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Anisotropic Wet Etching for Micro-Fabrication
IEEJ Transactions on Sensors and Micromachines, 2008Anisotropic wet etching process is now widely used in MEMS fabrication. The etching characteristics, mechanism of etch-pit formations on both of {100} and {111} Si surfaces, and micro pyramid formation on the etched {100} surface is described in this review paper.
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2002
In this chapter we will discuss wet and dry patterning techniques for SiC and the relative merits of these methods. We describe the basic principles involved in etching SiC and problems that can arise because of the binary nature of the lattice and its relatively high bond strength.
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In this chapter we will discuss wet and dry patterning techniques for SiC and the relative merits of these methods. We describe the basic principles involved in etching SiC and problems that can arise because of the binary nature of the lattice and its relatively high bond strength.
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Toward Controllable Wet Etching of Monocrystalline Silicon: Roles of Mechanically Driven Defects
ACS Applied Materials & Interfaces, 2022Licong Cui, He Wang, Bingjun Yu
exaly
MEMS Wet-Etch Processes and Procedures
2011Wet chemical etching through openings in photoresist or hard masks underlies many process sequences for MEMS device fabrication. This chapter presents more than 800 wet-etch recipes for over 400 varieties and combinations of substrates and deposited thin films, with emphasis on processes that use laboratory chemicals often found in university and ...
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Piezoelectric aluminum nitride thin-films: A review of wet and dry etching techniques
Microelectronic Engineering, 2022Rui M R Pinto, Ved Gund, Carlos Calaza
exaly