Results 211 to 220 of about 16,351 (259)

Wet Chemical and Plasma Etching

, 2016
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An Investigation into the Footing Profile Suppression in (110) Si Anisotropic Etching. [PDF]

Micromachines (Basel)
Wang Z, Xie G, Xu G, Li G, Zhou W, Fu D, Kong L, Chen Z, Liu S.   +8 more
europepmc   +1 more source

Selective laser-induced etching process-enabled double-cavity glass MEMS hydrogen sensor at room-temperature sensitivity. [PDF]

Microsyst Nanoeng
Park JY, Jang B, Kim JY, Myung NV, Choa YH.   +4 more
europepmc   +1 more source

A review of glass thermal reflow: method, device, and applications. [PDF]

Microsyst Nanoeng
Zhu M, Shi P, Zhang G, Yan C, Chen F, Liu S, Lian R, Zhu K, Dai H, Wu H, Liu Y, Li B, Du X, Xue G.   +13 more
europepmc   +1 more source

A review of commercial and laboratory-based microfluidic devices based on glass and/or silicon substrates. [PDF]

RSC Adv
Deb A, Nagesh G, Harrison T, Spicer D, Ting DS, Ahamed MJ.   +5 more
europepmc   +1 more source

Study on the mechanical characteristics of the stress relaxation in the carbonate rock after high-temperature acidification. [PDF]

Sci Rep
Yang J, Han S, Li L, Peng J, Liu J, Liu J, Han Z.   +6 more
europepmc   +1 more source

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Wet etching of glass

CAS 2005 Proceedings. 2005 International Semiconductor Conference, 2005., 2005
The purpose of this paper is to find ways to Improve the wet etching techniques used for glass etching. Essential elements of glass wet etching process such as: influence of glass composition, etching rate, influence of the residual stress in the masking layer, characterization of the main masking materials, the quality of surface generated using wet ...
C. Iliescu, F.E.H. Tay
openaire   +1 more source

Acoustophoresis in Wet-Etched Glass Chips

Analytical Chemistry, 2008
Acoustophoresis in microfluidic structures has primarily been reported in silicon microfabricated devices. This paper demonstrates, for the first time, acoustophoresis performed in isotropically etched glass chips providing a performance that matches that of the corresponding silicon microdevices.
Mikael, Evander, Andreas, Lenshof, Thomas, Laurell, Johan, Nilsson   +3 more
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Wet Etching Methods for Perovskite Substrates

MRS Proceedings, 1999
AbstractIn oxide electronics substrates with atomically flat terraces are a request for growing high-quality epitaxial thin films. In this paper results on chemical etching of some substrates with perovskite, ABO3, structure (e.g., SrTiO3, LSAT - the (LaAlO3)0.3(Sr2AlTaO6)0.35 solid solution, and NdGaO3) are presented.
Leca, V., Rijnders, Augustinus J.H.M., Koster, Gertjan, Blank, David H.A., Rogalla, Horst   +4 more
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On the wet etching of Pyrex glass

Sensors and Actuators A: Physical, 2008
Abstract This paper addresses a commonly raised question regarding wet etching of Pyrex glass: “How are the defects on the glass generated during etching process while most of the masking materials are chemically inert in the etching solution?” The response to this question relies in controlling the residual stress in the masking layer (its value ...
Ciprian Iliescu, Bangtao Chen, Jianmin Miao   +2 more
openaire   +1 more source