Results 91 to 100 of about 575,100 (391)
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2011 Atomic layer deposition (ALD) is a technique capable of producing ultrathin conformal films with atomic level control over thickness. A major drawback of ALD is its low deposition rate, making ALD less attractive for applications that require high throughput processing.
Poodt, P.W.G. +8 more
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Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition? [PDF]
ECS Journal of Solid State Science and Technology, 2015 Current trends in semiconductor device manufacturing impose extremely stringent requirements on nanoscale processing techniques, both in terms of accurately controlling material properties and in terms of precisely controlling nanometer dimensions. To take nanostructuring by dry etching to the next level, there is a fast growing interest in so-called ...
Faraz, T. +3 more
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Atomic layer deposition of zinc oxide on mesoporous zirconia using zinc(II) acetylacetonate and air [PDF]
, 2023 Jihong Yim +15 more
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Advanced Engineering Materials, EarlyView.In this experimental study, the mechanical properties of additively manufactured Ti‐6Al‐4V lattice structures of different geometries are characterized using compression, four point bending and fatigue testing. While TPMS designs show superior fatigue resistance, SplitP and Honeycomb lattice structures combine high stiffness and strength. The resulting
Klaus Burkart +3 more
wiley +1 more source
Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition [PDF]
, 2016 We report the design of a mobile setup for synchrotron based in situ studies during atomic layer processing. The system was designed to facilitate in situ grazing incidence small angle x-ray scattering (GISAXS), x-ray fluorescence (XRF), and x-ray ...
Alessandro Coati +10 more
core +2 more sources
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity†
Chemistry of Materials, 2018 Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently gaining momentum in semiconductor processing, because of the increasing need for eliminating the edge placement errors of top-down processing. Moreover, area-selective
A. Mackus, M. Merkx, W. Kessels
semanticscholar +1 more source
Advanced Engineering Materials, EarlyView.This study investigates laser metal deposition of aluminum alloys EN AW‐7075 and EN AW‐5083, using powder blending to compensate zinc and magnesium evaporation. In situ alloying and ex situ alloying with ZnAl12 and AZ91 preserve near‐standard compositions and improve mechanical properties.
Finn Bendixen +3 more
wiley +1 more source
Preventing unwanted atomic layer deposition by liquid sealing
Nano TrendsAtomic layer deposition (ALD) is an essential thin film fabrication technique widely used in electronic and energy systems, but avoiding ALD in untargeted areas has been a long-standing challenge that excludes the possibility of creating patterns through
Haochuan Wang +10 more
doaj +1 more source
Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes [PDF]
, 2019 We demonstrate that applying atomic layer deposition-derived molybdenum disulfide (MoS2) catalytic coatings on copper gallium diselenide (CGSe) thin film absorbers can lead to efficient wide band gap photocathodes for photoelectrochemical hydrogen ...
Blum, M +10 more
core +3 more sources
The Effect of Deposition Temperature of TiN Thin Film Deposition Using Thermal Atomic Layer Deposition [PDF]
, 2023 Baek-Ju Lee +3 more
openalex +1 more source