline hydrogen evolution. Strong Co–W interfacial interactions optimize hydrogen adsorption and catalytic activity, enabling low overpotentials of 63 mV at 10 mA cm−2, small Tafel slope of 44.3 mV dec−1, and exceptional durability at industrially
Xiaopeng Liu, Fan Yang, Deep M. Patel, Mohammad Albloushi, Qiqi Mao, Shan Jiang, Christian J. Breckner, Connor W. Schroeder, Ruoyu Cui, Tao Ma, Dapeng Jing, Wenyu Huang, Jeffrey T. Miller, Wenzhen Li, Luke T. Roling, Yue Wu   +15 more
wiley   +1 more source

A level-set method for convective–diffusive particle deposition [PDF]

, 2013
Vargas, F.M., Chai, John, Yap, Y.F.
core   +1 more source

Role of free hydrochloric acid in the low-cost regeneration of ferric chloride etchant by oxygen gas [PDF]

, 2005
This thesis concerns the development of a low cost and environment- friendly method for the regeneration of the most widely used aqueous etchant, ferric chloride, found in photochemical machining (PCM) facilities.
Jefferies, P. J.
core  

Automated unit of the chemical wet etching

IOP Conference Series: Materials Science and Engineering, 2019
Yu V Sukhoroslova, D S Veselov, Yu A Voronov   +2 more
openaire   +1 more source