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Etching characteristics and profile simulation of silicon. [PDF]
PLoS OneZhang H, Cai P.
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Monolayer MoS2 With Ultrahigh Piezoelectricity: From ALD Dose Control to Device Performance
Advanced Science, EarlyView.This study demonstrates that controlling precursor dosages in atomic layer deposition (ALD) serves to regulate ultrathin oxide quality, which in turn determines sulfurization behavior and MoS2 monolayer continuity. The resulting continuous, low‐defect monolayers enable improved piezoelectric performance and support a flexible slippage sensor, linking ...
Yun Li +16 more
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Hybrid Laser-Etching Fabrication of High-Density Antireflective Microstructures on DLC-Coated Silicon Using Burst-Mode Bessel Beam Processing. [PDF]
Nanomaterials (Basel)Sedao X +15 more
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Platinum-nanostructured silicon microneedles with scalable fabrication for EEG biosensing. [PDF]
Microsyst NanoengAmir M +9 more
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On the wet etching of Pyrex glass
Sensors and Actuators A: Physical, 2008Abstract This paper addresses a commonly raised question regarding wet etching of Pyrex glass: “How are the defects on the glass generated during etching process while most of the masking materials are chemically inert in the etching solution?” The response to this question relies in controlling the residual stress in the masking layer (its value ...
Ciprian Iliescu +2 more
exaly +2 more sources
Wet Etching of Silicon in Planar Nanochannels
LangmuirSilicon (Si) alkaline etching constitutes a fundamental process in the semiconductor industry. Although its etching kinetics on plain substrates have been thoroughly investigated, the kinetics of Si wet etching in nanoconfinements have yet to be fully explored despite its practical importance in three-dimensional (3-D) semiconductor manufacturing ...
Yiding Zhong +5 more
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CAS 2005 Proceedings. 2005 International Semiconductor Conference, 2005., 2005
The purpose of this paper is to find ways to Improve the wet etching techniques used for glass etching. Essential elements of glass wet etching process such as: influence of glass composition, etching rate, influence of the residual stress in the masking layer, characterization of the main masking materials, the quality of surface generated using wet ...
C. Iliescu, F.E.H. Tay
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The purpose of this paper is to find ways to Improve the wet etching techniques used for glass etching. Essential elements of glass wet etching process such as: influence of glass composition, etching rate, influence of the residual stress in the masking layer, characterization of the main masking materials, the quality of surface generated using wet ...
C. Iliescu, F.E.H. Tay
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Wet Etching Methods for Perovskite Substrates
MRS Proceedings, 1999AbstractIn oxide electronics substrates with atomically flat terraces are a request for growing high-quality epitaxial thin films. In this paper results on chemical etching of some substrates with perovskite, ABO3, structure (e.g., SrTiO3, LSAT - the (LaAlO3)0.3(Sr2AlTaO6)0.35 solid solution, and NdGaO3) are presented.
Leca, V. +4 more
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Acoustophoresis in Wet-Etched Glass Chips
Analytical Chemistry, 2008Acoustophoresis in microfluidic structures has primarily been reported in silicon microfabricated devices. This paper demonstrates, for the first time, acoustophoresis performed in isotropically etched glass chips providing a performance that matches that of the corresponding silicon microdevices.
Mikael, Evander +3 more
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