Results 61 to 70 of about 5,029 (153)
The M2 Phase of Free‐Standing Ga‐Doped VO2 Single Crystals Over Wide Temperature Ranges
Upon heating, the free‐standing crystal Ga 0.04V0.96O2(6) transits abruptly from the T‐phase to the M2‐phase at 295.5 K and from the M2‐phase to the R‐phase at 358 K with no coexisting phases. Resistive switching related to these first‐order transitions is exhibited by low current R(T), DC, and pulsed I–V plots under fixed ambient temperature ...
Larisa Patlagan +4 more
wiley +1 more source
Unraveling the atomic mechanism of the disorder–order phase transition from γ-Ga2O3 to β-Ga2O3
In this paper, we employ in situ transmission electron microscopy to study the disorder–order phase transition from amorphous Ga2O3 to γ-Ga2O3 and then to β-Ga2O3.
Charlotte Wouters +7 more
doaj +1 more source
High-speed, high-resolution, three-dimensional imaging of threading dislocations in β-Ga2O3 via phase-contrast microscopy [PDF]
This study presents a nondestructive and laboratory-accessible approach for high-speed, high-resolution three-dimensional characterization of threading dislocations in β-Ga2O3 (010) single crystals using phase-contrast microscopy (PCM).
Yukari Ishikawa +4 more
doaj +1 more source
A dynamic catalyst–H2O heterojunction (CWH) forms on ACG during OER, with periodic bubble evolution modulating band bending and interfacial charge transfer. Electron–radical coupling drives the generation of •OH/•O2− species, converting Ga2O3 into GaOOH, whereas surface CO32− from C doping stabilizes the interface, suppressing catalyst dissolution and ...
Ruijie Dai +6 more
wiley +1 more source
Low pressure chemical vapor deposition of β-Ga2O3 thin films: Dependence on growth parameters
Low pressure chemical vapor deposition (LPCVD) has been used to produce high quality β-Ga2O3 materials with controllable n-type doping. In this work, we focus on the studies of key LPCVD growth parameters for β-Ga2O3 thin films, including oxygen/carrier ...
Zixuan Feng +2 more
doaj +1 more source
Impact of Nickel Diffusion on Leakage Current Degradation in β‐Ga2O3 Schottky Barrier Diodes
The diffusion of Ni atoms during Schottky electrode fabrication induces localized stress defects in β‐Ga₂O₃ substrates, which act as primary reverse leakage pathways in SBDs. Elucidating this mechanism provides critical guidance for optimizing electrode composition in high‐performance β‐Ga₂O₃ electronics.
Ziyi Wang +9 more
wiley +1 more source
Advances in Gate Dielectrics for 2D Electronics
This review discusses advanced gate dielectric integration for 2D electronic devices, including layered and nonlayered dielectric materials, while highlighting strategies such as seed‐assisted ALD, transfer methods, and in situ oxidation. By focusing on interface engineering and materials innovation, new routes for scalable, high‐performance 2D ...
Moon‐Chul Jung +2 more
wiley +1 more source
In this paper, a β‐Ga2O3 enhancement‐mode metal‐oxide‐semiconductor heterojunction field‐effect transistor (MOS‐HJFET) is demonstrated using a counter‐doped β‐Ga2O3 channel, achieved by the diffusion of p‐type nickel oxide (p‐NiO).
Taeeun Lee +5 more
doaj +1 more source
This work presents a NiPS3/GaN photodetector with a broadband response from ultraviolet to visible light. Its performance, enabled by dynamically tuning the competition between photothermoelectric, photovoltaic, and photoconductive effects, facilitates applications in imaging, optoelectronic synapses, and reconfigurable logic gates.
Bingjie Ye +7 more
wiley +1 more source
This study integrates a p-type copper gallium oxide (p-CuGaO2) interlayer to enhance the performance of β-Ga2O3-based power devices, addressing challenges in achieving reliable p-type doping.
Chowdam Venkata Prasad +10 more
doaj +1 more source

