Results 251 to 260 of about 280,118 (298)
Pulsed Laser and Atomic Layer Deposition of CMOS-Compatible Vanadium Dioxide: Enabling Ultrathin Phase-Change Films. [PDF]
ACS Appl Electron MaterVarini A +6 more
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Atomic Layer Deposition Stabilizes Nanocrystals, Enabling Reliably High-Performance Quantum Dot LEDs. [PDF]
Adv MaterWan H +15 more
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Tailoring CuO<sub>x</sub> Films via Open-Air Spatial Atomic Layer Deposition and Their Application in Room-Temperature Humidity Sensing. [PDF]
SmallShahin A, Saini A, Kim NY, Musselman KP.
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Semiconductor Science and Technology, 2012
The growth method of atomic layer deposition (ALD) was introduced in Finland by Suntola under the name of atomic layer epitaxy (ALE). The method was originally used for deposition of thin films of sulphides (ZnS, CaS, SrS) activated with manganese or rare-earth ions.
Antonio Aliano +43 more
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The growth method of atomic layer deposition (ALD) was introduced in Finland by Suntola under the name of atomic layer epitaxy (ALE). The method was originally used for deposition of thin films of sulphides (ZnS, CaS, SrS) activated with manganese or rare-earth ions.
Antonio Aliano +43 more
+4 more sources
2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443), 2002
The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
Mikko Ritala, Markku Leskelä
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The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
Mikko Ritala, Markku Leskelä
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2015
Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-phase deposition technique for preparing ultra-thin films with precise growth control. ALD is currently rapidly evolving, mostly driven by the continuous trend in the miniaturization of electronic devices. In addition, many other innovative technologies are
Knoops, H.C.M. +3 more
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Atomic layer deposition (ALD), also referred to historically as atomic layer epitaxy, is a vapor-phase deposition technique for preparing ultra-thin films with precise growth control. ALD is currently rapidly evolving, mostly driven by the continuous trend in the miniaturization of electronic devices. In addition, many other innovative technologies are
Knoops, H.C.M. +3 more
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JOT Journal für Oberflächentechnik, 2011
A method of depositing a material on a substrate using an atomic layer deposition process, wherein the deposition process comprises a first deposition step, a second deposition step subsequent to the first deposition step, and a delay of at least one minute between the first deposition step and the second deposition step. Each deposition step comprises
Bernd Szyszka, Hugo Tholense
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A method of depositing a material on a substrate using an atomic layer deposition process, wherein the deposition process comprises a first deposition step, a second deposition step subsequent to the first deposition step, and a delay of at least one minute between the first deposition step and the second deposition step. Each deposition step comprises
Bernd Szyszka, Hugo Tholense
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Novel materials by atomic layer deposition and molecular layer deposition
MRS Bulletin, 2011Abstract
Markku Leskelä +2 more
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2017
Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
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Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
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Electroless Atomic Layer Deposition
ECS Meeting Abstracts, 2014Atomic layer deposition (ALD) is a group of methods for the formation of nanofilms of materials, an atomic layer at a time using surface limited reactions. The majority of those methods are based on use of the vacuum environment. However there are methods such as sequential ionic layer adsorption reaction (SILAR) which used the condensed phase, that ...
John Lewellen Stickney +3 more
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