Results 101 to 110 of about 280,313 (347)

Photochemical atomic layer deposition and etching

Surface and Coatings Technology, 2016
AbstractConventional atomic layer deposition (ALD) is a thermo-chemical process that is now used extensively in the manufacture of ultrathin films. In addition to substrate heating, various forms of other “assisted” ALD processes are actively being developed, where supplementary energy is supplied for example, from a plasma discharge or from light ...
openaire   +2 more sources

Direct Electron Detection Electron Energy‐Loss Spectroscopy: Speeding Up 2D Analytical In Situ Transmission Electron Microscopy for Aluminum Alloys

Advanced Engineering Materials, EarlyView.
Scanning transmission electron microscopy imaging techniques are an essential tool to document dynamic developments, such as precipitation in aluminum alloys, during in situ heating experiments using transmission electron microscopy. However, in many cases, chemical information is required to interpret complex nanoscale processes.
Evelin Fisslthaler, Martina Dienstleder, Judith Lammer, Moritz Theissing, Daniel Knez   +4 more
wiley   +1 more source

Atomic Layer Deposition (ALD) of Metal Gates for CMOS

Applied Sciences, 2019
The continuous down-scaling of complementary metal oxide semiconductor (CMOS) field effect transistors (FETs) had been suffering two fateful technical issues, one relative to the thinning of gate dielectric and the other to the aggressive shortening of ...
Chao Zhao, Jinjuan Xiang
doaj   +1 more source

Study of the Effect of Process Parameters and Heat Treatment on the Formation and Evolution of Directed Energy Deposition of IN718‐CuCrZr Interface

Advanced Engineering Materials, EarlyView.
Bimetallic structures of Inconel 718 and CuCrZr are fabricated using the laser powder directed energy deposition method. The study reveals a strong dependence of interface characteristics such as width and interfusion on processing and heat treatment strategies.
Hamidreza Javidrad, Bahattin Koc
wiley   +1 more source

A Review on Reactor Design and Surface Modification of Atomic Layer Deposition for Functional Nanoparticles

Advanced Materials Interfaces
Atomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health.
Guanghui Yan, Gaoshan Huang, Jianjun Shi, Yi Ouyang, Xueqin Zuo, Zhihao Bao, Yongfeng Mei   +6 more
doaj   +1 more source

A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy [PDF]

Chemical Vapor Deposition, 2014
AbstractAtomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas‐solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s under the name “atomic layer epitaxy” (ALE) in Finland.
openaire   +3 more sources

Microstructural Evolution and Mechanical Properties of a Medium‐Manganese Steel Manufactured by Laser‐Based Powder Bed Fusion of Metals

Advanced Engineering Materials, EarlyView.
Fe–12Mn–0.2C medium‐manganese steel is processed by laser‐based powder bed fusion of metals using blended as well as pre‐alloyed powder. Various scanning speeds are used to determine the influence of energy deposition rate on microstructure and mechanical properties.
Leoni Hübner, Bugra Köksal, Thomas Wegener, Christian Haase, Thomas Niendorf   +4 more
wiley   +1 more source

A Review of Atomic Layer Deposition for Nanoscale Devices

Journal of Mechatronics, Electrical Power, and Vehicular Technology, 2012
Atomic layer deposition (ALD) is a thin film growth technique that utilizes alternating, self-saturation chemical reactions between gaseous precursors to achieve a deposited nanoscale layers.
Edy Riyanto, Estiko Rijanto, Budi Prawara   +2 more
doaj   +1 more source

Improving Surface Quality of Titanium Electrodeposition from a Deep Eutectic Solvent with Organic and Inorganic Additives

Advanced Engineering Materials, EarlyView.
Herein, the electroplating of titanium from an organic solvent, ethaline, is shown. Polymer additives are shown to smooth the roughness of the film, and small molecule additives are shown to produce a near‐mirror finish to the deposited metal. Titanium electroreduction is desired for a variety of medical, electronic, and bonding applications but has ...
Steven Livers, Christopher Chancellor, Katarzyna Grubel, Diana Horangic, Riah Burnett, Bailey Byrd, Christina Arendt, Lance Hubbard   +7 more
wiley   +1 more source

Surface Modification of Sol–Gel Synthesized Ba0.85Ca0.15Zr0.1Ti0.9O3 using Stearic Acid Additives

Advanced Engineering Materials, EarlyView.
This study explores a novel approach to enhance the piezoelectric performance of lead‐free BCZT ceramics synthesized via the sol–gel method. By coating the BCZT powder with only a 0.69 nm stearic acid layer, the electromechanical response is significantly boosted up to 359 pC N−1, revealing promising implications for high‐performance sensor and ...
Michelle Weichelt, Maria Rita Cicconi, Isabella Klösel, Swantje Funk, Alexander Martin, Ken‐ichi Kakimoto, Tobias Fey   +6 more
wiley   +1 more source